Optical element for a deep ultraviolet light source

Patent metadata

Field	Value
Publication number	US-11784452-B2
Application number	US-202017429218-A
Country	US
Kind code	B2
Filing date	Feb 5, 2020
Priority date	Feb 25, 2019
Publication date	Oct 10, 2023
Grant date	Oct 10, 2023

Abstract

An optical element for a deep-ultraviolet light source includes a crystalline substrate; a coating on an exterior surface of the crystalline substrate, the coating having a thickness along a direction that extends away from the exterior surface; and a structure on and/or in the coating, the structure including a plurality of features that extend away from the crystalline substrate along the direction. The features include an amorphous dielectric material and are arranged such that an index of refraction of the structure varies along the direction.

First claim

What is claimed is:

1. An optical element for a deep-ultraviolet light source, the optical element comprising:
a crystalline substrate;
a protective coating on an exterior surface of the crystalline substrate, the protective coating having a thickness along a direction that extends away from the exterior surface; and
a structure comprising a plurality of features partially or completely within the protective coating and extending away from the crystalline substrate along the direction, wherein the features comprise an amorphous dielectric material and are arranged such that their index of refraction varies along the direction.

2. The optical element of claim 1 , wherein the crystalline substrate comprises calcium fluoride (CaF 2 ).

3. The optical element of claim 1 , wherein an extent of the features along the direction is no greater than the thickness.

4. The optical element of claim 1 , wherein the features and the protective coating are made of an amorphous dielectric material.

5. The optical element of claim 1 , wherein one or more of the features extends outside of the protective coating.

6. The optical element of claim 1 , wherein each of the plurality of features is the same, and the plurality of features are arranged relative to each other in a random or pseudo-random manner.

7. The optical element of claim 1 , wherein the index of refraction of the features varies along the direction from a value that is substantially equal to an index of refraction of the crystalline substrate to a value that is substantially equal to an index of refraction of a fluid at the optical element.

8. The optical element of claim 1 , wherein the direction is substantially orthogonal to a surface of the crystalline substrate.

9. A deep-ultraviolet (DUV) light source comprising:
a chamber comprising a housing configured to enclose a gaseous gain medium; and
at least one optical element configured to transmit DUV light in the DUV light source, wherein the at least one optical element comprises:
a substrate comprising a crystalline material configured to transmit DUV light;
a protective coating on an exterior surface of the substrate, the protective coating having a thickness along a direction that extends away from the exterior surface; and
a structure comprising a plurality of features partially or completely within the protective coating and extending away from the exterior surface along the direction, wherein the features comprise an amorphous material and the features are arranged such that their index of refraction varies along the direction.

10. The DUV light source of claim 9 , wherein one or more of the plurality of features extends a distance along the direction, and the distance is less than the wavelength of DUV light transmitted by the at least one optical element.

11. The DUV light source of claim 9 , wherein the plurality of features are arranged relative to each other such that a spacing between any two adjacent features is within an order of magnitude of the wavelength of DUV light transmitted by the at least one optical element.

12. The DUV light source of claim 9 , wherein the crystalline material configured to transmit DUV light comprises calcium fluoride (CaF 2 ).

13. The DUV light source of claim 9 , wherein the features are in and on the protective coating, such that the structure is partially within the protective coating.

14. A deep-ultraviolet (DUV) light source comprising:
a chamber comprising:
a housing configured to enclose a gaseous gain medium;
a first window on first side of the housing; and
a second window on a second side of the housing, the second side of the housing being opposite the first side of the housing; and

at least one optical element configured to transmit DUV light, wherein the at least one optical element comprises:
a substrate comprising a crystalline material configured to transmit DUV light;
a protective coating on an exterior surface of the substrate, the protective coating having a thickness along a direction that extends away from the exterior surface; and
a structure in and on the protective coating, the structure comprising a plurality of features that extend away from the exterior surface along the direction, the features comprise an amorphous material, and the features are arranged such that an index of refraction of the structure varies along the direction;

wherein the at least one optical element comprises the first window and the second window, and the protective coating is on the first window and the second window.

15. The DUV light source of claim 14 , wherein the protective coating on the first window and the protective coating on the second window are disposed on surfaces of the respective windows that are exterior to the housing.

16. The DUV light source of claim 14 , wherein an exterior surface of the first window and an exterior surface of the second window are non-perpendicular to a direction of propagation of the DUV light.

17. The DUV light source of claim 9 , wherein the at least one optical element comprises one or more of a prism, a beam splitter, a window having a surface non-perpendicular to a direction of propagation of the DUV light, and an optical compensator.

18. The DUV light source of claim 9 , wherein the index of refraction varies along a direction of propagation of the DUV light.

19. The DUV light source of claim 12 , wherein, in operational use, DUV light having a wavelength of 193 nanometers (nm) is incident on the protective coating, the protective coating protects the CaF 2 substrate by mitigating removal of fluorine from the substrate, and the index of refraction of the structure varies along a direction of propagation of the DUV light such that reflections of the DUV light from the optical element are reduced.

20. The DUV light source of claim 9 , wherein the index of refraction of the structure varies along the direction from a value that is substantially equal to an index of refraction of the crystalline substrate to a value that is substantially equal to an index of refraction of a purge gas.

21. The DUV light source of claim 9 , wherein the features are entirely within the protective coating.

22. A deep-ultraviolet (DUV) light source comprising:
a power amplifier (PA) comprising a discharge chamber configured to enclose a gaseous gain medium, the discharge chamber comprising at least one discharge chamber window configured to transmit DUV light, wherein the at least one discharge chamber window comprises:
a substrate comprising a crystalline material configured to transmit DUV light;
a coating on an exterior surface of the substrate, the coating having a thickness along a direction that extends away from the exterior surface; and
a structure on and/or in the coating, the structure comprising a plurality of features that extend away from exterior surface along the direction, wherein the features comprise an amorphous material and the features are arranged such that an index of refraction of the structure varies along the direction.

23. The DUV light source of claim 22 , wherein the exterior surface of the substrate is a surface that faces away from an interior of the discharge chamber.

24. The DUV light source of claim 23 , wherein the chamber of the PA further comprises a second discharge chamber window configured to transmit DUV light, wherein the second discharge chamber window comprises:
a second substrate comprising a crystalline mat

Assignees

• Cymer LLC

Inventors

• Das Saptaparna
• Mason Eric Anders
• Melchior John Theodore

Classifications

• H01S3/0346 Primary

  Protection of windows or mirrors against deleterious effects (cooling arrangements H01S3/0401) · CPC title

• H01S3/0835

  Gas ring lasers · CPC title

• H01S3/08059

  Constructional details of the reflector, e.g. shape (mirrors in general G02B5/08; mountings for mirrors G02B7/18) · CPC title

• H01S3/0811

  incorporating a dispersive element, e.g. a prism for wavelength selection · CPC title

• H01S3/0971

  transversely excited (H01S3/0975 takes precedence) · CPC title