Uncooled ir detector arrays based on nanoelectromechanical systems
US-2015253196-A1 · Sep 10, 2015 · US
US11757428B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11757428-B2 |
| Application number | US-202217853987-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 30, 2022 |
| Priority date | Dec 27, 2016 |
| Publication date | Sep 12, 2023 |
| Grant date | Sep 12, 2023 |
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This invention provides electromechanical resonators based on metal chalcogenide nanotubes. The invention further provides methods of fabrication of electromechanical resonators and methods of use of such electromechanical resonators.
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The invention claimed is: 1. A method of fabrication of an electromechanical resonator, said method comprising: providing a substrate; applying at least a first pad and a second pad onto said substrate such that said pads are not in contact with each other; applying at least one metal-chalcogenide nanotube onto said pads such that a first region of said nanotube is in contact with said first pad and a second region of said nanotube is in contact with said second pad; applying a pedal on top of said nanotube, such that said pedal is in contact with said nanotube, wherein said pedal is of a rectangular shape and is attached to said nanotube such that the longer dimension of said rectangle is positioned perpendicular to the longer dimension of said nanotube; and wherein said rectangular pedal is positioned asymmetrically with respect to said nanotube; and removing a substrate surface layer underneath said nanotube, thus suspending said nanotube over said substrate. 2. The method of claim 1 , wherein said substrate comprises Si coated by SiO 2 . 3. The method of claim 1 , wherein said pads comprise chromium layer coated by gold layer. 4. The method of claim 1 , wherein the step of applying said pads comprises photolithography and metal deposition. 5. The method of claim 1 , wherein the step of applying at least one metal-chalcogenide nanotube, comprises dry dispersion of said nanotube. 6. The method of claim 1 , wherein the step of removing a substrate surface layer underneath said nanotube comprises etching said substrate layer using hydrofluoric acid (HF). 7. The method of claim 6 , wherein said etching is followed by critical point drying (CPD). 8. The method of claim 1 , wherein following said step of removing a substrate surface layer, said pedal is suspended over said substrate. 9. The method of claim 1 , further comprising fabricating at least one electrode on said substrate.
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