Web processing machine comprising at least one cleaning device for cleaning substrate transported along transport path

US11724289B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11724289-B2
Application numberUS-202017762759-A
CountryUS
Kind codeB2
Filing dateOct 8, 2020
Priority dateNov 25, 2019
Publication dateAug 15, 2023
Grant dateAug 15, 2023

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  1. Title

    What the patent document calls the invention.

  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In some examples, a processing machine has at least one cleaning device for cleaning a substrate. The at least one cleaning device and the at least one substrate are able to be arranged in a first and a second cleaning state, and the substrate is arranged at a distance from the at least one cleaning device in the first cleaning state. The substrate is arranged in contact with the at least one cleaning device in the second cleaning state, and the at least one cleaning device and the substrate are arranged so as to be transferable at least from the first cleaning state into the second cleaning state. The at least one cleaning device is arranged to be adjusted from a first cleaning position in the first cleaning state into a second cleaning position in the second cleaning state.

First claim

Opening claim text (preview).

The invention claimed is: 1. A web processing machine comprising: at least one cleaning device for cleaning a substrate transported along a transport path, the at least one cleaning device comprising at least two flow elements and/or brushes; the at least one cleaning device and the substrate configured to be arranged in a first cleaning state and a second cleaning state, wherein, in the first cleaning state, the substrate is arranged spaced apart from the at least one cleaning device and, in the second cleaning state, the substrate is arranged so as to be in contact with the at least two flow elements and/or the brushes of the at least one cleaning device; the at least one cleaning device and the substrate being arranged so as to be transferrable at least from the first cleaning state into the second cleaning state; the at least one cleaning device being arranged so as to be displaced from a first cleaning position in the first cleaning state into a second cleaning position in the second cleaning state, wherein, in the first cleaning position, the at least one cleaning device is functionally connected to a cleaning region on the substrate and/or on the transport path intended for the substrate, and wherein, in the second cleaning position of the at least one cleaning device, the cleaning region is arranged so as to be shifted on the substrate and/or on the transport path intended for the substrate; and wherein, in the first cleaning state and in the second cleaning state, the at least one cleaning device is arranged so as to apply a suction force at least onto the cleaning region. 2. The web processing machine according to claim 1 , wherein a guide element deflecting the transport path of the substrate is arranged so as to increase a force component opposing the suction force applied onto the substrate in the cleaning region of the first cleaning position compared to the cleaning region in the second cleaning position. 3. The web processing machine according to claim 1 , wherein the cleaning device, during a displacement from the first cleaning position into the second cleaning position, is arranged so as to be displaced parallel to the substrate and/or the transport path intended for the substrate. 4. The web processing machine according to claim 1 , wherein the at least one cleaning device, at least in the first cleaning position, is arranged on a side of the transport path and/or the substrate that is opposite to a side of the transport path and/or substrate on which a guide element is arranged. 5. The web processing machine according to claim 1 , wherein the at least one cleaning device is arranged between a substrate source and a printing assembly. 6. The web processing machine according to claim 1 , wherein the at least one cleaning device is configured as a cleaning device comprising a vacuum chamber and/or an ionization device. 7. The web processing machine according to claim 1 , wherein a suction power of the at least one cleaning device is adaptable to a width of the substrate by switching on and/or off extraction connectors by means of multiple valves.

Assignees

Inventors

Classifications

  • B08B1/20Primary

    Cleaning of moving articles, e.g. of moving webs or of objects on a conveyor · CPC title

  • Brushes · CPC title

  • B08B5/046Primary

    Cleaning moving webs · CPC title

  • B41F23/002Primary

    cleaning devices for sheets or webs · CPC title

  • Cleaning arrangements · CPC title

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Frequently asked questions

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What does patent US11724289B2 cover?
In some examples, a processing machine has at least one cleaning device for cleaning a substrate. The at least one cleaning device and the at least one substrate are able to be arranged in a first and a second cleaning state, and the substrate is arranged at a distance from the at least one cleaning device in the first cleaning state. The substrate is arranged in contact with the at least one c…
Who is the assignee on this patent?
Koenig & Bauer Ag
What technology area does this patent fall under?
Primary CPC classification B08B1/20. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Aug 15 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).