UHV in-situ cryo-cool chamber

Patent metadata

Field	Value
Publication number	US-11802340-B2
Application number	US-201715839018-A
Country	US
Kind code	B2
Filing date	Dec 12, 2017
Priority date	Dec 12, 2016
Publication date	Oct 31, 2023
Grant date	Oct 31, 2023

Abstract

A cooling chamber comprising a support plate connected to a cryo pump and turbo pump, a clamp ring with a plurality of clamp pads on the bottom thereof where each clamp pad has a beveled surface directed downward and a lift plate to move the clamp ring from a clamp position to a loading position are described. Cluster tools incorporating the cooling chamber and methods of using the cooling chamber are also described.

First claim

What is claimed is:

1. A cooling chamber comprising:
a cooler assembly comprising:
a support plate connected to a support arm, the support plate having a top surface to support a wafer, the support plate and the support arm being positioned inside of the cooling chamber; and
a housing connected to a cryo pump, a turbo pump and the support arm, the housing, the cryo pump and the turbo pump being positioned outside of the cooling chamber;

a clamp ring positioned above the support plate, the clamp ring having a top, bottom, inner diameter, outer diameter and a plurality of clamp pads on the bottom, each clamp pad having a beveled surface directed downward and toward the inner diameter; and
a lift plate to move the wafer.

2. The cooling chamber of claim 1 , wherein the cryo pump is configured to cool a wafer on the support plate to a temperature less than 150 K.

3. The cooling chamber of claim 1 , wherein the lift plate comprises a plurality of lift pins.

4. The cooling chamber of claim 3 , wherein the support plate comprises an opening on a side of the support plate to allow the lift pins to extend therethrough.

5. The cooling chamber of claim 3 , wherein the lift plate is connected to the clamp ring and to a motor to move the lift plate and clamp ring between a loading position and a clamp position.

6. The cooling chamber of claim 5 , wherein when in the loading position, the lift plate elevates the lift pins so that a top of the lift pins are above the top surface of the support plate by a distance sufficient to allow a robot blade to pass between the top of the lift pins and the top surface of the support plate.

7. The cooling chamber of claim 1 , wherein the lift plate is connected to the clamp ring.

8. The cooling chamber of claim 1 , wherein the clamp pads are connected to the clamp ring by a releasable connection.

9. The cooling chamber of claim 1 , wherein the support plate comprises at least one channel formed in the top surface to allow a flow of gas to pass beneath a wafer positioned on the top surface.

10. The cooling chamber of claim 9 , wherein the support plate further comprises a backside gas line connected to a back surface of the support plate and in fluid communication with the at least one channel.

11. The cooling chamber of claim 10 , wherein the backside gas line is connected to the support plate through a thermal choke.

12. The cooling chamber of claim 11 , wherein the thermal choke is made from a material comprising quartz.

13. The cooling chamber of claim 1 , wherein the clamp pads are made of a thermally insulating material.

14. A cluster tool comprising:
a central transfer station with a plurality of sides;
a robot positioned within the central transfer station and configured to move a robot blade to each of the plurality of sides; and
a cooling chamber according to claim 1 .

15. The cluster tool of claim 14 , wherein a pressure in the central transfer station is decreased by half, relative to a central transfer station without a cooling chamber, when the cooling chamber is set to a temperature less than 150 K.

16. A method of cooling a wafer, the method comprising:
positioning a wafer in a cooling chamber according to claim 1 ; and
cooling the wafer to a temperature less than 150 K using the cryo pump.

17. The method of claim 16 , wherein positioning the wafer in the cooling chamber comprises:
positioning the wafer on a plurality of lift pins connected to the lift plate, the plurality of lift pins elevated above the top surface of the support plate;
lowering the lift plate so that the lift pins lower the wafer to contact the top surface of the support plate; and
lowering the clamp ring so that the beveled surface of the clamp pads contacts an outer peripheral edge of the wafer to clamp the wafer to the support plate.

18. The method of claim 17 , further comprising flowing a cooling gas through a plurality of channels in the top surface of the support plate after the wafer is clamped to the support plate.

19. The method of claim 18 , further comprising removing the wafer from the cooling chamber, wherein removing the wafer comprises:
lifting the clamp ring so that the clamp pads are no longer contacting the wafer; and
lifting the lift pins to contact the wafer and elevate the wafer above the top surface of the support plate so that there is a space below the wafer sufficient to allow a robot blade to move between the wafer and the support plate.

20. The cooling chamber of claim 1 , wherein the beveled surface of each clamp pad contacts an edge exclusion region of the wafer when the wafer is in a clamp position.

Assignees

• Applied Materials Inc

Inventors

• Swaminathan Bharath
• Mazzocco John
• Wu Hanbing
• Goel Ashish
• Subramani Anantha K

Classifications

• H10P72/7624

  characterised by the mechanical construction of the susceptor, stage or support · CPC title

• H10P72/7612

  characterised by lifting arrangements, e.g. lift pins · CPC title

• H10P72/7608

  characterised by a plurality of separate clamping members, e.g. clamping fingers · CPC title

• H10P72/7606

  characterised by edge clamping, e.g. clamping ring · CPC title

• H10P72/0466

  characterised by the construction of the load-lock chamber · CPC title