Mask, preparation method and operation method thereof

US11746406B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11746406-B2
Application numberUS-201716072359-A
CountryUS
Kind codeB2
Filing dateDec 18, 2017
Priority dateJun 2, 2017
Publication dateSep 5, 2023
Grant dateSep 5, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A mask, and a preparation method and an operation method thereof are disclosed. The mask includes: a support and a mask strip mounted on the support, the mask strip including at least two connecting portions connected with the support, and a pattern portion located between the connecting portions, the pattern portion including a first outer surface, and the connecting portion including a second outer surface; wherein the second outer surface and the first outer surface are non-coplanar with each other.

First claim

Opening claim text (preview).

The invention claimed is: 1. A mask, comprising: a support and a mask strip mounted on the support, the mask strip comprising at least two connecting portions each connected with the support, and a pattern portion located between the at least two connecting portions, the pattern portion comprising a first outer surface, and each of the at least two connecting portions comprising a second outer surface; wherein the support is provided on a side of the mask strip distal to the first outer surface, the support comprises a main body and two side portions provided on opposite sides of the main body, the main body is a square frame, the pattern portion of the mask is supported by the main body, the at least two connecting portions of the mask strip are respectively mounted on the two side portions, the main body comprises a first main surface and a second main surface opposite to each other, each of the two side portions comprises a third outer surface, and the first main surface is connected with the third outer surface, wherein an included angle between the second outer surface and the first outer surface is greater than 180 degrees and less than 270 degrees, the third outer surface of each of the two side portions is in two-stair-step shape and comprises a first sub-surface, a second sub-surface, a third sub-surface and a fourth sub-surface which are sequentially connected, the first sub-surface is connected with the first main surface of the main body, the first sub-surface and the first main surface of the main body intersect with each other to form a first boundary, and the third sub-surface and the fourth sub-surface intersect with each other to form a second boundary; an included angle between a plane defined by the first boundary and the second boundary and the fourth sub-surface is greater than an included angle between the third sub-surface and the fourth sub-surface, and the second outer surface is fixed onto the fourth sub-surface, wherein each of the at least two connecting portions of the mask strip is supported by both an edge where the first main surface of the main body and the third outer surface of each of the two side portions intersect with each other and an edge where the second sub-surface and the third sub-surface intersect with each other. 2. The mask according to claim 1 , wherein a substrate to be coated is provided on the first outer surface of the pattern portion, and the second outer surface of each of the at least two connecting portions is further away from the substrate to be coated with respect to the first outer surface of the pattern portion. 3. The mask according to claim 1 , wherein the at least two connecting portions comprise a first connecting portion and a second connecting portion, and an included angle between a second outer surface of the first connecting portion and the first outer surface of the pattern portion is equal to an included angle between a second outer surface of the second connecting portion and the first outer surface of the pattern portion. 4. The mask according to claim 1 , wherein a portion of the mask strip at a joint between each of the at least two connecting portions and the pattern portion is supported by an edge of the support where the first main surface of the main body and the third outer surface of each of the two side portions intersect with each other. 5. The mask according to claim 4 , wherein the edge of the support where the first main surface of the main body and the third outer surface of each of the two side portions intersect with each other is rounded or chamfered. 6. A method of preparation a mask, comprising: providing a support and mounting a mask strip on the support; wherein the mask strip comprises at least two connecting portions each connected with the support, and a pattern portion located between the at least two connecting portions, the pattern portion comprises a first outer surface, and each of the at least two connecting portions comprises a second outer surface; and the second outer surface and the first outer surface are non-coplanar with each other, wherein the support is provided on a side of the mask strip distal to the first outer surface, the support comprises a main body and two side portions provided on opposite sides of the main body, the main body is a square frame, the pattern portion of the mask is supported by the main body, the at least two connecting portions of the mask strip are respectively mounted on the two side portions, the main body comprises a first main surface and a second main surface opposite to each other, each of the two side portions comprises a third outer surface, and the first main surface is connected with the third outer surface, wherein an included angle between the second outer surface and the first outer surface is greater than 180 degrees and less than 270 degrees, the third outer surface of each of the two side portions is in two-stair-step shape and comprises a first sub-surface, a second sub-surface, a third sub-surface and a fourth sub-surface which are sequentially connected, the first sub-surface is connected with the first main surface of the main body, the first sub-surface and the first main surface of the main body intersect with each other to form a first boundary, and the third sub-surface and the fourth sub-surface intersect with each other to form a second boundary; an included angle between a plane defined by the first boundary and the second boundary and the fourth sub-surface is greater than an included angle between the third sub-surface and the fourth sub-surface, and the second outer surface is fixed onto the fourth sub-surface, wherein each of the at least two connecting portions of the mask strip is supported by both an edge where the first main surface of the main body and the third outer surface each of the two side portions intersect with each other and an edge where the second sub-surface and the third sub-surface intersect with each other. 7. An operation method of the mask according to claim 1 , comprising: placing a substrate on the mask, wherein a surface of the substrate to be coated is in contact with the first outer surface of the mask, and the surface of the substrate to be coated is in non-contact with the second outer surface of the mask.

Assignees

Inventors

Classifications

  • Mask-wafer alignment · CPC title

  • C23C14/042Primary

    using masks · CPC title

  • Stencils (B05C17/04 takes precedence; stencils used in connection with printing plates or foils B41N1/24; drawing accessories B43L13/00) · CPC title

  • Masking devices (stencils B05C17/06; masking devices for which the means for applying liquids or other fluent material is spraying or is not important B05B12/20) · CPC title

  • Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof · CPC title

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What does patent US11746406B2 cover?
A mask, and a preparation method and an operation method thereof are disclosed. The mask includes: a support and a mask strip mounted on the support, the mask strip including at least two connecting portions connected with the support, and a pattern portion located between the connecting portions, the pattern portion including a first outer surface, and the connecting portion including a second…
Who is the assignee on this patent?
Boe Technology Group Co Ltd, Ordos Yuansheng Optoelectronics Co Ltd
What technology area does this patent fall under?
Primary CPC classification C23C14/042. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 05 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).