Apparatus and methods associated with operating a plasma torch

Patent metadata

Field	Value
Publication number	US-11701734-B2
Application number	US-201916521626-A
Country	US
Kind code	B2
Filing date	Jul 25, 2019
Priority date	Jul 25, 2019
Publication date	Jul 18, 2023
Grant date	Jul 18, 2023

Abstract

Apparatus and methods associated with operating a plasma torch are disclosed. According to some implementations, the apparatus and methods involve the delivery of a process gas to a shuttle valve at first and second pressures for the purpose of altering an axial position of a valve element located inside the shuttle valve. The shuttle valve is configured such that at different axial positions of the valve element the flow of process gas into the plasma torch is altered.

First claim

What is claimed is:

1. A plasma torch comprising:
a first process gas flow chamber in which at least a part of a proximal end portion of an electrode can reside;
a second process gas flow chamber in which a distal end portion of the electrode can reside;
a third process gas flow chamber that at least partially surrounds each of the first and second process gas flow chambers, the first and third process gas flow chambers being separated by at least one wall having one or more holes; and
a valve element disposed between a distal end of the first process gas flow chamber and a proximal end of the second process gas flow chamber and transitional between a first axial position and a second axial position, wherein when the valve element is in the first axial position, a process gas entering the first process gas flow chamber flows to the second process gas flow chamber and, when the valve element is in the second axial position, the valve element closes a path from the first process gas flow chamber to the second process gas flow chamber and the process gas entering the first process gas flow chamber flows to the third process gas flow chamber via the one or more holes.

2. The plasma torch according to claim 1 , wherein the second axial position is distal to the first axial position.

3. The plasma torch according to claim 1 , wherein the valve element is continuously urged toward the first axial position.

4. The plasma torch according to claim 1 , wherein the first process gas flow chamber is configured to receive the process gas at a first pressure and at a second pressure, the second pressure being greater than the first pressure, the valve element configured to assume the first axial position when the process gas is delivered into the first process gas flow chamber at the first pressure, the valve element configured to assume the second axial position when the process gas is delivered into the first process gas flow chamber at the second pressure.

5. The plasma torch according to claim 1 , wherein the second process gas flow chamber is located between an exterior surface of the distal end portion of the electrode and an interior surface of a tip that at least partially surrounds the distal end portion of the electrode so that the second process gas flow chamber forms at least a portion of a plasma arc chamber between the tip and the electrode.

6. The plasma torch according to claim 5 , wherein the at least one wall having the one or more holes is a part of the tip.

7. The plasma torch according to claim 5 , wherein at least a portion of the third process gas flow chamber is located between an exterior surface of the tip and an interior surface of a shield cup that surrounds the tip so that the third process gas flow chamber forms at least a portion of a shield gas flow path between the shield cup and the tip.

8. The plasma torch according to claim 1 , wherein, when the valve element is in the first axial position, the valve element covers the one or more holes.

9. The plasma torch according to claim 1 , wherein the valve element includes a distal facing surface that faces the second process gas flow chamber, the distal facing surface being configured to close the path from the first process gas flow chamber to the second process gas flow chamber when the valve element is in the second axial position.

10. The plasma torch according to claim 9 , wherein a tip that at least partially surrounds the distal end portion of the electrode includes an inner peripheral shoulder adjacent an opening on which a portion of the distal facing surface of the valve element rests when the valve element is in the second axial position.

11. The plasma torch according to claim 1 , wherein the one or more holes are holes of a second size, the at least one wall further comprises one or more holes of a first size that is smaller than the second size, and wherein:
the one or more holes of the first size are configured to permit a first flow rate of the process gas from the first process gas flow chamber into the third process gas flow chamber when the valve element is in the first axial position; and
the one or more holes of the second size are configured to permit a second flow rate of the process gas from the first process gas flow chamber into the third process gas flow chamber when the valve element is in the second axial position, the second flow rate being greater than the first flow rate.

12. The plasma torch according to claim 4 , wherein the first pressure is less than 100 psig and the second pressure is greater than 100 psig.

13. The plasma torch according to claim 9 , wherein the valve element includes a proximal facing surface and a peripheral sidewall extending in an axial direction between the proximal facing surface and the distal facing surface, the peripheral sidewall including a plurality of peripheral recesses that extend between and through the proximal facing surface and the distal facing surface, the process gas flowing from the first process gas flow chamber to the second process gas flow chamber via the plurality of peripheral recesses when the valve element is in the first axial position, the process gas not being permitted through the plurality of peripheral recesses when the valve element is in the second axial position.

Assignees

• Esab Group Inc

Inventors

• Raymond Andrew

Classifications

• B23K10/006 Primary

  Control circuits therefor · CPC title

• F16K1/52

  Means for additional adjustment of the rate of flow · CPC title

• H05H1/34

  Details, e.g. electrodes, nozzles · CPC title

• H05H1/36

  Circuit arrangements (H05H1/38, H05H1/40 take precedence) · CPC title

• H05H1/28 Primary

  Cooling arrangements · CPC title