Ultrasonic tank and methods for uniform glass substrate etching
US-2016035587-A1 · Feb 4, 2016 · US
US11740454B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11740454-B2 |
| Application number | US-201816954990-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 26, 2018 |
| Priority date | Mar 26, 2018 |
| Publication date | Aug 29, 2023 |
| Grant date | Aug 29, 2023 |
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In one inventive concept, a method for etching an optic includes obtaining a microemulsion, where the microemulsion includes a continuous oil phase, a surfactant system comprising at least one surfactant, and water, submerging at least a portion of the optic in the microemulsion, and agitating by ultrasonication the microemulsion for etching the optic submerged therein.
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What is claimed is: 1. A method for etching an optic, the method comprising: obtaining a microemulsion, wherein the microemulsion comprises a continuous oil phase, a surfactant system comprising at least one surfactant, and water; submerging at least a portion of the optic in the microemulsion; and agitating by ultrasonication the microemulsion for etching the optic submerged therein. 2. The method as recited in claim 1 , wherein the microemulsion comprises an effective amount of the surfactant system to disperse the water in the continuous oil phase. 3. The method as recited in claim 1 , wherein the microemulsion is a water-in-oil emulsion. 4. The method as recited in claim 1 , wherein the continuous oil phase is present in the microemulsion in a range of about 60 wt % to about 90 wt % relative to a total weight of the microemulsion. 5. The method as recited in claim 1 , wherein the continuous oil phase is present in the microemulsion in a range of about 70 wt % to about 85 wt % relative to a total weight of the microemulsion. 6. The method as recited in claim 1 , wherein the surfactant system is present in the microemulsion in a range of about 10 wt % to about 40 wt % relative to a total weight of the microemulsion. 7. The method as recited in claim 1 , wherein the surfactant system is present in the microemulsion in a range of about 13 wt % to about 29 wt % relative to a total weight of the microemulsion. 8. The method as recited in claim 1 , wherein the water is present in the microemulsion in a range of greater than 0 wt % to about 10 wt % relative to total weight of the microemulsion. 9. The method as recited in claim 1 , wherein the surfactant system comprises the surfactant and a co-surfactant, wherein a ratio by weight of the surfactant to the co-surfactant is 3:2. 10. The method as recited in claim 9 , wherein the co-surfactant is a n-alcohol. 11. The method as recited in claim 1 , wherein the water is deuterated water (D 2 O). 12. The method as recited in claim 1 , wherein the microemulsion is in a single isotropic phase. 13. The method as recited in claim 1 , wherein the continuous oil phase is a nonpolar aprotic solvent. 14. The method as recited in claim 1 , wherein the continuous oil phase comprises a component selected from the group consisting of: toluene and cyclohexane. 15. The method as recited in claim 1 , wherein the at least one surfactant includes a nonionic surfactant. 16. The method as recited in claim 1 , wherein the surfactant system comprises at least one surfactant selected from the group consisting of: polyethylene glycol tert-octylphenyl ether and polyoxyethylene (5) nonylphenylether. 17. The method as recited in claim 1 , wherein the ultrasonication has a frequency in a range of about 20 kHz to about 300 kHz. 18. A system for etching an optic, the system comprising: a chamber; a solution in the chamber, wherein the solution is a microemulsion comprising a continuous oil phase, at least one surfactant, and water; and an ultrasonic device, wherein the ultrasonic device is configured to agitate the solution in the chamber. 19. The system as recited in claim 18 , wherein the ultrasonic device provides a frequency in a range of about 20 kHz to about 300 kHz. 20. The method as recited in claim 1 , wherein a mass ratio of the surfactant system to the water is in a range of about 4:1 to about 14:1.
with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation (G02B1/18 takes precedence; cleaning in general B08B) · CPC title
making use of electrical energy (B06B1/18, B06B1/20 take precedence) · CPC title
Etching, surface-brightening or pickling compositions (for glass C03C15/00, {C03C25/66; for mortars, concrete, artificial or natural stone or ceramics C04B41/5338}; for metallic material C23F, C23G1/00, C25F1/00; {for semi-conductors H10P52/40}) · CPC title
Specific application · CPC title
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