Synthetic cvd diamond
US-2019211473-A1 · Jul 11, 2019 · US
US11753740B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11753740-B2 |
| Application number | US-202017099229-A |
| Country | US |
| Kind code | B2 |
| Filing date | Nov 16, 2020 |
| Priority date | Nov 18, 2019 |
| Publication date | Sep 12, 2023 |
| Grant date | Sep 12, 2023 |
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A method for manufacturing diamond substrate of using source gas containing hydrocarbon gas and hydrogen gas to form diamond crystal on an underlying substrate by CVD method, to form a diamond crystal layer having nitrogen-vacancy centers in at least part of the diamond crystal, nitrogen or nitride gas is mixed in the source gas, wherein the source gas is: 0.005 volume % or more and 6.000 volume % or less of the hydrocarbon gas; 93.500 volume % or more and less than 99.995 volume % of the hydrogen gas; and 5.0×10 −5 volume % or more and 5.0×10 −1 volume % or less of the nitrogen gas or the nitride gas, and the diamond crystal layer having the nitrogen-vacancy centers is formed. A method for manufacturing a diamond substrate to form an underlying substrate, a diamond crystal having a dense nitrogen-vacancy centers (NVCs) with an orientation of NV axis by performing the CVD.
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The invention claimed is: 1. A diamond substrate comprising a diamond crystal layer having nitrogen-vacancy centers and no silicon-vacancy centers, wherein a light intensity I NV− of an NV − center light (wavelength: 637 nm) is I NV− ≥2800 counts when the diamond crystal layer having the nitrogen-vacancy centers and no silicon-vacancy centers is measured by a photoluminescence apparatus under conditions: an excitation light wavelength of 532 nm; an excitation light intensity of 2.0 mW; a total time of 1 second; a total number of 3 times; a hole diameter of 100 μm; an objective lens with a magnification of 15; and measurement in room temperature of 298 K. 2. The diamond substrate according to claim 1 , wherein a ratio I NV− /IRaman of a light intensity I NV− of an NV − center light (wavelength: 637 nm) and a light intensity IRaman of a Raman scattered light (wavelength: 573 nm) is I NV− /IRaman≥0.04 when the diamond crystal layer having the nitrogen-vacancy centers and no silicon-vacancy centers is measured by the photoluminescence apparatus under conditions: an excitation light wavelength of 532 nm; an excitation light intensity of 2.0 mW; a total time of 1 second; a total number of 3 times; a hole diameter of 100 μm; an objective lens with a magnification of 15; and measurement in room temperature of 298 K. 3. The diamond substrate according to claim 1 , wherein a nitrogen concentration [N] in the diamond crystal layer having the nitrogen-vacancy centers and no silicon-vacancy centers is 5×10 17 atoms/cm 3 ≤[N]≤9×10 19 atoms/cm 3 . 4. The diamond substrate according to claim 1 , wherein an average surface roughness Ra of a surface of the diamond crystal layer having the nitrogen-vacancy centers and no silicon-vacancy centers is Ra≤270 nm.
using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets · CPC title
Diamond · CPC title
doping or introduction of a secondary phase in the diamond · CPC title
Epitaxial-layer growth · CPC title
characterised by the substrate · CPC title
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