Gas recovering apparatus, semiconductor manufacturing system, and gas recovering method

Patent metadata

Field	Value
Publication number	US-11766635-B2
Application number	US-202117350912-A
Country	US
Kind code	B2
Filing date	Jun 17, 2021
Priority date	Sep 8, 2020
Publication date	Sep 26, 2023
Grant date	Sep 26, 2023

Abstract

According to one embodiment, a gas recovering apparatus includes a casing and a tube. The casing is provided with an inlet through which a gas flows in, a first outlet for discharging a first gas containing a gas to be recovered of the gas, and a second outlet for discharging a second gas other than the first gas of the gas. The casing is evacuated via the first outlet. The tube is provided in the casing from the inlet to the second outlet, and has a high permeability to the first gas and a low permeability to the second gas.

First claim

The invention claimed is:

1. A semiconductor manufacturing system, comprising:
a semiconductor manufacturing apparatus configured to manufacture a semiconductor device by using a process gas comprising a gas to be recovered and discharge an exhaust gas generated due to manufacturing of the semiconductor device;
a dilution device configured to dilute the exhaust gas by a diluent gas;
a detoxifying device configured to detoxify the exhaust gas by burning the diluted exhaust gas by using an oxygen gas; and
a gas recovering apparatus configured to recover the gas to be recovered from the detoxified exhaust gas, wherein
the gas recovering apparatus comprises a casing provided with an inlet through which the detoxified exhaust gas flows in, a first outlet for discharging a first gas comprising a gas to be recovered of the detoxified exhaust gas, and a second outlet for discharging a second gas other than the first gas of the detoxified exhaust gas, and evacuated via the first outlet; and
a tube provided in the casing from the inlet to the second outlet, and having a high permeability to the first gas and a low permeability to the second gas.

2. The system of claim 1 , wherein the first gas comprises a helium gas as the gas to be recovered, a hydrogen gas, water vapor, and an oxygen gas, and the second gas comprises a nitrogen gas as the diluent gas, a carbon dioxide gas, and an argon gas.

3. The system of claim 2 , wherein the detoxifying device is configured to detoxify the diluted exhaust gas by removing a silane gas and an ammonia gas from the diluted exhaust gas.

4. A gas recovering method, wherein
a gas to be recovered is recovered by using a gas recovering apparatus comprising:
a casing provided with an inlet through which a gas generated due to manufacturing of a semiconductor device flows in after the gas is diluted and detoxified, a first outlet for discharging a first gas comprising the gas to be recovered of the gas, and a second outlet for discharging a second gas other than the first gas of the gas, and evacuated via the first outlet; and
a tube provided in the casing from the inlet to the second outlet, and having a high permeability to the first gas and a low permeability to the second gas, and
recovery of the gas to be recovered comprises:
generating a pressure difference between inside and outside of the tube in such a manner that outside of the tube has a lower pressure than inside of the tube in the casing; and
causing the first gas to permeate from inside to outside of the tube due to the pressure difference and to be discharged from the first outlet.

5. The method of claim 4 , further comprising separating the gas to be recovered from the first gas discharged from the first outlet.

6. The system of claim 1 , wherein the tube is provided in a spiral manner from the inlet to the second outlet.

7. The system of claim 1 , wherein the tube is provided to have a folded portion from the inlet to the second outlet.

8. The system of claim 1 , further comprising a pump connected to the first outlet.

9. The system of claim 8 , wherein
the pump evacuates the casing via the first outlet, thereby generating a pressure difference between inside and outside of the tube in such a manner that outside of the tube has a lower pressure than inside of the tube in the casing, and
the first gas permeates from inside to outside of the tube due to the pressure difference and is discharged from the first outlet.

10. The system of claim 9 , wherein the pump evacuates the casing to a vacuum state.

11. The system of claim 9 , wherein the gas to be recovered permeates from inside to outside of the tube according to a following expression;
V =( A×ΔP×L×S )/ d , where
V: a permeation volume of the gas to be recovered with respect to the tube,
A: a permeability coefficient of the gas to be recovered with respect to the tube,
ΔP: a pressure difference between inside and outside of the tube,
L: a length of the tube,
S: a cross-sectional area of a gas flow path in the tube, and
d: a difference between an inner radius and an outer radius of the tube.

12. The system of claim 8 , wherein the pump uses a same type of gas as the gas to be recovered as a seal gas.

13. The system of claim 8 , wherein the pump discharges the first gas toward a purification line of the gas to be recovered.

14. The system of claim 1 , wherein the tube comprises a porous material.

15. The system of claim 14 , wherein the tube comprises an organic material.

16. The system of claim 15 , wherein the tube comprises fluorine resin.

17. The system of claim 16 , wherein the first gas comprises a gas having a molecular weight smaller than that of the second gas and a diffusion coefficient higher than that of the second gas or a gas having a solubility in the tube, of the gas higher than that the second gas.

18. A gas recovering method, comprising:
diluting an exhaust gas, the exhaust gas is generated due to manufacturing of a semiconductor device by using a process gas comprising a gas to be recovered;
detoxifying the exhaust gas by burning the diluted exhaust gas by using an oxygen gas; and
recovering the gas to be recovered from the detoxified exhaust gas by a gas recovering apparatus, wherein
the gas recovering apparatus comprises a casing and a tube, the casing is provided with an inlet through which the detoxified exhaust gas flows in, a first outlet for discharging a first gas comprising a gas to be recovered of the detoxified exhaust gas, and a second outlet for discharging a second gas other than the first gas of the detoxified exhaust gas, and evacuated via the first outlet, and the tube is provided in the casing from the inlet to the second outlet, and has a high permeability to the first gas and a low permeability to the second gas, wherein
recovery of the gas to be recovered comprises:
generating a pressure difference between inside and outside of the tube in such a manner that outside of the tube has a lower pressure than inside of the tube in the casing; and
causing the first gas to permeate from inside to outside of the tube due to the pressure difference and to be discharged from the first outlet.

19. The method of claim 18 , further comprising separating the gas to be recovered from the first gas discharged from the first outlet.

20. The method of claim 18 , wherein
diluting the exhaust gas by a dilution device using a diluent gas, and
detoxifying the exhaust gas by burning the diluted exhaust gas by using an oxygen gas by a detoxifying device.

Assignees

• Kioxia Corp

Inventors

• Matsubara Yuya

Classifications

• B01D53/229 Primary

  Integrated processes (Diffusion and at least one other process, e.g. adsorption, absorption) · CPC title

• C01B23/0094 Primary

  Combined chemical and physical processing · CPC title

• B01D2053/223

  with hollow tubes · CPC title

• B01D2258/0216

  from CVD treatment or semi-conductor manufacturing · CPC title

• C01B2210/0031

  Helium · CPC title