Apparatuses and methods for creating wetting controlling microfeatures
US-2024084475-A1 · Mar 14, 2024 · US
US11708641B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11708641-B2 |
| Application number | US-202117393151-A |
| Country | US |
| Kind code | B2 |
| Filing date | Aug 3, 2021 |
| Priority date | Aug 3, 2020 |
| Publication date | Jul 25, 2023 |
| Grant date | Jul 25, 2023 |
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An electrochemical method includes performing anodic halogenation of Cu foils, performing subsequent oxide-formation in a KHCO3 electrolyte, and performing an electroreduction in neutral KHCO3 to generate a copper catalyst.
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What is claimed is: 1. An electrochemical method comprising: performing anodic halogenation of Cu foils; wherein the anodic halogenation comprises 60-100 s at 1.1 V (vs. Ag/AgCl) for KCI, 60-90 s at 0.18 V (vs. Ag/AgCl) for KBr, or 1-10 s at −0.2 V (vs. Ag/AgCl) for KI; performing subsequent oxide-formation in a KHCO 3 electrolyte; and performing an electroreduction in neutral KHCO 3 to generate a copper catalyst comprising cubic structures of Cu and a surface roughness of less than 30; the catalyst capable to provide a faradaic efficiency ≥50% for C 2 H 4 generation. 2. The electrochemical method of claim 1 wherein the electroreduction in neutral KHCO 3 is by linear sweep voltammetry (LSV). 3. The electrochemical method of claim 1 wherein performing anodic halogenation of Cu foils comprises applying an oxidative potential to electropolished Cu foils immersed in an electrolyte containing halide ions. 4. The electrochemical method of claim 1 , further comprising: prior to performing the anodic halogenation of the Cu foils; mechanically polishing the Cu foils; rinsing the polished the Cu foils; electropolishing the Cu foils by chronoamperometry in 85% phosphoric acid at 1.5 V with a Cu counter electrode in a two-electrode configuration; rinsing the electropolished Cu foils; cutting the electropolished Cu foils into 2×0.5 cm 2 pieces; flattening the electropolished Cu foils; covering a back side and part of a front side of the flattened electropolished Cu foils with polyimide (PI) tape to define a geometric area of a working electrode; and wrapping the working electrode in PTFE tape to prevent detachment of the PI tape, exposing an area of 0.35 cm 2 . 5. The electrochemical method of claim 4 , further comprising: dissolving KCl, KBr, and KI in de-ionized (DI) water to a concentration of 0.1 M; and performing the anodic halogenation on an electropolished Cu foil immersed in 0.1 M KCl, KBr, and KI, respectively, in a three-electrode configuration using a potentiostat. 6. The electrochemical method of claim 5 wherein a counter electrode is Pt gauze. 7. The electrochemical method of claim 6 wherein a reference electrode was Ag/AgCl (saturated KCl) electrode. 8. The electrochemical method of claim 7 wherein open circuit potentials of electropolished Cu in 0.1 M KCl, KBr, and KI are −0.115 V, −0.134 V, and −0.315 V vs. Ag/AgCl.
Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects (for both electrolytic coating and removal C25D); Servicing or operating · CPC title
of carbon dioxide · CPC title
Metal or alloy · CPC title
of metals or alloys not provided for in groups C25D11/04 - C25D11/32 · CPC title
Process control or regulation (controlling or regulating in general G05) · CPC title
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