Method for producing black plated resin part

US11761106B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11761106-B2
Application numberUS-202117384552-A
CountryUS
Kind codeB2
Filing dateJul 23, 2021
Priority dateSep 26, 2018
Publication dateSep 19, 2023
Grant dateSep 19, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for producing a black plated resin part includes the steps of electroplating a resin substrate provided with an underlying plating layer in a trivalent chromium plating bath containing thiocyanic acid, to thereby form, on the underlying plating layer, a black chromium plating layer composed of trivalent chromium and having a thickness of 0.15 μm or more; and immersing the resin substrate provided with the black chromium plating layer in warm water at 30° C. or higher for a predetermined time. In the method, the amount of thiocyanic acid contained in the trivalent chromium plating bath, the temperature of the warm water, and the time of immersion of the resin substrate in the warm water are adjusted so that the black chromium plating layer exhibits a b* value of −1.7 or less based on the L*a*b* color system.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for producing a black plated resin part, comprising the steps of: electroplating a resin substrate provided with an underlying plating layer in a trivalent chromium plating bath containing thiocyanic acid, to thereby form, on the underlying plating layer, a black chromium plating layer composed of trivalent chromium and having a thickness of 0.15 μm or more; and immersing the resin substrate provided with the black chromium plating layer in warm water at 30° C. or higher for a predetermined time, wherein the amount of thiocyanic acid contained in the trivalent chromium plating bath, the temperature of the warm water, and the time of immersion of the resin substrate in the warm water are adjusted so that the black chromium plating layer exhibits a b* value of −1.7 or less based on the L*a*b* color system, and the trivalent chromium in the black chromium plating layer is present as metallic chromium, chromium oxide, and chromium hydroxide. 2. The method according to claim 1 , wherein, in a surface region of the black chromium plating layer having a depth of at least 23 nm as measured from the surface of the black chromium plating layer, the compositional proportions of metallic chromium, chromium oxide, and chromium hydroxide satisfy the following relations: b+c>4a and c>0.8b wherein a, b, and c represent the compositional proportions of metallic chromium, chromium oxide, and chromium hydroxide, respectively (note: a>0, b>0, and c>0).

Assignees

Inventors

Classifications

  • C25D3/06Primary

    from solutions of trivalent chromium · CPC title

  • of plastics · CPC title

  • After-treatment of electroplated surfaces · CPC title

  • two or more layers being of nickel or chromium, e.g. duplex or triplex layers · CPC title

  • including at least one metal matrix material comprising a mixture of at least two metals or metal phases or metal matrix composites, e.g. metal matrix with embedded inorganic hard particles, CERMET, MMC. · CPC title

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What does patent US11761106B2 cover?
A method for producing a black plated resin part includes the steps of electroplating a resin substrate provided with an underlying plating layer in a trivalent chromium plating bath containing thiocyanic acid, to thereby form, on the underlying plating layer, a black chromium plating layer composed of trivalent chromium and having a thickness of 0.15 μm or more; and immersing the resin substra…
Who is the assignee on this patent?
Toyoda Gosei Kk
What technology area does this patent fall under?
Primary CPC classification C25D3/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 19 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).