Chemical liquid supplying system and method of supplying chemical liquid

Patent metadata

Field	Value
Publication number	US-11715656-B2
Application number	US-202016837507-A
Country	US
Kind code	B2
Filing date	Apr 1, 2020
Priority date	Dec 26, 2019
Publication date	Aug 1, 2023
Grant date	Aug 1, 2023

Abstract

In accordance with some embodiments, a method for processing semiconductor wafer is provided. The method includes connecting a drum which stores the chemical liquid with a testing pipe. The method also includes guiding the chemical liquid in the drum into the testing pipe. In addition, the method includes detecting a condition of the chemical liquid in the testing pipe. The method further includes determining if the condition of the chemical liquid is acceptable. When the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed.

First claim

What is claimed is:

1. A method for processing a semiconductor wafer, comprising:
connecting a drum which stores a chemical liquid with a testing pipe;
guiding the chemical liquid in the drum into the testing pipe;
detecting a condition of the chemical liquid in the testing pipe;
determining if the condition of the chemical liquid is acceptable;
when the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which the semiconductor wafer is processed; and
identifying the drum by scanning an RFID (radio-frequency identification) tag attached on the drum to reorganize what chemical liquid is intended to be stored in the drum.

2. The method as claimed in claim 1 , wherein the detecting the condition of the chemical liquid in the testing pipe comprises:
producing an image in relation to the chemical liquid in the testing pipe;
analyzing the image to generate a data associated with the image; and
comparing the data associated with the image with data representing the chemical liquid in a standard stage.

3. The method as claimed in claim 1 , wherein the detecting the condition of the chemical liquid in the testing pipe comprises:
emitting a first light beam toward the testing pipe, wherein the first light beam is transferred to a second light beam after passing through the chemical liquid;
receiving the second light beam with a transducer;
analyzing the second light beam to generate a data associated with the second light beam; and
comparing the data associated with the second light beam with data representing the chemical liquid in a standard stage.

4. The method as claimed in claim 1 , further comprising:
circulating the chemical liquid back to the drum through the testing pipe; and
guiding a portion of the chemical liquid from the testing pipe to a supplying pipe which is connected with the processing tool.

5. The method as claimed in claim 1 , further comprising:
moving the drum into a chamber at which the drum is connected with the testing pipe;
generating an exhaust flow from the chamber;
detecting a condition of the exhaust flow;
determining if the condition of the exhaust flow is over a threshold; and
when the condition of the exhaust flow is determined over the threshold, stopping the guiding of the chemical liquid in the drum into the testing pipe and issuing an alarm.

6. The method as claimed in claim 1 , further comprising:
moving the drum into a chamber at which the drum is connected with the testing pipe;
producing an image in relation to an outlet nozzle and an inlet nozzle of the drum;
rotating an inlet connector and an outlet connector which are connected to the testing pipe to align the inlet nozzle and the outlet nozzle based on the image; and
connecting the inlet connector with the inlet nozzle and connecting the outlet connector with the outlet nozzle after the rotation of the inlet connector and the outlet connector of the testing pipe.

7. The method as claimed in claim 1 , further comprising:
moving the drum into a chamber at which the drum is connected with the testing pipe; and
after the drum is moved into the chamber, closing a front door of the chamber to form an air-tight enclosure in the chamber.

8. A method of testing a chemical liquid in a fabrication facility, comprising:
moving a drum which stores the chemical liquid from a storage system to a position next to a chemical liquid supplying system;
moving the drum into a chamber in the chemical liquid supplying system through a front door;
connecting the drum with a testing pipe;
guiding the chemical liquid in the drum into the testing pipe;
detecting a condition of the chemical liquid in the testing pipe;
determining if the condition of the chemical liquid is acceptable; and
when the condition of the chemical liquid is not acceptable, removing the drum from the chamber of the chemical liquid supplying system.

9. The method as claimed in claim 8 , wherein the detecting the condition of the chemical liquid in the testing pipe comprises:
producing an image in relation to the chemical liquid in the testing pipe;
analyzing the image to generate a data associated with the image; and
comparing the data associated with the image with data representing the chemical liquid in a standard stage.

10. The method as claimed in claim 8 , wherein the detecting the condition of the chemical liquid in the testing pipe comprises:
emitting a first light beam toward the testing pipe, wherein the first light beam transferred to a second light beam after passing through the chemical liquid;
receiving the second light beam with a transducer;
analyzing the second light beam to generate a data associated with the second light beam; and
comparing the data associated with the second light beam with data representing the chemical liquid in a standard stage.

11. The method as claimed in claim 8 , further comprising:
when the condition of the chemical liquid is acceptable, supplying the chemical liquid to a processing tool at which a semiconductor wafer is processed.

12. The method as claimed in claim 8 , further comprising:
generating an exhaust flow from the chamber;
detecting a condition of the exhaust flow;
determining if the condition of the exhaust flow is over a threshold; and
when the condition of the exhaust flow is determined over the threshold, stopping the guiding of the chemical liquid in the drum into the testing pipe and issuing an alarm.

13. The method as claimed in claim 8 , further comprising:
producing an image in relation to an outlet nozzle and an inlet nozzle of the drum;
rotating an inlet connector and an outlet connector which are connected to the testing pipe to align the inlet nozzle and the outlet nozzle based on the image; and
connecting the inlet connector with the inlet nozzle and connecting the outlet connector with the outlet nozzle after the rotation of the inlet connector and the outlet connector of the testing pipe.

14. The method as claimed in claim 8 , wherein the position is next to the front door of the chemical liquid supplying system, and the drum is moved into the chamber through the front door, the method further comprises:
after the drum is moved into the chamber, closing the front door of the chamber to form an air-tight enclosure in the chamber.

15. The method as claimed in claim 8 , further comprising:
identifying the drum by scanning an RFID (radio-frequency identification) tag attached on the drum to reorganize what chemical liquid is intended to be stored in the drum.

16. A method for processing a semiconductor wafer, comprising:
moving a drum containing a chemical liquid from a storage system into a chamber of a chemical liquid supplying system;
connecting the drum with a testing pipe disposed in the chamber of the chemical liquid supplying system;
pumping the chemical liquid from the drum to the testing pipe;
re-circulating the chemical liquid in the testing pipe back into the drum;
after re-circulating the chemical liquid, pumping the chemical liquid from the drum to the testing pipe again;
after pumping the chemical liquid again, monitoring a condition of the chemical liquid in the testing pipe; and
supplying the chemical liquid to a processing tool at which a semiconductor wafer is processed after monitoring the condition of the chemical liquid.

17. The method of claim 16 , wherein monitoring the condition of the chemical liquid in the testing pipe comprises:
emitting a first light beam to the testing pipe, wherein the first light beam

Assignees

• Taiwan Semiconductor Mfg Co Ltd

Inventors

• Chang Yu-Cheng
• Pan Keng-Hui
• Huang Chieh-Jan
• Lee Ming-Lee
• Chen Chiang-Jeh

Classifications

• H10P90/12

  Preparing bulk and homogeneous wafers · CPC title

• H10P72/0618

  using identification means, e.g. labels on substrates or labels on containers · CPC title

• H10P72/0448

  Apparatus for applying a liquid, a resin, an ink or the like · CPC title

• H10P50/00

  Etching of wafers, substrates or parts of devices · CPC title

• H10P72/0604 Primary

  Process monitoring, e.g. flow or thickness monitoring · CPC title