Substrate treating apparatus

Patent metadata

Field	Value
Publication number	US-11810795-B2
Application number	US-202117182530-A
Country	US
Kind code	B2
Filing date	Feb 23, 2021
Priority date	Feb 26, 2020
Publication date	Nov 7, 2023
Grant date	Nov 7, 2023

Abstract

Disclosed is a substrate treating apparatus. All treating units are each arranged such that a treatment chamber, a chemical piping space, and an exhaust chamber are located side by side along a transportation space, the chemical piping space is located on a first side of the treatment chamber, and the exhaust chamber faces the chemical piping space across the treatment chamber when seen from the transportation space. The exhaust chamber faces the chemical piping space across the treatment chamber, leading to prevention of obstruction of a passage for passing a pipe, configured to supply a chemical to a substrate held by a holding rotator, by an exhaust pipe. Moreover, a single type of treating units is enough for the substrate treating apparatus instead of two types of treating units currently used. This results in sharing of components by all the treating units.

First claim

What is claimed is:

1. A substrate treating apparatus for treating substrates, comprising:
a substrate transport mechanism configured to transport a substrate; and
a plurality of treating units each configured to perform a predetermined chemical treatment to the substrate transported by the substrate transport mechanism,
the plurality of treating units being located side by side along a transportation path of the substrate transport mechanism, and being located so as to face each other across the transportation path and so as to be laminated in an up-down direction,
the treating units each including:
a treatment chamber as an area where a holding rotator configured to rotate the substrate while holding the substrate is provided, and the chemical treatment is performed to the substrate held and rotated by the holding rotator, and the substrate is delivered to and from the substrate transport mechanism via a substrate transportation port;
a chemical piping portion as an area where a chemical pipe for supplying a chemical to the treatment chamber is located; and
an exhaust chamber in communication with the treatment chamber via an exhaust port for exhausting gas from the treatment chamber, and also in communication with an exhaust pipe extending in the up-down direction, and

all the treating units each being arranged such that the treatment chamber, the chemical piping portion, and the exhaust chamber are located side by side along the transportation path, and the chemical piping portion is located on a first side of the treatment chamber and the exhaust chamber faces the chemical piping portion across the treatment chamber when seen from the transportation path.

2. The substrate treating apparatus according to claim 1 , wherein
the exhaust chamber is in communication with a plurality of exhaust pipes extending in the up-down direction, and
the exhaust chamber includes an opening and closing mechanism configured to switch an exhaust path of gas from the treatment chamber to one of the plurality of exhaust pipes.

3. The substrate treating apparatus according to claim 2 , wherein
the treatment chamber further includes a liquid supplying unit configured to supply a chemical to the substrate held by the holding rotator,
the opening and closing mechanism switches the exhaust path of the gas from the treatment chamber to a first exhaust pipe of the plurality of exhaust pipes when the liquid supplying unit supplies an acid chemical,
the opening and closing mechanism switches the exhaust path of the gas from the treatment chamber to a second exhaust pipe of the plurality of exhaust pipes when the liquid supplying unit supplies an alkaline chemical, and
the opening and closing mechanism switches the exhaust path of the gas from the treatment chamber to a third exhaust pipe of the plurality of exhaust pipes when the liquid supplying unit supplies an organic chemical.

4. The substrate treating apparatus according to claim 2 , wherein
the treatment chamber includes a lateral wall that faces the substrate transportation port across the holding rotator in plan view,
the holding rotator is located more adjacent to the substrate transportation port than the lateral wall in the treatment chamber,
the plurality of exhaust pipes are arranged in line in a horizontal direction perpendicular with respect to a direction where the transportation path extends, and
the exhaust port of the exhaust chamber is located more adjacent to the transportation path than the plurality of exhaust pipes.

5. The substrate treating apparatus according to claim 2 , further comprising:
a horizontal exhaust pipe provided in a position higher in level than the plurality of treating units along the transportation path, wherein
the horizontal exhaust pipe is in communication with each of the exhaust chambers of the treating units laminated in line in the up-down direction via the exhaust pipe.

6. The substrate treating apparatus according to claim 1 , wherein
the exhaust chamber includes a pressure adjustment mechanism provided adjacent to the exhaust port and configured to adjust pressure of gas passing through the exhaust port.

7. The substrate treating apparatus according to claim 1 , further comprising:
one or more substrate transport mechanisms, wherein
the substrate transport mechanisms each transport substrates to a predetermined stage of a plurality of treating units of the treating units laminated in the up-down direction.

Assignees

• Screen Holdings Co Ltd

Inventors

• Sawashima Jun
• Yamaguchi Takahiro
• Kobayashi Kenji

Classifications

• H10P72/7602

  the wafers being placed on a robot blade or gripped by a gripper for conveyance · CPC title

• H10P72/0461

  characterised by the presence of two or more transfer chambers · CPC title

• H10P72/0458

  vertical arrangement · CPC title

• H10P72/0454

  surrounding a central transfer chamber · CPC title

• H10P72/0404 Primary

  for general liquid treatment, e.g. etching followed by cleaning · CPC title