Method of controlling properties of nanoparticles and patterning with nanoparticles by ink lithography

Patent metadata

Field	Value
Publication number	US-11701909-B2
Application number	US-202217709548-A
Country	US
Kind code	B2
Filing date	Mar 31, 2022
Priority date	Jun 7, 2021
Publication date	Jul 18, 2023
Grant date	Jul 18, 2023

Abstract

Disclosed is a patterning method by ink lithography. More particularly, the patterning method includes coating thin film-forming nanoparticles surrounded by the first ligand on a substrate to form a nanoparticle thin film; directly spraying a ligand-substituting ink to a selected region on the nanoparticle thin film to form a region in which the first ligand is substituted with the second ligand; and washing the nanoparticle thin film with a washing solvent so that the region substituted with the second ligand is patterned.

First claim

What is claimed is:

1. A patterning method by ink lithography, the patterning method comprising:
coating nanoparticles surrounded by a first ligand on a substrate to form a nanoparticle thin film;
spraying a ligand-substituting ink to a partial region of the nanoparticle thin film formed on the substrate to form a first region, in which the first ligand is substituted with a second ligand, and a second region in which the first ligand is not substituted with the second ligand; and
washing the substrate comprising the first region and the second region with a washing solvent,
wherein, by the washing, the second region is selectively removed so that the first region is patterned.

2. The patterning method according to claim 1 , wherein the ligand-substituting ink further comprises ethylene glycol, and in spraying of the ligand-substituting ink, resolution is further improved.

3. The patterning method according to claim 1 , wherein the first ligand is an organic ligand.

4. The patterning method according to claim 3 , wherein the organic ligand has hydrophobic chemical properties.

5. The patterning method according to claim 1 , wherein the second ligand is an inorganic ligand or an organic/inorganic complex ligand.

6. The patterning method according to claim 5 , wherein the inorganic ligand or the organic/inorganic complex ligand has hydrophilic chemical properties.

7. The patterning method according to claim 1 , wherein the spraying of the ligand-substituting ink is any one selected from the group consisting of inkjet printing, spray coating, calligraphy and dropping.

8. The patterning method according to claim 1 , wherein the washing solvent is a non-polar solvent.

9. The patterning method according to claim 8 , wherein the non-polar solvent disperses nanoparticles having hydrophobic chemical properties.

10. The patterning method according to claim 8 , wherein the non-polar solvent is at least one selected from among octane, hexane, toluene, cyclohexane, chlorobenzene, benzene, chloroform and diethyl ether.

Assignees

• Univ Korea Res & Bus Found

Inventors

• Oh Soong Ju
• Ahn Jun Hyuk

Classifications

• H10P14/46

  using a liquid · CPC title

• B41M1/06 Primary

  Lithographic printing · CPC title

• C09D11/033

  characterised by the solvent · CPC title

• C09D11/037

  characterised by the pigment · CPC title

• C09D11/322 Primary

  Pigment inks · CPC title