Measuring tape with variable mass along tape length
US-11236983-B2 · Feb 1, 2022 · US
US11761745B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11761745-B2 |
| Application number | US-202118019936-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 12, 2021 |
| Priority date | Aug 14, 2020 |
| Publication date | Sep 19, 2023 |
| Grant date | Sep 19, 2023 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
A measuring tape device may include a housing having an aperture, a reel assembly, a blade, and a piezoelectric bimorph layer. The reel assembly may be enclosed within the housing, and may be configured to alternately allow the blade to be withdrawn from the reel assembly through the aperture or received in the aperture onto the reel assembly. The blade may have a first end configured to extend from the housing through the aperture and a second end configured to be wound on the reel assembly. The piezoelectric bimorph layer may be disposed over at least a portion of the blade.
Opening claim text (preview).
That which is claimed: 1. A measuring tape device comprising: a housing having an aperture; a reel assembly enclosed within the housing, the reel assembly being configured to alternately allow the blade to be withdrawn from the reel assembly through the aperture or received in the aperture onto the reel assembly; a blade having a first end configured to extend from the housing through the aperture and a second end configured to be wound on the reel assembly; and a piezoelectric bimorph layer disposed over at least a portion of the blade. 2. The device of claim 1 , further comprising: a power source provided at a portion of the housing; and an actuator configured to apply an electric potential to the piezoelectric bimorph layer responsive to actuation of the actuator. 3. The device of claim 2 , wherein the power source comprises a battery. 4. The device of claim 2 , further comprising an applicator operably coupled to the power source and slidingly operably coupled to the piezoelectric bimorph layer to enable application of the electric potential to the piezoelectric bimorph layer responsive to actuation of the actuator. 5. The device of claim 2 , wherein the piezoelectric bimorph layer is disposed along a longitudinal centerline of the portion of the blade. 6. The device of claim 5 , wherein the piezoelectric bimorph layer extends transversely over substantially all of a width of the blade along the portion of the blade, and wherein the piezoelectric bimorph layer is oriented to bend along the longitudinal centerline of the blade when the electric potential is applied to the piezoelectric bimorph layer. 7. The device of claim 5 , wherein the piezoelectric bimorph layer extends transversely over substantially all of a width of the blade along the portion of the blade, and wherein the piezoelectric bimorph layer is oriented to bend about the longitudinal centerline of the blade when the electric potential is applied to the piezoelectric bimorph layer. 8. The device of claim 5 , wherein the piezoelectric bimorph layer is spaced apart from edges of the blade along the portion of the blade, and wherein the piezoelectric bimorph layer is oriented to bend along the longitudinal centerline of the blade when the electric potential is applied to the piezoelectric bimorph layer. 9. The device of claim 2 , wherein two instances of the piezoelectric bimorph layer are disposed on the blade, and wherein each of the two instances is proximate to a respective one of opposing lateral edges of the blade along the portion of the blade, and wherein the piezoelectric bimorph layer is oriented to bend along the longitudinal centerline of the blade when the electric potential is applied to the two instances of the piezoelectric bimorph layer. 10. The device of claim 2 , wherein the blade is flat. 11. The device of claim 2 , wherein the blade is cupped. 12. The device of claim 2 , wherein the piezoelectric bimorph layer is disposed along a top portion of the blade. 13. The device of claim 2 , wherein the piezoelectric bimorph layer is disposed along a bottom portion of the blade. 14. The device of claim 2 , wherein the piezoelectric bimorph layer is an internal layer of the blade. 15. A measuring assembly for a measuring tape device, the assembly comprising: a blade having a first end configured to extend from an aperture in a housing of the measuring tape device and a second end configured to be wound on a reel assembly of the measuring tape device; and a piezoelectric bimorph layer disposed over at least a portion of the blade, the piezoelectric bimorph layer being configured to bend responsive to application of an electric potential to the piezoelectric bimorph layer. 16. The measuring assembly of claim 15 , wherein the piezoelectric bimorph layer is disposed along a longitudinal centerline of the portion of the blade. 17. The measuring assembly of claim 16 , wherein the piezoelectric bimorph layer extends transversely over substantially all of a width of the blade along the portion of the blade, and wherein the piezoelectric bimorph layer is oriented to bend along the longitudinal centerline of the blade when the electric potential is applied to the piezoelectric bimorph layer. 18. The measuring assembly of claim 16 , wherein the piezoelectric bimorph layer extends transversely over substantially all of a width of the blade along the portion of the blade, and wherein the piezoelectric bimorph layer is oriented to bend about the longitudinal centerline of the blade when the electric potential is applied to the piezoelectric bimorph layer. 19. The measuring assembly of claim 16 , wherein the piezoelectric bimorph layer is spaced apart from edges of the blade along the portion of the blade, and wherein the piezoelectric bimorph layer is oriented to bend along the longitudinal centerline of the blade when the electric potential is applied to the piezoelectric bimorph layer. 20. The measuring assembly of claim 15 , wherein two instances of the piezoelectric bimorph layer are disposed on the blade, and wherein each of the two instances is proximate to a respective one of opposing lateral edges of the blade along the portion of the blade, and wherein the piezoelectric bimorph layer is oriented to bend along the longitudinal centerline of the blade when the electric potential is applied to the two instances of the piezoelectric bimorph layer.
characterised by structure or material; characterised by layout or indicia · CPC title
Means for locking · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.