System and Method for Inhibiting VUV Radiative Emission of a Laser-Sustained Plasma Source
US-2017345639-A1 · Nov 30, 2017 · US
US11798798B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11798798-B2 |
| Application number | US-201917276046-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 13, 2019 |
| Priority date | Sep 13, 2018 |
| Publication date | Oct 24, 2023 |
| Grant date | Oct 24, 2023 |
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The invention relates to a phosphor for a UV emitting device, having the formula Na 1+x Ca 1−2x PO 4 :PR3 + x wherein 0<x<0.5.
Opening claim text (preview).
The invention claimed is: 1. A phosphor for a UV emitting device, having the formula Na 1+x Ca 1−2x PO 4 :PR 3+ x , wherein 0.01<x<0.1, and wherein the phosphor is configured to convert vacuum ultraviolet (VUV) radiation to UV-C radiation. 2. The phosphor of claim 1 , wherein the value of x is 0.03<x<0.07. 3. A phosphor according to claim 1 , characterized in that the value of x is 0.04<x<0.06. 4. The phosphor of claim 1 , wherein the phosphor is essentially free of Yttrium. 5. A UV generating device comprising a phosphor according to claim 1 and a UV radiation source. 6. The phosphor according to claim 1 , wherein the phosphor is excited by a light having a wavelength of 172 nm and 185 nm to emit an ultraviolet light in the range of 230 nm to 260 nm. 7. A method comprising: providing a phosphor having the formula: Na 1+x Ca 1−2x PO 4 :PR 3+ x , wherein 0<x<0.5; exposing the phosphor to VUV radiation; and converting the VUV radiation to UV-C radiation using the phosphor. 8. The method of claim 7 , further comprising placing the phosphor inside a gas discharge lamp. 9. The method according to claim 7 , further comprising exposing water or wastewater to the UV-C radiation emitted by the phosphor. 10. A UV generating device comprising: a phosphor having the formula Na 1+x Ca 1−2x PO 4 :PR 3+ x , wherein 0<x<0.5, and a UV radiation source comprising a gas discharge lamp. 11. The UV generating device according to claim 10 , wherein the UV radiation source comprises a low pressure mercury gas discharge lamp. 12. The UV generating device according to claim 10 , wherein the UV radiation source comprises a low pressure mercury amalgam gas discharge lamp. 13. The UV generating device according to claim 10 , wherein the UV radiation source comprises an excimer lamp. 14. The UV generating device according to claim 13 , wherein the UV radiation source comprises an excimer gas discharge lamp with a gas filling that predominately emits a second Xenon excimer continuum. 15. The UV generating device according to claim 13 , wherein the UV radiation source comprises an excimer gas discharge lamp with a gas filling that is essentially free of mercury. 16. The UV generating device according to claim 14 , wherein the gas filling contains more than 50% by volume of Xenon. 17. The UV generating device according to claim 14 , wherein upon excitation the phosphor emits an ultraviolet light in the range of 230 nm to 260 nm.
having helium, argon, neon, krypton, or xenon as the principle constituent · CPC title
Compounds containing rare earth metals and at least one element other than a rare earth metal, oxygen or hydrogen, e.g. La4S3Br6 (C01F17/247 - C01F17/294 take precedence) · CPC title
Irradiation devices or lamp constructions · CPC title
with alkaline earth metals · CPC title
Devices characterised by the luminescent material · CPC title
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