Display device and manufacturing method of display device

Patent metadata

Field	Value
Publication number	US-11765942-B2
Application number	US-202016972766-A
Country	US
Kind code	B2
Filing date	Oct 30, 2020
Priority date	Sep 9, 2020
Publication date	Sep 19, 2023
Grant date	Sep 19, 2023

Abstract

A display device and a manufacturing method of the display device are provided. The display device includes a substrate; a pixel definition layer disposed on the substrate and having a plurality of pixel openings; a surface-active nanolayer disposed on a surface of the substrate and on a surface extending to the pixel definition layer, wherein the surface-active nanolayer covers a plurality of nanoparticles; and a light-emitting layer disposed in the plurality of pixel openings.

First claim

What is claimed is:

1. A display device, comprising:
a substrate;
a pixel definition layer disposed on the substrate and having a plurality of pixel openings;
a surface-active nanolayer disposed on a surface of the substrate and on a surface extending to the pixel definition layer, wherein the surface-active nanolayer covers a plurality of nanoparticles; and
a light-emitting layer disposed in the plurality of pixel openings.

2. The display device as claimed in claim 1 , wherein the surface-active nanolayer comprises a plurality of discontinuous nanoparticles, a material of the nanoparticles comprises a conductive metal or conductive macromolecules, and the conductive metal comprises gold nanoparticles or silver nanoparticles.

3. The display device as claimed in claim 1 , wherein a material of the surface-active nanolayer comprises poly(3,4-ethylenedioxythiophene) and polystyrene sulfonate, a ratio of the poly(3,4-ethylenedioxythiophene) to the polystyrene sulfonate ranges from 1:5 to 8:1, and a mass fraction of the poly(3,4-ethylenedioxythiophene) ranges from 25% to 40%.

4. The display device as claimed in claim 1 , wherein a maximum height of the nanoparticles is less than a thickness of the surface-active nanolayer.

5. The display device as claimed in claim 1 , wherein a maximum height of the nanoparticles ranges from 20 nm to 50 nm, and a thickness of the surface-active nanolayer ranges from 20 nm to 80 nm.

6. The display device as claimed in claim 1 , wherein an energy level of the surface-active nanolayer matches an energy level of the light-emitting layer.

7. The display device as claimed in claim 1 , wherein a surface of the surface-active nanolayer away from the substrate is smooth.

8. The display device as claimed in claim 1 , wherein a plurality of anodes are disposed on the surface of the substrate, the pixel definition layer comprises a plurality of walls, and each of the walls is disposed between a gap of two adjacent anodes.

9. A manufacturing method of a display device, comprising:
providing a substrate; manufacturing a pixel definition layer on the substrate, wherein the pixel definition layer has a plurality of pixel openings;
manufacturing a surface-active nanolayer on a surface of the substrate and a surface extending to the pixel definition layer, wherein the surface-active nanolayer covers a plurality of nanoparticles; and
manufacturing a light-emitting layer in the plurality of pixel openings to obtain the display device.

10. The manufacturing method as claimed in claim 9 , wherein a spin coating method, a coating method, a printing method, or an evaporation method is used for manufacturing the surface-active nanolayer, and the printing method, or the evaporation method is used for manufacturing the light-emitting layer.

11. The manufacturing method as claimed in claim 9 , wherein manufacturing the surface-active nanolayer comprises:
manufacturing a first solution mixed with nanoparticles;
spin coating the first solution on the surface of the substrate and the surface extending to the pixel definition layer;
drying and baking the first solution to remove a solvent of the first solution to obtain the plurality of nanoparticles;
manufacturing a second solution mixed with a surface-active agent;
spin coating the second solution on the surface of the substrate and the surface extending to the pixel definition layer; and
drying and baking the second solution to remove a solvent of the second solution to obtain the surface-active nanolayer, wherein the surface-active nanolayer covers the plurality of nanoparticles.

12. The manufacturing method as claimed in claim 9 , wherein manufacturing the surface-active nanolayer comprises:
manufacturing a third solution mixed with nanoparticles and a surface-active agent;
spin coating the third solution on the surface of the substrate and the surface extending to the pixel definition layer;
drying and baking the third solution to remove a solvent of the third solution to obtain the surface-active nanolayer, wherein the surface-active nanolayer covers the plurality of nanoparticles.

13. The manufacturing method as claimed in claim 9 , wherein the surface-active nanolayer comprises a plurality of discontinuous nanoparticles.

14. The manufacturing method as claimed in claim 9 , wherein a material of manufacturing the nanoparticles comprises a conductive metal or conductive macromolecules, and the conductive metal comprises gold nanoparticles or silver nanoparticles.

15. The manufacturing method as claimed in claim 9 , wherein a material of manufacturing the surface-active nanolayer comprises poly(3,4-ethylenedioxythiophene) and polystyrene sulfonate, a ratio of the poly(3,4-ethylenedioxythiophene) to the polystyrene sulfonate ranges from 1:5 to 8:1, and a mass fraction of the poly(3,4-ethylenedioxythiophene) ranges from 25% to 40%.

16. The manufacturing method as claimed in claim 9 , wherein a maximum height of the nanoparticles is less than a thickness of the surface-active nanolayer.

17. The manufacturing method as claimed in claim 9 , wherein a maximum height of the nanoparticles ranges from 20 nm to 50 nm, and a thickness of the surface-active nanolayer ranges from 20 nm to 80 nm.

18. The manufacturing method as claimed in claim 9 , wherein an energy level of a material of manufacturing the surface-active nanolayer matches an energy level of a material of manufacturing the light-emitting layer.

19. The manufacturing method as claimed in claim 9 , wherein manufacturing the surface-active nanolayer comprises performing a planarizing process on a surface of the surface-active nanolayer away from the substrate.

20. The manufacturing method as claimed in claim 9 , wherein the manufacturing method comprises manufacturing a plurality of anodes on the surface of the substrate, the pixel definition layer comprises a plurality of walls, and each of the walls is disposed between a gap of two adjacent anodes.

Assignees

• Tcl China Star Optoelectronics Tech Co Ltd

Inventors

• Huang Hui

Classifications

• H10K50/805

  Electrodes · CPC title

• H10K59/122 Primary

  Pixel-defining structures or layers, e.g. banks · CPC title

• C08L65/00 Primary

  Compositions of macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain (C08L7/00 - C08L57/00, C08L61/00 take precedence); Compositions of derivatives of such polymers · CPC title

• H10K50/11 Primary

  characterised by the electroluminescent [EL] layers · CPC title

• H10K71/135

  using ink-jet printing · CPC title