Method for producing a graphene film

Patent metadata

Field	Value
Publication number	US-11708271-B2
Application number	US-201616062301-A
Country	US
Kind code	B2
Filing date	Dec 9, 2016
Priority date	Dec 15, 2015
Publication date	Jul 25, 2023
Grant date	Jul 25, 2023

Abstract

Disclosed herein are methods for forming a graphene film on a substrate, the methods comprising depositing graphene on a surface of the substrate by a first vapor deposition step to form a discontinuous graphene crystal layer; depositing a graphene oxide layer on the discontinuous graphene crystal layer to form a composite layer; and depositing graphene on the composite layer by a second vapor deposition step, wherein the graphene oxide layer is substantially reduced to a graphene layer during the second vapor deposition step. Transparent coated substrates comprising such graphene films are also disclosed herein, wherein the graphene films have a resistance of less than about 10 KΩ/sq.

First claim

What is claimed is:

1. A coated substrate comprising a graphene film on at least one surface, wherein:
the coated substrate is substantially transparent,
the graphene film has a resistance of less than about 10 KΩ/sq and a thickness ranging from about 1 nm to about 200 nm, and
the graphene film comprises at least one multi-layer horizontal graphene sheet and at least one single-layer vertical graphene sheet; and wherein the single-layer vertical graphene sheet has a height ranging from 1 nm to 200 nm.

2. The coated substrate of claim 1 , wherein the coated substrate has a transmittance of at least about 80% in the visible light spectrum.

3. The coated substrate of claim 1 , wherein the graphene film has a resistance of less than about 3 KΩ/sq.

4. The coated substrate of claim 1 , wherein the multi-layer horizontal graphene sheet comprises from 3 to 20 graphene layers.

5. The coated substrate of claim 1 , wherein the single-layer vertical graphene sheet has a thickness ranging from about 0.3 nm to about 10 nm.

6. The coated substrate of claim 1 , wherein the substrate is chosen from glass, glass-ceramic, and crystalline substrates.

Assignees

• Corning Inc
• Shanghai Inst Of Ceramics Siccas
• Shanghai Inst Ceramics Cas

Inventors

• Bi Hui
• Huang Fuqiang
• Liu Xinyuan
• Song Zhen
• Tang Yufeng
• Xiu Tongping

Classifications

• C01B32/198 Primary

  Graphene oxide · CPC title

• C01B32/182

  Graphene · CPC title

• C01B32/186

  by chemical vapour deposition [CVD] · CPC title

• C03C17/22 Primary

  with other inorganic material (C03C17/34, C03C17/44 take precedence) · CPC title

• C23C16/26

  Deposition of carbon only · CPC title