Cap liner comprising a sintered fluoropolymer layer

US11708196B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11708196-B2
Application numberUS-202016800528-A
CountryUS
Kind codeB2
Filing dateFeb 25, 2020
Priority dateMar 1, 2019
Publication dateJul 25, 2023
Grant dateJul 25, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In an aspect, a cap liner comprises a sintered fluoropolymer layer; and a backing layer; wherein the sintered fluoropolymer layer is in direct physical contact with the backing layer with no intervening layer located there between. In another aspect, a method of forming the cap liner of comprises plasma etching the sintered fluoropolymer layer to form a sintered plasma etched layer; and laminating the sintered plasma etched layer and the backing layer to form the cap liner.

First claim

Opening claim text (preview).

What is claimed is: 1. A cap liner, comprising: a sintered plasma etched fluoropolymer layer having a white color; wherein the sintered plasma etched fluoropolymer layer comprises at least one of a poly(tetrafluoroethylene) or a modified poly(tetrafluoroethylene); wherein the sintered plasma etched fluoropolymer layer is free of a filler; wherein a thickness of the sintered plasma etched fluoropolymer layer is 0.02 to 0.4 millimeters; and a backing layer in the form of a continuous layer; wherein the backing layer comprises a closed cell, compressible foam layer having a porosity of 10 to 70 volume percent based on the total volume of the backing layer; wherein the closed cell, compressible foam material comprises at least one of an elastomer or a polyolefin; wherein a thickness of the backing layer is 0.5 to 3 millimeters; and wherein the sintered plasma etched fluoropolymer layer is in direct physical contact with the backing layer with no intervening layer located there between; wherein the sintered plasma etched fluoropolymer layer is free of an etchant residue identifiable by Fourier transform infrared spectroscopy; and wherein the sintered plasma etched fluoropolymer layer is a solid layer having a porosity of 0 volume percent. 2. The cap liner of claim 1 , wherein the closed cell, compressible foam layer comprises the elastomer, wherein the elastomer optionally comprises repeat units derived from at least one of ethylene, butadiene, acrylonitrile, styrene, or isobutylene. 3. The cap liner of claim 1 , wherein the backing layer further comprises a solid outer layer located on a surface of the foam layer opposite the sintered plasma etched fluoropolymer layer. 4. The cap liner of claim 1 , wherein the closed cell, compressible foam layer comprises the polyolefin; wherein the polyolefin optionally comprises a fumaric acid graft and/or repeat units derived from at least one of a 1-alkene having 4 to 8 carbon atoms, a norbornene-type monomer, maleic anhydride, ethyl acrylate, isobutyl acrylate, or vinyl acetate. 5. The cap liner of claim 1 , wherein the sintered plasma etched fluoropolymer layer forms a fluid-tight seal against a surface of a container. 6. A method of forming the cap liner of claim 1 , the method comprising: plasma etching the sintered fluoropolymer layer to form a sintered plasma etched fluoropolymer layer; and laminating the sintered plasma etched layer and the backing layer to form the cap liner. 7. The method of claim 6 , further comprising sintering a fluoropolymer layer to form the sintered fluoropolymer layer at a temperature of 330 to 390° C. for greater than or equal to 5 minutes.

Assignees

Inventors

Classifications

  • with separate sealing elements · CPC title

  • of foam · CPC title

  • comprising halogenated polyolefins, e.g. PTFE · CPC title

  • Sealings formed by liquid or plastic material · CPC title

  • Polyolefin · CPC title

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What does patent US11708196B2 cover?
In an aspect, a cap liner comprises a sintered fluoropolymer layer; and a backing layer; wherein the sintered fluoropolymer layer is in direct physical contact with the backing layer with no intervening layer located there between. In another aspect, a method of forming the cap liner of comprises plasma etching the sintered fluoropolymer layer to form a sintered plasma etched layer; and laminat…
Who is the assignee on this patent?
Rogers Corp
What technology area does this patent fall under?
Primary CPC classification B65D41/0435. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jul 25 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).