Display panel and method of manufacturing the same

US11716878B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11716878-B2
Application numberUS-202117323892-A
CountryUS
Kind codeB2
Filing dateMay 18, 2021
Priority dateJul 2, 2020
Publication dateAug 1, 2023
Grant dateAug 1, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method manufacturing a display device includes: forming a pixel circuit in a display area; forming a sacrificial layer on an insulating layer arranged in a non-display area, the sacrificial layer including an isolated pattern hole; forming functional layers and an opposite electrode of an organic light-emitting diode that extends over the display area and the non-display area, the functional layers and the opposite electrode covering the sacrificial layer; irradiating a laser beam to the opposite electrode through the sacrificial layer and the pattern hole from below a substrate; and lifting off the sacrificial layer from the insulating layer and simultaneously, lifting off the opposite electrode to which the laser beam is irradiated, wherein at least a portion of the functional layers is left on a portion of the insulating layer corresponding to the opposite electrode that is removed.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of manufacturing a display panel, the display panel including a substrate including an opening area, a display area, and a non-display area, the display area surrounding the opening area, and the non-display area being between the opening area and the display area, the method comprising: forming a pixel circuit in the display area, the pixel circuit including at least one thin film transistor; forming a sacrificial layer on an insulating layer in the non-display area, the sacrificial layer including an isolated pattern hole; forming functional layers and an opposite electrode of an intermediate layer of an organic light-emitting diode that extends over the display area and the non-display area, the functional layers and the opposite electrode covering the sacrificial layer including the isolated pattern hole; irradiating a laser beam to the opposite electrode through the sacrificial layer and the isolated pattern hole from below the substrate; and lifting off the sacrificial layer from the insulating layer and simultaneously, lifting off the opposite electrode to which the laser beam is irradiated, wherein at least a portion of the functional layers is left on a portion of the insulating layer corresponding to the opposite electrode that is removed. 2. The method of claim 1 , wherein the functional layers extend as one body on a first surface of the sacrificial layer in a direction away from the insulating layer and the isolated pattern hole, and the opposite electrode extends on the functional layers. 3. The method of claim 1 , wherein irradiating the laser beam further comprises passing the laser beam through a second surface of the sacrificial layer facing the insulating layer and the functional layers that fill the isolated pattern hole, and is simultaneously irradiated on one surface of the opposite electrode. 4. The method of claim 3 , wherein the second surface of the sacrificial layer is removed from the insulating layer, a portion of the opposite electrode that is arranged in the isolated pattern hole is removed from a functional layer from among the functional layers, and the functional layer between the insulating layer and the opposite electrode is left on the insulating layer. 5. The method of claim 4 , wherein the functional layer left on the insulating layer includes a pattern corresponding to the isolated pattern hole. 6. The method of claim 1 , wherein the isolated pattern hole includes a multi-circle type pattern hole formed over an entire area of the sacrificial layer. 7. The method of claim 1 , wherein the isolated pattern hole includes a plurality of dot type pattern holes formed over an entire area of the sacrificial layer. 8. The method of claim 1 , wherein the sacrificial layer is formed through a same process as a process of forming a pixel electrode of the organic light-emitting diode formed in the display area and includes a same material as the pixel electrode. 9. The method of claim 1 , further comprising: forming a dam in the non-display area through a same process as a process of forming a plurality of insulating layers of an insulating layer arranged between the at least one thin film transistor and each element of the organic light-emitting diode, wherein the functional layers and the opposite electrode extend as one body on an outer surface of the dam and on the sacrificial layer including the isolated pattern hole. 10. The method of claim 1 , wherein the functional layer left on the insulating layer surrounds the opening area in the non-display area corresponding to the sacrificial layer. 11. The method of claim 1 , further comprising: forming a thin-film encapsulation layer over the display area and the non-display area, wherein at least one inorganic encapsulation layer of the thin-film encapsulation layer extends to a region in which the sacrificial layer is removed. 12. The method of claim 11 , wherein the at least one inorganic encapsulation layer covers the portion of the functional layer left on the insulating layer and an insulating layer exposed between adjacent functional layers. 13. The method of claim 1 , wherein the intermediate layer includes: an emission layer in the display area; and at least one functional layer on a surface of the emission layer and extending from the display area to the non-display area.

Assignees

Inventors

Classifications

  • H10K71/00Primary

    Manufacture or treatment specially adapted for the organic devices covered by this subclass · CPC title

  • the pixel elements being TFTs · CPC title

  • multilayered coatings having a repetitive structure, e.g. having multiple organic-inorganic bilayers · CPC title

  • Insulating layers formed between TFT elements and OLED elements · CPC title

  • Encapsulations · CPC title

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Frequently asked questions

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What does patent US11716878B2 cover?
A method manufacturing a display device includes: forming a pixel circuit in a display area; forming a sacrificial layer on an insulating layer arranged in a non-display area, the sacrificial layer including an isolated pattern hole; forming functional layers and an opposite electrode of an organic light-emitting diode that extends over the display area and the non-display area, the functional …
Who is the assignee on this patent?
Samsung Display Co Ltd
What technology area does this patent fall under?
Primary CPC classification H10K71/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Aug 01 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).