Method for producing porous film, method for producing composition for producing porous film, and porous film

US11713383B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11713383-B2
Application numberUS-201916724820-A
CountryUS
Kind codeB2
Filing dateDec 23, 2019
Priority dateDec 25, 2018
Publication dateAug 1, 2023
Grant dateAug 1, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

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To provide a method for producing a porous film in which even when minute fine particles are used, fine particles can be satisfactorily dispersed, a method for producing a composition for producing a porous film, and a porous film that can be produced by the method for producing a porous film. When a porous film is formed using a varnish including at least one resin component selected from the group consisting of polyamide acid, polyimide, a polyamide-imide precursor, polyamide-imide and polyethersulfone, and fine particles, varnish is produced by dispersing the fine particles by using a pressure device that pressurizes slurry including the fine particles and a dispersing device provided with a flow path whose cross-sectional area is 1960 μm 2 or more and 785000 μm 2 or less, and allowing the slurry pressurized to 50 MPa or more to pass through the flow path.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for producing a porous film, comprising: preparing a composition for producing a porous film comprising at least one resin component selected from the group consisting of polyamide acid, polyimide, a polyamide-imide precursor, polyamide-imide and polyethersulfone, and fine particles, wherein the preparing comprises: dispersing the fine particles in a slurry using a dispersing device provided with a pressure device that pressurizes the slurry comprising the fine particles, the dispersing device having a flow path whose cross-sectional area is 1960 μm 2 or more and 785000 μm 2 or less, wherein the slurry is pressurized to 50 MPa or more, forming a pressurized slurry, and the pressurized slurry passes through the flow path; forming a film from the pressurized slurry; and removing the fine particles from the film to form the porous film, wherein in a pore diameter distribution of the porous film as a distribution of every 1 nm section, obtained by measurement by a bubble point method under conditions in which a measured pressure range is 0 psi or more and 400 psi or less, using perfluoropolyester having an interfacial tension value of 15.9 dyne/cm, a sum of pore distribution (%) in a first section having the smallest pore diameter and pore distribution (%) in a second section having the second smallest pore diameter is 70% or more, and no section other than the first section and the second section has pore distribution of 7% or more. 2. The method according to claim 1 , comprising: allowing the pressurized slurry to collide against one another or to collide against a collision part provided on the flow path. 3. The method according to claim 1 , wherein a content of the fine particles in the slurry is 20% by mass or more and 90% by mass or less with respect to a mass of the slurry. 4. The method according to claim 1 , wherein the fine particles are inorganic fine particles. 5. The method according to claim 1 , further comprising: forming an unburned composite film using the composition for producing a porous film; burning the unburned composite film to obtain a resin-fine particle composite film; and removing fine particles from the resin-fine particle composite film. 6. The method according to claim 1 , wherein the slurry is pressurized to 130 MPa or more. 7. A method for producing a composition for producing a porous film, comprising: preparing slurry (1) comprising fine particles and a solvent; preparing a resin liquid (1) comprising at least one resin component selected from the group consisting of polyamide acid, polyimide, a polyamide-imide precursor, polyamide-imide and polyethersulfone, and a solvent; preparing slurry (2) by kneading the slurry (1) and the resin liquid (1); and dispersing the fine particles in the slurry (2) using a dispersing device provided with a pressure device that pressurizes the slurry (2), the dispersing device having a flow path having a cross-sectional area of 1960 μm 2 or more and 785000 μm 2 or less, wherein the slurry (2) is pressurized to 50 MPa or more, forming a pressurized slurry, and the pressurized slurry passes through the flow path; forming a film from the pressurized slurry; and removing the fine particles from the film to form a porous film, wherein in a pore diameter distribution of the porous film produced with the composition as a distribution of every 1 nm section, obtained by measurement by a bubble point method under conditions in which a measured pressure range is 0 psi or more and 400 psi or less, using perfluoropolyester having an interfacial tension value of 15.9 dyne/cm, a sum of pore distribution (%) in a first section having the smallest pore diameter and pore distribution (%) in a second section having the second smallest pore diameter is 70% or more, and no section other than the first section and the second section has pore distribution of 7% or more. 8. The method according to claim 7 , comprising allowing the pressurized slurry to collide against one another or to collide against a collision part provided on the flow path. 9. The method according to claim 7 , wherein the slurry (2) is pressurized to 130 MPa or more.

Assignees

Inventors

Classifications

  • C08J9/26Primary

    by elimination of a solid phase from a macromolecular composition or article, e.g. leaching out · CPC title

  • by flames · CPC title

  • to obtain a matt or rough surface · CPC title

  • Elimination of an inorganic solid phase · CPC title

  • Nanopores, i.e. the average diameter being smaller than 0,1 micrometer · CPC title

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What does patent US11713383B2 cover?
To provide a method for producing a porous film in which even when minute fine particles are used, fine particles can be satisfactorily dispersed, a method for producing a composition for producing a porous film, and a porous film that can be produced by the method for producing a porous film. When a porous film is formed using a varnish including at least one resin component selected from the …
Who is the assignee on this patent?
Tokyo Ohka Kogyo Co Ltd
What technology area does this patent fall under?
Primary CPC classification C08J9/26. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Aug 01 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).