Optical limiter and method for limiting radiant flux

US11774785B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11774785-B2
Application numberUS-202117995165-A
CountryUS
Kind codeB2
Filing dateMar 10, 2021
Priority dateMar 30, 2020
Publication dateOct 3, 2023
Grant dateOct 3, 2023

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

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This disclosure relates to an optical limiter for limiting the radiant flux of an optical source beam, including an optical control port for illumination by an optical control beam originating from the source beam; an optical input port for illumination by an optical transmission beam originating from the source beam; an optical output port for illumination by the transmission beam; and a thermally driven light mill; wherein the light mill is arranged with respect to the input port, the control port and the output port such that: illumination of the control port by the control beam drives the light mill to rotate only when the control beam has a radiant flux equal to or in excess of a predetermined radiant flux threshold; and rotation of the light mill causes an area of the output port illuminated by the transmission beam to change.

First claim

Opening claim text (preview).

The invention claimed is: 1. An optical limiter for limiting radiant flux of an optical source beam, the optical limiter comprising: an optical control port for illumination by an optical control beam originating from the optical source beam, an optical input port for illumination by an optical transmission beam originating from the optical source beam, and an optical output port for illumination by the optical transmission beam, wherein the optical control port can be the optical input port, the optical input port can be the optical control port, and the optical control port, the optical input port, and the optical output port can be distinct, and wherein the optical source beam can serve as both the optical transmission beam and the optical control beam; and a thermally driven light mill, wherein the thermally driven light mill is arranged with respect to the optical input port, the optical control port, and the optical output port, such that: illumination of the optical control port by the optical control beam drives the thermally driven light mill to rotate only when the optical control beam has a radiant flux equal to or in excess of a predetermined radiant flux threshold; and rotation of the thermally driven light mill causes an area of the optical output port illuminated by the optical transmission beam to change. 2. The optical limiter of claim 1 , further configured to permit rotation of the thermally driven light mill by an angle large enough that the area of the optical output port illuminated by the optical transmission beam is zero, such that the optical limiter acts as a reusable optical fuse. 3. The optical limiter of claim 1 , further configured to limit the radiant flux of an optical source beam originating from a laser. 4. The optical limiter of claim 1 , wherein at least one of: a side of a vane of the thermally driven light mill arranged to be illuminated by the optical control beam in use has a higher optical absorptance than an optical absorptance of an opposing side of the vane; or a side of the vane of the thermally driven light mill arranged to be illuminated by the optical control beam and the opposing side of the vane are shaped such that, over a permitted range of rotation of the thermally driven light mill, the side of the vane illuminated by the optical control beam receives a greater quantity of radiant energy from the optical control beam than the opposing side. 5. The optical limiter of claim 1 , further comprising an optical baffle apparatus arranged to prevent a portion of the optical transmission beam from illuminating the optical output port, the size of the portion being dependent on an angle by which the thermally driven light mill is rotated. 6. The optical limiter of claim 5 , wherein the optical baffle apparatus comprises at least one of: one or more light directors; or one or more beam stoppers. 7. The optical limiter of claim 5 , wherein: the optical input port and the optical output port are coaxial with one another; the optical baffle apparatus comprises one or more beam stoppers arranged to rotate with the thermally driven light mill; and the one or more beam stoppers are arranged to define an aperture that the optical transmission beam must pass through to reach the optical output port. 8. The optical limiter of claim 1 , wherein the optical input port is the optical control port, with the optical source beam serving, as both the optical transmission beam and the optical control beam. 9. The optical limiter of claim 1 , further comprising an optical splitter arranged to split the optical source beam into the optical transmission beam and the optical control beam. 10. The optical limiter of claim 1 , further comprising a biasing element wherein the thermally driven light mill is coupled to the biasing element such that the thermally driven light mill is biased towards a first rotational position in which the area of the optical output port illuminated by the optical transmission beam is maximized relative to any other rotational position of the thermally driven light mill. 11. The optical limiter of claim 10 , wherein the biasing element is configured to be adjustable so that a biasing force exerted by the biasing element on the thermally driven light mill can be modified. 12. The optical limiter of either of claim 10 , further configured to permit rotation of the thermally driven light mill by an angle large enough that the area of the optical output port illuminated by the optical transmission beam is zero, such that the optical limiter acts as a reusable optical fuse, and wherein the biasing element is configured to: when the radiant flux of the optical source beam is below the predetermined radiant flux threshold, prevent rotation of the thermally driven light mill away from the first rotational position; and when the radiant flux of the optical source beam equals or exceeds the predetermined radiant flux threshold, permit rotation of the thermally driven light mill from the first rotational position by the angle large enough that the area of the optical output port illuminated by the optical transmission beam is zero. 13. The optical limiter of claim 1 , further comprising one or more stays each arranged to prevent rotation of the thermally driven light mill beyond a particular rotational position. 14. The optical limiter of claim 1 , further comprising a housing which encloses the thermally driven light mill, the housing comprising an aperture configured for partial evacuation of fluid surrounding the thermally driven light mill. 15. A method of limiting radiant flux of an optical source beam, the method comprising: illuminating the optical input port of the optical limiter of claim 1 with an optical transmission beam originating from the optical source beam; and illuminating the optical control port of the optical limiter with an optical control beam originating from the optical source beam.

Assignees

Inventors

Classifications

  • G02F1/0126Primary

    Opto-optical modulation, i.e. control of one light beam by another light beam, not otherwise provided for in this subclass · CPC title

  • the optical element being reflective, e.g. mirror · CPC title

  • G02B26/023Primary

    comprising movable attenuating elements, e.g. neutral density filters · CPC title

  • based on thermo-optic effects (G02F1/132 takes precedence) · CPC title

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What does patent US11774785B2 cover?
This disclosure relates to an optical limiter for limiting the radiant flux of an optical source beam, including an optical control port for illumination by an optical control beam originating from the source beam; an optical input port for illumination by an optical transmission beam originating from the source beam; an optical output port for illumination by the transmission beam; and a therm…
Who is the assignee on this patent?
British Telecomm
What technology area does this patent fall under?
Primary CPC classification G02F1/0126. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Oct 03 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).