Semiconductor process wastewater treatment system and semiconductor process wastewater treatment method using the same

Patent metadata

Field	Value
Publication number	US-11760674-B2
Application number	US-202117511401-A
Country	US
Kind code	B2
Filing date	Oct 26, 2021
Priority date	Oct 26, 2020
Publication date	Sep 19, 2023
Grant date	Sep 19, 2023

Abstract

A semiconductor process wastewater treatment system and a semiconductor process wastewater treatment method using the same are disclosed. The disclosed semiconductor process wastewater treatment system may comprises: a processing unit configured to receive semiconductor process wastewater and treats the semiconductor process wastewater through a plurality of operations; and a membrane filtration tank arranged separately from the processing unit, the membrane filtration tank having a ceramic nano-membrane for filtering the semiconductor process wastewater which has passed through the processing unit, wherein the ceramic nano-membrane may include a carbon-based nano-material. The ceramic nano-membrane may include a graphene-based nano-material as the carbon-based nano-material.

First claim

What is claimed is:

1. A semiconductor process wastewater treatment system comprising:
a processing unit configured to receive semiconductor process wastewater and treat the semiconductor process wastewater through a plurality of operations, wherein the processing unit includes a Bardenpho processing unit, the processing unit includes a first anoxic tank, a first oxic tank, a second anoxic tank, and a second oxic tank which are sequentially arranged from an inlet portion to which the semiconductor process wastewater is introduced, and the second oxic tank is configured to remove nitrogen gas in the semiconductor process wastewater and oxidize residual nitrogen components into ammonium components (NH 4 + );
a membrane filtration tank arranged separately from the processing unit, the membrane filtration tank having a ceramic nano-membrane for filtering the semiconductor process wastewater which has passed through the processing unit,
wherein the ceramic nano-membrane includes a carbon-based nano-material, the ceramic nano-membrane includes graphene oxide as the carbon-based nano-material, and a content of the carbon-based nano-material in the ceramic nano-membrane is 1 wt % to 2 wt % of the total weight of the ceramic nano-membrane; and
a clarifier disposed between the processing unit and the membrane filtration tank, wherein the clarifier is disposed between the second oxic tank and the membrane filtration tank,
wherein the semiconductor process wastewater treatment system is configured to remove nitrogen components and fluorine components in the semiconductor process wastewater without injecting a carbon source from outside.

2. The semiconductor process wastewater treatment system of the claim 1 , wherein the ceramic nano-membrane includes a membrane body formed of an inorganic material; and a coating layer, the coating layer being formed on a surface of the membrane body and including the carbon-based nano-material.

3. The semiconductor process wastewater treatment system of the claim 1 , wherein the ceramic nano-membrane is a nanofiltration class membrane having an average pore size of about 0.01 μm or less.

4. The semiconductor process wastewater treatment system of the claim 1 , wherein the ceramic nano-membrane contains negative charges on a surface of the ceramic nano-membrane.

5. The semiconductor process wastewater treatment system of the claim 1 , wherein the ceramic nano-membrane is configured to filter nitrogen and nitrogen-containing components.

6. The semiconductor process wastewater treatment system of the claim 1 , wherein the ceramic nano-membrane is configured to filter fluorine and fluorine-containing components.

7. The semiconductor process wastewater treatment system of the claim 1 , wherein at least part of an activated sludge precipitated by the clarifier is returned to the front end of the processing unit.

8. The semiconductor process wastewater treatment system of the claim 1 , wherein the semiconductor process wastewater which has passed through the clarifier is discharged after passing through the membrane filtration tank.

9. A semiconductor process wastewater treatment method for treating semiconductor process wastewater by using the semiconductor process wastewater treatment system according to claim 1 .

Assignees

• Sk Hynix Inc
• Ewha University—Industry Collaboration Found

Inventors

• Ahn Sehyuk
• Park Chanhyuk
• Kim Soyoun
• Cha Minju

Classifications

• B01D71/024

  Oxides · CPC title

• B01D71/0211

  Graphene or derivates thereof · CPC title

• B01D2325/0283

  Pore size · CPC title

• B01D71/24 Primary

  Rubbers · CPC title

• C02F1/442 Primary

  by nanofiltration · CPC title