Cobalt complex, method for manufacturing same, and method for manufacturing cobalt-containing thin film

US11753429B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11753429-B2
Application numberUS-201917292819-A
CountryUS
Kind codeB2
Filing dateNov 8, 2019
Priority dateNov 12, 2018
Publication dateSep 12, 2023
Grant dateSep 12, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

To provide a cobalt complex which is liquid at room temperature, useful for producing a cobalt-containing thin film under conditions without using an oxidizing gas.A cobalt complex represented by the following formula (1):wherein L1 and L2 represent a unidentate amide ligand of the following formula (A), a bidentate amide ligand of the following formula (B) or a hetero atom-containing ligand of the following formula (C):wherein R1 and R2 represent a C1-6 alkyl group or a tri(C1-6 alkyl)silyl group, and the wave line represents a binding site to the cobalt atom;wherein R3 represents a tri(C1-6 alkyl)silyl group, R4 and R5 represent a C1-4 alkyl group, and X represents a C1-6 alkylene group;wherein R6 and R8 represent a C1-6 alkyl group, R7 represents a hydrogen atom or a C1-4 alkyl group, Y represents an oxygen atom or NR9, Z represents an oxygen atom or NR10, and R9 and R10 independently represent a C1-6 alkyl group.

First claim

Opening claim text (preview).

The invention claimed is: 1. A cobalt complex represented by the following formula (1): wherein L 1 and L 2 which are different from each other represent a unidentate amide ligand represented by the following formula (A), a bidentate amide ligand represented by the following formula (B) or a hetero atom-containing ligand represented by the following formula (C), wherein the cobalt complex is a liquid at room temperature, wherein L 1 is represented by the formula (A) or (C), and L 2 is represented by the formula (B): wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, and the wave line represents a binding site to the cobalt atom; wherein R 3 represents a tri(C 1-6 alkyl)silyl group, R 4 and R 5 independently represent a C 1-4 alkyl group, and X represents a C 1-6 alkylene group; wherein R 6 and R 8 independently represent a C 1-6 alkyl group, R 7 represents a hydrogen atom or a C 1-4 alkyl group, Y represents an oxygen atom or NR 9 , Z represents an oxygen atom or NR 10 , and R 9 and R 10 independently represent a C 1-6 alkyl group. 2. The cobalt complex according to claim 1 , which is represented by the following formula (1AB): wherein R 1 and R 2 are as defined for R 1 and R 2 in the above formula (A), and R 3 , R 4 , R 5 and X are as defined for R 3 , R 4 , R 5 and X in the above formula (B). 3. The cobalt complex according to claim 2 , wherein R 1 , R 2 and R 3 are a tri(C 1-4 alkyl)silyl group, R 4 and R 5 are a methyl group or an ethyl group, and X is a C 1-4 alkylene group. 4. The cobalt complex according to claim 2 , wherein R 1 , R 2 and R 3 are a trimethylsilyl group, R 4 and R 5 are a methyl group or an ethyl group, and X is a C 1-4 alkylene group. 5. A cobalt complex represented by the following formula (1AC): wherein the cobalt complex is a liquid at room temperature, wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group; and wherein R 6 and R 8 independently represent a C 1-6 alkyl group, R 7 represents a hydrogen atom or a C 1-4 alkyl group, Y represents an oxygen atom or NR 9 , Z represents an oxygen atom or NR 10 and R 9 and R 10 independently represent a C 1-6 alkyl group. 6. The cobalt complex according to claim 5 , wherein R 1 and R 2 are a tri(C 1-4 alkyl)silyl group, R 6 and R 8 are a methyl group, R 7 is a hydrogen atom, Y is NR 9 , Z is NR 10 and R 9 and R 10 are a C 1-4 alkyl group. 7. The cobalt complex according to claim 5 , wherein R 1 and R 2 are a trimethylsilyl group, R 6 and R 8 are a methyl group, R 7 is a hydrogen atom, Y is NR 9 , Z is NR 10 , and R 9 and R 10 are a C 1-4 alkyl group. 8. The cobalt complex according to claim 1 , which is represented by the following formula (1BC): wherein R 3 , R 4 , R 5 and X are as defined for R 3 , R 4 , R 5 and X in the above formula (B), and R 6 , R 7 , R 8 , Y and Z are as defined for R 6 , R 7 , R 8 , Y and Z in the above formula (C). 9. The cobalt complex according to claim 8 , wherein R 3 is a tri(C 1-4 alkyl)silyl group, R 4 and R 5 are a methyl group or an ethyl group, X is a C 1-4 alkylene group, R 6 and R 8 are a C 1-4 alkyl group, R 7 is a hydrogen atom, and Y and Z are an oxygen atom. 10. The cobalt complex according to claim 8 , wherein R 3 is a trimethylsilyl group, R 4 and R 5 are a methyl group or an ethyl group, X is a C 1-4 alkylene group, R 6 and R 8 are a C 1-4 alkyl group, R 7 is a hydrogen atom, and Y and Z are an oxygen atom. 11. A method for producing a cobalt complex represented by the following formula (1AB), which comprises reacting a bisamide complex represented by the following formula (2) and an aminoalkylamine represented by the following formula (3): wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, D represents a neutral ligand, and n represents 0 or 1; wherein R 3 represents a tri(C 1-6 alkyl)silyl group, R 4 and R 5 independently represent a C 1-6 alkyl group, and X represents a C 1-6 alkylene group; wherein R 1 and R 2 are as defined for R 1 and R 2 in the above formula (2), R 3 , R 4 , R 5 and X are as defined for R 3 , R 4 , R 5 and X in the above formula (3). 12. A method for producing the cobalt complex of claim 5 , which comprises reacting a bisamide complex represented by the following formula (2) and a hetero atom-containing compound represented by the following formula (4) to provide the complex represented by the formula (1AC) of claim 5 : wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, D represents a neutral ligand, and n represents 0 or 1: wherein R 6 and R 8 independently represent a C 1-6 alkyl group, R 7 represents a hydrogen atom or a C 1-4 alkyl group, Y represents an oxygen atom or NR 9 , Z represents an oxygen atom or NR 10 , and R 9 and R 10 independently represent a C 1-6 alkyl group. 13. A method for producing a cobalt complex represented by the following formula (1BC), which comprises reacting a cobalt complex represented by the following formula (1AB) and a hetero atom-containing compound represented by the following formula (4): wherein R 1 and R 2 independently represent a C 1-6 alkyl group or a tri(C 1-6 alkyl)silyl group, R 3 represents a tri(C 1-6 alkyl)silyl group, R 4 and R 5 independently represent a C 1-4 alkyl group, and X represents a C 1-6 alkylene group; wherein R 6 and R 8 independently represent a C 1-6 alkyl group, R 7 represents a hydrogen atom or a C 1-4 alkyl group, Y represents an oxygen atom or NR 9 , Z represents an oxygen atom or NR 10 and R 9 and R 10 independently represent a C 1-6 alkyl group; wherein R 3 , R 4 , R 5 and X are as defined for R 3 , R 4 , R 5 and X in the above formula (1AB), and R 6 , R 7 , R 8 , Y and Z are as defined for R 6 , R 7 , R 8 , Y and Z in the above formula (4). 1

Assignees

Inventors

Classifications

  • Acetylacetone, i.e. 2,4-pentanedione · CPC title

  • by evaporation without using carrier gas in contact with the source material (C23C16/4486 takes precedence) · CPC title

  • Ketones containing more than one keto group · CPC title

  • from metallo-organic compounds · CPC title

  • characterized by the use of precursors specially adapted for ALD · CPC title

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What does patent US11753429B2 cover?
To provide a cobalt complex which is liquid at room temperature, useful for producing a cobalt-containing thin film under conditions without using an oxidizing gas.A cobalt complex represented by the following formula (1):wherein L1 and L2 represent a unidentate amide ligand of the following formula (A), a bidentate amide ligand of the following formula (B) or a hetero atom-containing ligand of…
Who is the assignee on this patent?
Tosoh Corp, Sagami Chem Res Inst
What technology area does this patent fall under?
Primary CPC classification C07F15/06. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 12 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 4 related publications on this page (citations in our corpus or others sharing the same primary CPC).