Diamond substrate and method for manufacturing the same

US11753740B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11753740-B2
Application numberUS-202017099229-A
CountryUS
Kind codeB2
Filing dateNov 16, 2020
Priority dateNov 18, 2019
Publication dateSep 12, 2023
Grant dateSep 12, 2023

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method for manufacturing diamond substrate of using source gas containing hydrocarbon gas and hydrogen gas to form diamond crystal on an underlying substrate by CVD method, to form a diamond crystal layer having nitrogen-vacancy centers in at least part of the diamond crystal, nitrogen or nitride gas is mixed in the source gas, wherein the source gas is: 0.005 volume % or more and 6.000 volume % or less of the hydrocarbon gas; 93.500 volume % or more and less than 99.995 volume % of the hydrogen gas; and 5.0×10 −5 volume % or more and 5.0×10 −1 volume % or less of the nitrogen gas or the nitride gas, and the diamond crystal layer having the nitrogen-vacancy centers is formed. A method for manufacturing a diamond substrate to form an underlying substrate, a diamond crystal having a dense nitrogen-vacancy centers (NVCs) with an orientation of NV axis by performing the CVD.

First claim

Opening claim text (preview).

The invention claimed is: 1. A diamond substrate comprising a diamond crystal layer having nitrogen-vacancy centers and no silicon-vacancy centers, wherein a light intensity I NV− of an NV − center light (wavelength: 637 nm) is I NV− ≥2800 counts when the diamond crystal layer having the nitrogen-vacancy centers and no silicon-vacancy centers is measured by a photoluminescence apparatus under conditions: an excitation light wavelength of 532 nm; an excitation light intensity of 2.0 mW; a total time of 1 second; a total number of 3 times; a hole diameter of 100 μm; an objective lens with a magnification of 15; and measurement in room temperature of 298 K. 2. The diamond substrate according to claim 1 , wherein a ratio I NV− /IRaman of a light intensity I NV− of an NV − center light (wavelength: 637 nm) and a light intensity IRaman of a Raman scattered light (wavelength: 573 nm) is I NV− /IRaman≥0.04 when the diamond crystal layer having the nitrogen-vacancy centers and no silicon-vacancy centers is measured by the photoluminescence apparatus under conditions: an excitation light wavelength of 532 nm; an excitation light intensity of 2.0 mW; a total time of 1 second; a total number of 3 times; a hole diameter of 100 μm; an objective lens with a magnification of 15; and measurement in room temperature of 298 K. 3. The diamond substrate according to claim 1 , wherein a nitrogen concentration [N] in the diamond crystal layer having the nitrogen-vacancy centers and no silicon-vacancy centers is 5×10 17 atoms/cm 3 ≤[N]≤9×10 19 atoms/cm 3 . 4. The diamond substrate according to claim 1 , wherein an average surface roughness Ra of a surface of the diamond crystal layer having the nitrogen-vacancy centers and no silicon-vacancy centers is Ra≤270 nm.

Assignees

Inventors

Classifications

  • C23C16/277Primary

    using other elements in the gas phase besides carbon and hydrogen; using other elements besides carbon, hydrogen and oxygen in case of use of combustion torches; using other elements besides carbon, hydrogen and inert gas in case of use of plasma jets · CPC title

  • C30B29/04Primary

    Diamond · CPC title

  • doping or introduction of a secondary phase in the diamond · CPC title

  • Epitaxial-layer growth · CPC title

  • characterised by the substrate · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11753740B2 cover?
A method for manufacturing diamond substrate of using source gas containing hydrocarbon gas and hydrogen gas to form diamond crystal on an underlying substrate by CVD method, to form a diamond crystal layer having nitrogen-vacancy centers in at least part of the diamond crystal, nitrogen or nitride gas is mixed in the source gas, wherein the source gas is: 0.005 volume % or more and 6.000 volum…
Who is the assignee on this patent?
Shinetsu Chemical Co, Univ Nat Corp Kanazawa
What technology area does this patent fall under?
Primary CPC classification C23C16/277. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 12 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).