Electromagnetic wave absorber and molded article equipped with electromagnetic wave absorber
US-10701848-B2 · Jun 30, 2020 · US
US11806980B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11806980-B2 |
| Application number | US-201816621066-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 27, 2018 |
| Priority date | Jun 13, 2017 |
| Publication date | Nov 7, 2023 |
| Grant date | Nov 7, 2023 |
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An electromagnetic wave absorber (1) includes a dielectric layer (10), a resistive layer (20), and an electrically conductive layer (30). The resistive layer (20) is disposed on one principal surface of the dielectric layer (10). The electrically conductive layer (30) is disposed on the other principal surface of the dielectric layer (10) and has a sheet resistance lower than a sheet resistance of the resistive layer (20). The resistive layer (20) has a sheet resistance of 200 to 600Ω/□. When the resistive layer (20) is subjected to an immersion treatment in which the resistive layer (20) is immersed in a 5 weight % aqueous solution of NaOH for 5 minutes, an absolute value of a difference between a sheet resistance of the resistive layer (20) before the immersion treatment and a sheet resistance of the resistive layer (20) after the immersion treatment is less than 100Ω/□.
Opening claim text (preview).
The invention claimed is: 1. An electromagnetic wave absorber, comprising: a dielectric layer; a resistive layer that is disposed on one principal surface of the dielectric layer; and an electrically conductive layer that is disposed on the other principal surface of the dielectric layer and has a sheet resistance lower than a sheet resistance of the resistive layer, wherein the resistive layer has a sheet resistance of 200 to 600 Ω/□, when the resistive layer is subjected to an immersion treatment in which the resistive layer is immersed in a 5 weight % aqueous solution of NaOH for 5 minutes, an absolute value of a difference between a sheet resistance of the resistive layer before the immersion treatment and a sheet resistance of the resistive layer after the immersion treatment is less than 100 Ω/□, the resistive layer comprises indium tin oxide, and the indium tin oxide has an amorphous structure that includes 25 weight % or more of tin oxide. 2. The electromagnetic wave absorber according to claim 1 , wherein the resistive layer has a specific resistance of 5×10 −4 Ω·cm or more. 3. The electromagnetic wave absorber according to claim 1 , wherein the resistive layer has a thickness of 15 to 500 nm. 4. The electromagnetic wave absorber according to claim 1 , wherein the resistive layer is laminated on a polymer film at an opposite surface to a surface at which the resistive layer is in contact with the dielectric layer. 5. The electromagnetic wave absorber according to claim 1 , wherein the dielectric layer has a relative permittivity of 1 to 10. 6. The electromagnetic wave absorber according to claim 1 , wherein the dielectric layer is made of a polymeric material. 7. The electromagnetic wave absorber according to claim 1 , wherein the electrically conductive layer has a sheet resistance of 0.001 to 30 Ω/□. 8. The electromagnetic wave absorber according to claim 1 , wherein the electrically conductive layer is made of at least one of aluminum, an aluminum alloy, aluminum nitride, copper, a copper alloy, copper nitride, and indium tin oxide.
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