Strain gauge

Patent metadata

Field	Value
Publication number	US-11796404-B2
Application number	US-201917041704-A
Country	US
Kind code	B2
Filing date	Mar 29, 2019
Priority date	Mar 29, 2018
Publication date	Oct 24, 2023
Grant date	Oct 24, 2023

Abstract

A strain gauge includes a flexible substrate, a resistor formed of material containing at least one from among chromium and nickel, on or above the substrate, and a pair of electrodes electrically connected to the resistor. Each electrode includes a plurality of first patterns that are juxtaposed at predetermined intervals and that are electrically connected to each other. A plurality of second patterns of which longitudinal directions are toward a same direction as a longitudinal direction of each of the first patterns are disposed between opposing electrodes.

First claim

The invention claimed is:

1. A strain gauge comprising:
a flexible resin substrate;
a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate;
a resistor formed as a film containing Cr, CrN, and Cr 2 N, on one surface of the functional layer; and
a pair of electrodes electrically connected to the resistor,
wherein each electrode includes a plurality of first patterns that are juxtaposed at predetermined intervals and that are electrically connected to each other,
wherein a plurality of second patterns of which longitudinal directions are toward a same direction as a longitudinal direction of each of the first patterns are disposed between opposing electrodes,
wherein the plurality of second patterns are electrically floating dummy patterns, and
wherein the plurality of second patterns of which the longitudinal directions are toward a same direction as the longitudinal direction of each first pattern are disposed, the second patterns being interposed between first patterns opposite each other, among the first patterns, and the first patterns opposite each other being from among given first patterns that constitute one of the electrodes and given first patterns that constitute another electrode.

2. The strain gauge according to claim 1 , wherein a width of each first pattern is same as a width of each second pattern, and
wherein a space between first patterns that are next to each other is same as a space between second patterns that are next to each other.

3. A strain gauge comprising:
a flexible resin substrate;
a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate;
a resistor formed as a film containing Cr, CrN, and Cr 2 N, on one surface of the functional layer; and
a pair of electrodes electrically connected to the resistor,
wherein each electrode includes a plurality of first patterns that are juxtaposed at predetermined intervals and that are electrically connected to each other,
wherein a plurality of second patterns of which longitudinal directions are toward a same direction as a longitudinal direction of each of the first patterns are disposed between opposing electrodes,
wherein the plurality of second patterns are a zigzag pattern that constitutes the resistor, and
wherein the plurality of second patterns of which the longitudinal directions are toward a same direction as the longitudinal direction of each first pattern are disposed, the second patterns being interposed between first patterns opposite each other, among the first patterns, and the first patterns opposite each other being from among given first patterns that constitute one of the electrodes and given first patterns that constitute another electrode.

4. The strain gauge according to claim 1 , wherein the longitudinal direction of each of the first patterns and the second patterns is parallel to a grid direction of the resistor.

5. A strain gauge comprising:
a flexible resin substrate;
a functional layer formed of a metal, an alloy, or a metal compound, on one surface of the substrate;
a resistor formed as a film containing Cr, CrN, and Cr 2 N, on one surface of the functional layer; and
a pair of electrodes electrically connected to the resistor,
wherein each electrode includes a plurality of first patterns that are juxtaposed at predetermined intervals and that are electrically connected to each other,
wherein a plurality of second patterns of which longitudinal directions are toward a same direction as a longitudinal direction of each of the first patterns are disposed between opposing electrodes,
wherein a width of each first pattern is same as a width of each second pattern,
wherein a space between first patterns that are next to each other is same as a space between second patterns that are next to each other, and
wherein the plurality of second patterns of which the longitudinal directions are toward a same direction as the longitudinal direction of each first pattern are disposed, each of the second patterns being interposed between end portions of opposing first patterns, the opposing first patterns being from among given first patterns that constitute one of the electrodes and given first patterns that constitute another electrode.

6. The strain gauge according to claim 5 , wherein the longitudinal direction of each of the first patterns and the second patterns is perpendicular to a grid direction of the resistor.

7. The strain gauge according to claim 1 , wherein the film of the resistor is formed with alpha-chromium as a main component.

8. The strain gauge according to claim 7 , wherein the resistor includes alpha-chromium at 80% by weight or more.

9. The strain gauge according to claim 1 , wherein the functional layer includes a function of promoting crystal growth of the resistor.

10. The strain gauge according to claim 3 , wherein a width of each first pattern is same as a width of each second pattern, and
wherein a space between first patterns that are next to each other is same as a space between second patterns that are next to each other.

11. The strain gauge according to claim 3 , wherein the longitudinal direction of each of the first patterns and the second patterns is parallel to a grid direction of the resistor.

12. The strain gauge according to claim 3 , wherein the film of the resistor is formed with alpha-chromium as a main component.

13. The strain gauge according to claim 12 , wherein the resistor includes alpha-chromium at 80% by weight or more.

14. The strain gauge according to claim 3 , wherein the functional layer includes a function of promoting crystal growth of the resistor.

15. The strain gauge according to claim 5 , wherein the plurality of second patterns are electrically floating dummy patterns.

16. The strain gauge according to claim 5 , wherein the film of the resistor is formed with alpha-chromium as a main component.

17. The strain gauge according to claim 16 , wherein the resistor includes alpha-chromium at 80% by weight or more.

18. The strain gauge according to claim 5 , wherein the functional layer includes a function of promoting crystal growth of the resistor.

Assignees

• Minebea Mitsumi Inc

Inventors

• Toda Shinya
• Misaizu Eiji
• Kitahara Kosuke

Classifications

• G01L1/2287 Primary

  constructional details of the strain gauges (adjustable resistors H01C10/00) · CPC title

• H05K1/0296

  Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295 (H05K1/11 takes precedence; lay-out adapted to mounted component configuration H05K1/18) · CPC title

• H05K1/0393

  Flexible materials (H05K1/038 takes precedence; specific organic compositions are classified in H05K1/0313 and subgroups) · CPC title

• H05K1/167 Primary

  incorporating printed resistors · CPC title

• H05K2201/10151

  Sensor · CPC title