Constant shear continuous reactor device

Patent metadata

Field	Value
Publication number	US-11724241-B2
Application number	US-201916966511-A
Country	US
Kind code	B2
Filing date	Feb 15, 2019
Priority date	Feb 15, 2018
Publication date	Aug 15, 2023
Grant date	Aug 15, 2023

Abstract

Disclosed herein is a constant shear continuous reactor device, comprising: an annular gas delivery tube comprising a gas inlet and a gas outlet; a first annular liquid delivery tube comprising a first liquid inlet and a first liquid outlet arranged concentrically around the annular gas delivery tube along a common axis, where the first liquid outlet is located at a downstream position relative to the gas outlet or is coterminous with the gas outlet; and an annular reactor wall tube comprising a final liquid inlet, a mixing zone section and a reactor outlet, where the annular reactor wall tube is arranged concentrically around the first annular liquid delivery tube along the common axis.

First claim

The invention claimed is:

1. A constant shear continuous reactor device, comprising:
an annular gas delivery tube comprising a gas inlet and a gas outlet;
a first annular liquid delivery tube comprising a first liquid inlet and a first liquid outlet arranged concentrically around the annular gas delivery tube along a common axis, where the first liquid outlet is located at a downstream position relative to the gas outlet;
an annular reactor wall tube comprising a final liquid inlet, a mixing zone section and a reactor outlet, where the annular reactor wall tube is arranged concentrically around the first annular liquid delivery tube along the common axis, and
an apparatus that controls the flow rates of a gas through the gas inlet, a first liquid through the first liquid inlet and a final liquid through the final liquid inlet, such that an annular flow of a liquid film mixture comprising the first and final liquids is formed in the mixing zone section, wherein:
the mixing zone section is located at a downstream position relative to the gas outlet and the first liquid outlet;
the reactor outlet is located at a downstream position relative to the mixing zone section;
the mixing zone section and reactor outlet of the annular reactor wall tube has an inner diameter of from 100 nm to 53 mm; and
when in use, a liquid film forming section is formed on an inner surface of the first annular liquid delivery tube.

2. The reactor device according to claim 1 , wherein the liquid film mixture in the mixing zone section has a thickness that is from 0.1% to 10%, of the inner diameter of the mixing zone section and reactor outlet of the annular reactor wall tube.

3. The reactor device according to claim 1 , wherein the inner diameter of the mixing zone section and reactor outlet of the annular reactor wall tube is from 1 μm to 2.5 mm.

4. The reactor device according to claim 1 , wherein an inner surface of the mixing zone section is coated with a reactive agent and/or a catalyst.

5. The reactor device according to claim 1 , wherein an inner surface of the film forming section is coated with a reactive agent and/or a catalyst.

6. The reactor device according to claim 1 , wherein the device is suitable to provide a high-shear core gas flow and a liquid sheath flow, comprising a first and a final liquid, on an inner surface of the mixing zone section.

7. The reactor device according to claim 1 , wherein the device is suitable to provide a high-shear core gas flow and a liquid sheath flow comprising a first liquid on an inner surface of the liquid film forming section.

8. A method of using a constant shear continuous reactor device according to claim 1 , which method comprises:
(a) providing a gas, a first liquid and a final liquid, each liquid comprising a reactant and/or a reagent; and
(b) supplying the gas, the first liquid and final liquid to the reactor device by way of the gas inlet, the first liquid inlet and final liquid inlet, respectively; and
(c) mixing at least the first and final liquids together to form a reaction mixture that reacts to provide a reaction product mixture and collecting the reaction product mixture upon exit from the reactor outlet of the reactor device, wherein
the gas is supplied at a sufficient velocity to provide a high-shear force on the first and final liquids and to generate a gas core region in the reactor device, such that the first and final liquids combine on a surface of the mixing zone section of the reactor device to form a liquid film mixture with annular flow, which liquid film mixture has a thickness that is from 0.1% to 10% of an inner diameter of the mixing zone section and reactor outlet of the annular reactor wall tube.

9. The method according to claim 8 , wherein the gas is supplied at a flow rate of from 0.1 to 100 L/min.

10. The method according to claim 8 , wherein the first and final liquids are supplied at a flow rate of from 0.1 to 1 L/min.

11. The method according to claim 8 , wherein the reaction product is a 2-D material.

12. The method according to claim 11 , wherein the gas is an inert gas or air, the first liquid is an aqueous solution of magnesium nitrate hexahydrate and aluminium nitrate nonahydrate and the final liquid is an aqueous solution of NaOH and Na 2 CO 3 , where the reaction product mixture comprises hydrotalcite nanoplatelets.

13. The method according to claim 11 , wherein the gas is an inert gas or air, the first liquid is a solution of copper nitrate in a solvent comprising a 1:1 mixture by volume of dimethylformamide and acetonitrile and the final liquid is a solution of triethylamine and 1,4-benzene dicarboxylic acid in a solvent comprising a 1:1 mixture by volume of dimethylformamide and acetonitrile, where the reaction product is a 2-D metal-organic framework of copper and 1,4-benzene dicarboxylic acid.

14. The method according to claim 8 , wherein the first and final liquids are delivered to the reactor device with the same flow rate.

15. The method according to claim 8 wherein the gas comprises a reactant or reagent in gaseous form.

16. A reactor system comprising two or more constant shear continuous reactor devices as described in claim 1 arranged to run in parallel.

17. A method of forming a 2-D material using a constant shear continuous reactor device according to claim 1 , said method comprising the steps of:
providing a gas and a liquid, the liquid comprising a reactant and/or a reagent; and
(ii) supplying the gas and liquid to the reactor device by way of the gas inlet and liquid inlet, respectively;
(iii) mixing at least the gas and liquid together to provide a reaction product mixture that comprises a 2-D material and collecting the reaction product mixture upon exit from the reactor outlet of the reactor device, wherein:
(a) when the gas is an inert gas or air, then an inner surface of the mixing zone section is coated and/or impregnated with one or more of a catalyst, a reactant and a reagent and the gas is supplied at a sufficient velocity to provide a high-shear force on the liquid, such that a liquid film with annular flow is formed on a surface of the mixing zone section of the reactor device, thereby allowing interaction between the reactants and/or reagents in the liquid with the one or more of a catalyst, a reactant and a reagent coated and/or impregnated on the inner surface of the mixing zone section to form a product, which liquid film has a thickness that is from 0.1% to 10% of an inner diameter of the mixing zone section and reactor outlet of the annular reactor wall tube;
(b) when the gas comprises a reactant or reagent, then the gas is supplied at a sufficient velocity to provide a high-shear force on the liquid, such that a liquid-gas film mixture with annular flow is formed on a surface of the mixing zone section of the reactor device to form a product, which liquid-gas film mixture has a thickness that is from 0.1% to 10% of an inner diameter of the mixing zone section and reactor outlet of the annular reactor wall tube; or
(c) when the gas comprises a reactant or reagent and the mixing zone section is coated and/or impregnated with one or more of a catalyst, a reactant and a reagent, then the gas is supplied at a sufficient velocity to provide a high- shear force on the liquid, such that a liquid-gas film mixture with annular flow is formed on a surface of the mixing zone section of the reactor device, thereby allowing interaction between the reactants and/or reagents in the liquid-gas film mixture with the one or more of a catalyst, a reactant and a reagent coated and/or imp

Assignees

• Cambridge Entpr Ltd

Inventors

• Jose Nicholas
• Lapkin Alexei

Classifications

• B01F23/232

  using flow-mixing means for introducing the gases, e.g. baffles · CPC title

• B01J10/02 Primary

  of the thin-film type · CPC title

• B01F33/30121

  the interdigital streams being concentric lamellae · CPC title

• B01J14/00

  Chemical processes in general for reacting liquids with liquids; Apparatus specially adapted therefor (B01J8/00, B01J19/08 take precedence) · CPC title

• B01J19/0006

  Controlling or regulating processes (controlling or regulating in general G05) · CPC title