Atomic number (Z) grade shielding materials and methods of making atomic number (Z) grade shielding

US11724834B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11724834-B2
Application numberUS-202117176710-A
CountryUS
Kind codeB2
Filing dateFeb 16, 2021
Priority dateJul 30, 2015
Publication dateAug 15, 2023
Grant dateAug 15, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In some aspects, this disclosure relates to improved Z-grade materials, such as those used for shielding, systems incorporating such materials, and processes for making such Z-grade materials. In some examples, the Z-grade material includes a diffusion zone including mixed metallic alloy material with both a high atomic number material and a lower atomic number material. In certain examples, a process for making Z-grade material includes combining a high atomic number material and a low atomic number material, and bonding the high atomic number material and the low atomic number together using diffusion bonding. The processes may include vacuum pressing material at an elevated temperature, such as a temperature near a softening or melting point of the low atomic number material. In another aspect, systems such as a vault or an electronic enclosure are disclosed, where one or more surfaces of Z-grade material make up part or all of the vault/enclosure.

First claim

Opening claim text (preview).

We claim: 1. An apparatus comprising a Z-grade material having multiple layers, the Z-grade material comprising: a first layer of a first material having a higher atomic number; a second layer of a second material having a lower atomic number; and a third layer of a third material, wherein the third layer: is comprised of an alloy of the first and second materials; is positioned between the first and second layers; is at least 0.5 mil in thickness; and a density of material in the third layer increases along a gradient along a distance between the first layer to the second layer. 2. The apparatus of claim 1 , further comprising: a fourth layer having a third material that is bonded to the Z-grade material, wherein the third material has an atomic number that is less than the atomic number of the first material. 3. The apparatus of claim 2 , further comprising: a fifth layer positioned between the first and fourth layers, wherein a density of material in the fifth layer increases along a gradient from the first layer to the fourth layer. 4. The apparatus of claim 3 , wherein the third material is the same as the second material. 5. The apparatus of claim 4 , wherein the fifth layer is thinner than the third layer. 6. The apparatus of claim 5 , wherein the thickness of the third layer is at least 10% of the thinner of the first and second layers. 7. The apparatus of claim 6 , wherein the apparatus is in the form of a multi-layered planar sheet of Z-grade material. 8. The apparatus of claim 1 , wherein the Z-grade material is a first Z-grade material and the apparatus further comprises a second Z-grade material, wherein the first and the second Z-grade materials are multi-layered sheets of Z-grade material configured to be connected together. 9. The apparatus of claim 7 , wherein the thickness of the third layer is at least 10% of the thinner of the first and second layers. 10. The apparatus of claim 9 , wherein the third layer is at least as thick as the thinner of the first and second layers. 11. The apparatus of claim 10 , wherein the third layer is at least 5 mil in thickness. 12. The apparatus of claim 11 , wherein the first material is tantalum and the second material is titanium. 13. An apparatus, comprising: a Z-grade material having: a first layer of a first material having a higher atomic number; a second layer of a second material having a lower atomic number; and a third layer, between the first and second layers, consisting of an alloy of the first and second materials, wherein a density of material in the third layer increases along a gradient from the first layer to the second layer, and wherein the third layer is at least 0.5 mil in thickness. 14. The apparatus of claim 13 , further comprising: a fourth layer of a third material diffusion bonded to the Z-grade material, wherein in the third material has an atomic number that is less than the atomic number of the first material; and a fifth layer between the first and fourth layers, wherein a density of material in the fifth layer increases along a gradient from the first layer to the fourth layer. 15. The apparatus of claim 14 , wherein the third material is the same as the second material. 16. The apparatus of claim 15 , wherein the fifth layer is thinner than the third layer. 17. The apparatus of claim 16 , wherein the thickness of the third layer is at least 10% of the thinner of the first and second layers. 18. The apparatus of claim 17 , wherein the third layer is at least as thick as the thinner of the first and second layers. 19. The apparatus of claim 18 , wherein the third layer is at least 5 mil in thickness. 20. The apparatus of claim 13 , wherein the third material is aluminum.

Assignees

Inventors

Classifications

  • B64G1/58Primary

    Thermal protection, e.g. heat shields · CPC title

  • B32B15/017Primary

    one layer being formed of aluminium or an aluminium alloy, another layer being formed of an alloy based on a non ferrous metal other than aluminium · CPC title

  • protecting the crew in manned spacecraft · CPC title

  • shielding electronic equipment · CPC title

  • Alloys based on titanium · CPC title

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Frequently asked questions

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What does patent US11724834B2 cover?
In some aspects, this disclosure relates to improved Z-grade materials, such as those used for shielding, systems incorporating such materials, and processes for making such Z-grade materials. In some examples, the Z-grade material includes a diffusion zone including mixed metallic alloy material with both a high atomic number material and a lower atomic number material. In certain examples, a …
Who is the assignee on this patent?
Nasa
What technology area does this patent fall under?
Primary CPC classification B64G1/58. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 15 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).