Composition for forming resist underlayer film and patterning process
US-2017017156-A1 · Jan 19, 2017 · US
US11767398B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11767398-B2 |
| Application number | US-202017423528-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 20, 2020 |
| Priority date | Feb 22, 2019 |
| Publication date | Sep 26, 2023 |
| Grant date | Sep 26, 2023 |
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The present invention relates to a composition comprising; components a) b) and d); wherein, component a) is a metal compound having the structure (I), component b) is a spin on high carbon polymer, having a polymer backbone comprising mono-cyclic aromatic hydrocarbon, fused-ring ring hydrocarbon moieties, or mixtures of these, having a wt. % of carbon from about 81 wt. % to about 94 wt. %, which is soluble to at least about 5 wt. % in a spin casting solvent, and wherein at least one, of said mono-cyclic aromatic hydrocarbon or said fused-ring ring hydrocarbon moieties, present in said spin on high carbon polymer, is functionalized with at least one alkynyloxy moiety of structure (VIII), and component d) is a spin casting solvent. The present invention further relates to using this composition in methods for manufacturing electronic devices through either the formation of a patterned films of high K material comprised of a metal oxide on a semiconductor substrate, or through the formation of patterned metal oxide comprised layer overlaying a semiconductor substrate which may be used to selectively etch the semiconductor substrate with a fluorine plasma.
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We claim: 1. A spin on high carbon polymer comprising a repeat unit of structure (XII), wherein fAr is a fused aromatic ring and Ra 1 , Ra 2 , Ra 3 , R 16 and R 17 are each independently hydrogen or a C 1 to C 4 alkyl; 2. The spin on high carbon polymer of claim 1 , wherein fAr is a group comprising 2-8 fused aromatic rings. 3. The spin on high carbon polymer of claim 1 , wherein fAr is anthracene. 4. The spin on high carbon polymer of claim of claim 1 , wherein said repeat unit has structure (XIIc): 5. A spin on high carbon polymer comprising repeat units, selected from the group consisting of repeat units having structures (XIII), (XIIIa), (XIIIb), (XIIIc), and (XIIId), and mixtures thereof, wherein fAr is a fused aromatic ring and Ra 1 , Ra 2 , Ra 3 , R 16 and R 17 are each independently selected from the group of hydrogen and a C 1 to C 4 alkyl. 6. The spin on high carbon polymer of claim 5 , wherein said spin on high carbon polymer comprising repeat units, selected from the group consisting of repeat units having structures (XIIIe), (XIIIf), (XIIIg), (XIIIh), and (XIIIi), and mixtures thereof, wherein fAr is a fused aromatic ring and Ra 1 , Ra 2 , Ra 3 , R 16 and R 17 are each independently selected from the group of hydrogen and a C 1 to C 4 alkyl. 7. A spin on high carbon polymer is a spin on high carbon polymer comprising repeat units having structures (XIV), wherein Ra 1 , Ra 2 and Ra 3 are each independently selected from the group of hydrogen and a C 1 to C 4 alkyl. 8. The spin on high carbon polymer of claim 7 , wherein Ra 1 , Ra 2 and Ra 3 are hydrogen.
the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC · CPC title
Macromolecular compounds containing only carbon atoms in the main chain of the macromolecule, e.g. polyxylylenes · CPC title
Spin coating · CPC title
After-treatment · CPC title
Macromolecular compounds containing atoms other than carbon in the main chain of the macromolecule · CPC title
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