Fluororesin, fluororesin particles, and methods for producing these

US11807702B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11807702-B2
Application numberUS-201917280624-A
CountryUS
Kind codeB2
Filing dateSep 27, 2019
Priority dateSep 28, 2018
Publication dateNov 7, 2023
Grant dateNov 7, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The present invention relates to resin particles including a residue unit represented by the following general formula (1) and having a volume average particle diameter equal to or more than 5 μm and equal to or less than 2000 μm, and a method for producing thereof. Furthermore the present invention relates to a fluororesin comprising a residue unit represented by a general formula (1) and having a weight average molecular weight Mw in a range of 5×10 4 to 3×10 5 , and a yellow index of a heat-melted molded product (thickness 3 mm) after 24 h at 280° C. of equal to or less than 6, and a method for producing thereof. In the formula (1), Rf 1 , Rf 2 , Rf 3 , and Rf 4 are each independently one of the groups consisting of a fluorine atom, a linear perfluoroalkyl group having 1 to 7 carbon atoms, a branched perfluoroalkyl group having 3 to 7 carbon atoms, or a cyclic perfluoroalkyl group having 3 to 7 carbon atoms. The perfluoroalkyl group may have an ethereal oxygen atom. Further, Rf 1 , Rf 2 , Rf 3 , and Rf 4 may be linked to one another to form a ring having 4 or more and 8 or less carbon atoms, and the ring may include an ethereal oxygen atom.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing resin particles, the method comprising: obtaining a resin comprising a residue unit of formula (4) by placing a mixture of a radical polymerization initiator, a monomer of formula (3) and an organic solvent under a polymerization condition, wherein the organic solvent is a solvent in which at least the monomer is dissolved, at least a part of the resin produced by polymerization is not dissolved, and precipitation of the resin occurs, and the organic solvent comprises a fluorine atom and a hydrogen atom in a molecule; and the resin produced by the polymerization precipitates as particles in the organic solvent, wherein Rf 5 , Rf 6 , Rf 7 , and Rf 8 are each independently selected from the group consisting of a fluorine atom, a linear perfluoroalkyl group having 1 to 7 carbon atoms, a branched perfluoroalkyl group having 3 to 7 carbon atoms, and a cyclic perfluoroalkyl group having 3 to 7 carbon atoms, the linear or branched perfluoroalkyl group may have an ethereal oxygen atom, Rf 5 , Rf 6 , Rf 7 , and Rf 8 may be linked to one another to form a ring having 4-8 carbon atoms, and the ring optionally includes an ethereal oxygen atom. 2. The production method according to claim 1 , wherein the organic solvent dissolves the monomer of the formula (3) and does not dissolve the resin including the residue unit of the formula (4). 3. The production method according to claim 2 , wherein the organic solvent is an organic solvent in which after resin particles comprising the residue unit of the formula (4) and having a weight average molecular weight Mw of 5×10 4 to 70×10 4 have been immersed at 50° C. for at least 5 h in the organic solvent an amount 10 times in w/w of an amount of the organic particles, a residue of the resin particles is visually confirmed in the organic solvent. 4. The production method according to claim 2 , wherein the organic solvent is an organic solvent in which resin particles comprising the residue unit of the formula (4) and having a weight average molecular weight Mw of 5<10 4 to 70×10 4 are immersed at 50° C. for at least 5 h in the organic solvent in an amount 10 times in w/w of an amount of the organic particles, the solvent is thereafter cooled to 25° C., a resin sample remaining in a solid state is recovered, and a weight loss ratio of the resin sample is less than 20% by weight. 5. The production method according to claim 1 , wherein the organic solvent comprises a hydrogen atom at 1% or more by weight in the molecule. 6. The manufacturing method according to claim 1 , wherein the monomer of the formula (3) is perfluoro(4-methyl-2-methylene-1,3-dioxolane) of formula (5), and the residue unit of the formula (4) is a perfluoro(4-methyl-2-methylene-1,3-dioxolane) residue unit of formula (6),

Assignees

Inventors

Classifications

  • C08F24/00Primary

    Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F18/00; cyclic anhydrides of unsaturated acids C08F20/00, C08F22/00) · CPC title

  • C08F124/00Primary

    Homopolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a heterocyclic ring containing oxygen (cyclic esters of polyfunctional acids C08F118/00; cyclic anhydrides of unsaturated acids C08F120/00, C08F122/00) · CPC title

  • by an acetal or ketal radical · CPC title

  • by a acetal or ketal radical · CPC title

  • Organic solvent · CPC title

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What does patent US11807702B2 cover?
The present invention relates to resin particles including a residue unit represented by the following general formula (1) and having a volume average particle diameter equal to or more than 5 μm and equal to or less than 2000 μm, and a method for producing thereof. Furthermore the present invention relates to a fluororesin comprising a residue unit represented by a general formula (1) and havi…
Who is the assignee on this patent?
Tosoh Corp
What technology area does this patent fall under?
Primary CPC classification C08F24/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 07 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).