System and method for fluid preparation

Patent metadata

Field	Value
Publication number	US-11724236-B2
Application number	US-201916668416-A
Country	US
Kind code	B2
Filing date	Oct 30, 2019
Priority date	Dec 20, 2018
Publication date	Aug 15, 2023
Grant date	Aug 15, 2023

Abstract

A fluid preparation system includes a tank, a chemical supply line, a mixer, and a deionized (DI) water supply line. The tank contains a first chemical solution. The chemical supply line is coupled to the tank and configured to supply the first chemical solution. The mixer is coupled to the tank. The DI water supply line is coupled to the mixer and configured to supply DI water. The first chemicals solution and the DI water are mixed at the mixer to generate a second chemical solution.

First claim

What is claimed is:

1. A fluid preparation system, comprising:
a first tank containing a first chemical solution;
a second tank containing a second chemical solution;
a chemical supply line coupled to the first tank and configured to supply the first chemical solution;
a mixer coupled to the first tank and the second tank, the mixer comprising a first piston, a first spring, a first internal inlet, a second piston, a second spring, and a second internal inlet, the first piston being coupled to the first internal inlet and the first spring, the second piston being coupled to the second internal inlet and the second spring; and
a deionized (DI) water supply line coupled to the mixer and configured to supply DI water,
wherein the first chemical solution and the DI water are mixed by flowing clockwise and counterclockwise alternatingly in a plurality of rotation circulators of the mixer to generate the second chemical solution, and the second chemical solution is supplied from the mixer to the second tank.

2. The fluid preparation system of claim 1 , further comprising a DI water flow meter coupled to the DI water supply line.

3. The fluid preparation system of claim 2 , further comprising a digital flow control unit coupled to the DI water flow meter, wherein the digital flow control unit is configured to control a flow rate of the DI water into the mixer.

4. The fluid preparation system of claim 1 , wherein the first chemical solution comprises a DI water and a chemical mixed at a first mixing ratio of 50:1, 100:1, 200:1, or 1000:1.

5. The fluid preparation system of claim 4 , wherein the chemical is hydrogen fluoride (HF) or ammonium fluoride (NH4F).

6. The fluid preparation system of claim 1 , wherein the second chemical solution comprises a DI water and a chemical mixed at a second mixing ratio of 50:1, 100:1, 200:1, or 1000:1.

7. The fluid preparation system of claim 6 , wherein the chemical is hydrogen fluoride (HF) or ammonium fluoride (NH4F).

8. The fluid preparation system of claim 1 , further comprising a central chemical supply system (CCSS) coupled to the chemical supply line, wherein the CCSS is configured to store, release, and control delivery of the first chemical solution.

9. The fluid preparation system of claim 1 , further comprising a DI water supply system coupled to the DI water supply line, wherein the DI water supply system is configured to store, release, and control delivery of the DI water.

Assignees

• Xia Tai Xin Semiconductor Qing Dao Ltd

Inventors

• Nam Chang-Hyeon
• Shin Hong-Sik
• Yeo Injoon

Classifications

• H10P70/00

  Cleaning of wafers, substrates or parts of devices · CPC title

• H10P72/0402

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/0414

  using mainly spraying means, e.g. nozzles · CPC title

• H10P50/283

  by chemical means · CPC title

• H10P72/0422

  for wet etching · CPC title