Liquid storage for facility chemical supply system

Patent metadata

Field	Value
Publication number	US-11769678-B2
Application number	US-202017100218-A
Country	US
Kind code	B2
Filing date	Nov 20, 2020
Priority date	Dec 31, 2019
Publication date	Sep 26, 2023
Grant date	Sep 26, 2023

Abstract

A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.

First claim

What is claimed is:

1. A liquid supply system, comprising:
a storage tank for storing a process chemical fluid, the storage tank including a dispensing port positioned at a lowest part of the storage tank in a gravity direction;
an anti-collision frame coupled to the storage tank; and
a spectrum analyzer located adjacent to the dispensing port of the storage tank to measure a variation in fluid quality in response to a fluid quality measurement of fluid, wherein a time delay between subsequent process chemical fluid supply and dispensing of the fluid is adjusted based on the variation in fluid quality measured by the spectrum analyzer;
a feedback controller coupled to the spectrum analyzer and one or more valves controlling supply and dispense of the process chemical fluid associated with the liquid supply system;
wherein the feedback controller is configured to adjust one or more parameters of the process chemical fluid and the valves based on a variation in output of the spectrum analyzer generated by the fluid.

2. The liquid supply system of claim 1 , wherein the storage tank includes a frustoconical base.

3. The liquid supply system of claim 1 , wherein the feedback controller is configured to determine whether the variation in fluid quality is within an acceptable range.

4. The liquid supply system of claim 1 , wherein the feedback controller, in response to the variation in fluid quality that is not within the acceptable range, automatically adjusts a configurable parameter of the fluid stored in the storage tank.

5. The liquid supply system of claim 1 , wherein the feedback controller sends a notification based on a fluid quality measurement information when a rate of change in fluid quality generated by the spectrum analyzer is greater than a threshold.

6. A liquid supply system, comprising:
a storage tank storing process chemical fluid, the storage tank including a liquid dispensing port positioned at a lowest part of the storage tank in a gravity direction;
an anti-collision frame coupled to the storage tank;
a spectrum analyzer located adjacent to the liquid dispensing port of the storage tank to measure a variation in fluid quality; and
a feedback controller coupled to the spectrum analyzer and one or more of a process supply source, and fluidic control elements controlling supply and dispense of the process chemical fluid associated with the liquid supply system,
wherein the feedback controller is configured to adjust a time delay between subsequent process chemical fluid supply and dispensing of the fluid based on the variation in fluid quality measured by the spectrum analyzer;
wherein the feedback controller is configured to adjust one or more parameters of the process chemical fluid and the fluidic control elements based on a variation in output of the spectrum analyzer generated by the process chemical fluid.

7. The liquid supply system of claim 6 , wherein the storage tank includes a frustoconical base.

8. The liquid supply system of claim 6 , wherein the storage tank includes a larger radius of curvature near the dispensing port than a radius of curvature near a side wall.

9. The liquid supply system of claim 6 , wherein the storage tank has same top and bottom exterior profiles.

10. The liquid supply system of claim 6 , wherein the storage tank has different top and bottom exterior profiles.

11. The liquid supply system of claim 6 , wherein the fluidic control elements are liquid discharge valves.

12. The liquid supply system of claim 9 , wherein the storage tank includes a plurality of grounding connections and a static electricity detector.

13. A feedback control system of a liquid supply system, the liquid supply system including a storage tank for storing a process chemical fluid, the feedback control system comprising:
a spectrum analyzer located adjacent to a dispensing port of the storage tank to measure a variation in fluid quality in response to a fluid quality measurement of fluid; and
a feedback controller coupled to the spectrum analyzer and an adjustable fluidic element controlling supply and dispense of the process chemical fluid, wherein the feedback controller is configured to adjust a time delay between subsequent process chemical fluid supply and dispensing of the fluid based on the variation in fluid quality measured by the spectrum analyzer;
wherein the liquid supply system further comprises an anti-collision frame coupled to the storage tank, and wherein the spectrum analyzer is disposed on the anti-collision frame to measure the variation in fluid quality in response to the fluid quality measurement of fluid;
wherein the feedback controller is configured to adjust one or more parameters of the process chemical fluid and the adjustable fluidic element based on a variation in output of the spectrum analyzer generated by the fluid.

14. The feedback control system of claim 13 , wherein the storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction.

15. The feedback control system of claim 13 , wherein the feedback controller is configured to determine whether the variation in fluid quality is within an acceptable range.

16. The feedback control system of claim 15 , wherein the feedback controller, in response to the variation in fluid quality that is not within the acceptable range, automatically adjusts a configurable parameter of the fluid stored in the storage tank.

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Lin Tzu-Yang
• Wu Cheng-Han
• Liu Chen-Yu
• Tseng Kuo-Shu
• Li shang-sheng
• Hsu Chen Yi
• Chang Yu-Cheng

Classifications

• H10P72/0404 Primary

  for general liquid treatment, e.g. etching followed by cleaning · CPC title

• H10P72/06 Primary

  Apparatus for monitoring, sorting, marking, testing or measuring · CPC title

• H10P72/0474

  comprising at least one lithography chamber · CPC title

• H01L21/67242 Primary

  Electricity · mapped topic

• H01L21/67023

  Electricity · mapped topic