Systems and methods lattice spray substrates for mass spectrometry

Patent metadata

Field	Value
Publication number	US-11688596-B2
Application number	US-202117175302-A
Country	US
Kind code	B2
Filing date	Feb 12, 2021
Priority date	Feb 12, 2021
Publication date	Jun 27, 2023
Grant date	Jun 27, 2023

Abstract

The present disclosure relates to a lattice substrate adapted for use in direct ionization mass spectrometry. The substrate may have a plurality of tessellated unit cells forming an integral structure. Each tessellated unit cell may have a dimension of no more than about 1.5 mm and may include a plurality of pores arranged in an ordered pattern. The substrate may further include a form factor suitable for use with a direct ionization mass spectrometry system.

First claim

What is claimed is:

1. A lattice substrate adapted for use in direct ionization mass spectrometry, the substrate comprising:
a plurality of tessellated unit cells forming an integral structure, the tessellated unit cells each being formed by a plurality of intersecting filaments;
each said tessellated unit cell having a dimension of no more than about 1500 μm, and including a first plurality of voids formed by the intersecting filaments, the first plurality of voids being arranged in a first ordered pattern;
each said filament including a secondary lattice structure having a second plurality of voids formed by a plurality of struts that extend non-parallel to one another in three dimensions, the second plurality of voids also forming a second ordered three dimensional pattern; and
a form factor suitable for use with a direct ionization mass spectrometry system.

2. The substrate of claim 1 , wherein each said tessellated unit cell comprises an Octet-truss shape.

3. The substrate of claim 1 , wherein struts of the secondary lattice structure comprise a plurality of intersecting struts which form the second plurality of voids.

4. The substrate of claim 3 , wherein each one of said plurality of intersecting struts has a diameter in a range of between 100 microns and 300 nanometers.

5. The substrate of claim 1 , wherein each one of said intersecting filaments has a diameter in a range between 500 microns and 10 microns.

6. The substrate of claim 1 , wherein the tessellated unit cells differ in size along a dimension of the substrate, to provide an engineered porosity to the substrate over a dimension thereof.

7. The substrate of claim 6 , wherein at least some of the tessellated unit cells comprise an Octet-truss shape.

8. The substrate of claim 1 , wherein the tessellated unit cells differ in size along a length dimension of the substrate.

9. The substrate of claim 1 , wherein the substrate includes:
a length of no more than about 29.5 mm;
a width of no more than about 6 mm;
a thickness of no more than about 500 microns; and
a pointed end at one outermost end thereof.

10. The substrate of claim 9 , wherein the tessellated unit cells each comprise Octet-truss shaped unit cells having a dimension of about 500 microns in each of length, width and height, and each one of the first plurality of voids forming a pyramid shaped void.

11. A lattice substrate adapted for use in direct ionization mass spectrometry, the substrate comprising:
a plurality of tessellated unit cells forming an integral, elongated flat structure with first and second ends, and one of the first and second ends forming a pointed end;
each said tessellated unit cell having a dimension of no more than about 1.5 mm, and each said tessellated unit cell forming a plurality of internal voids acting as pores, with the pores arranged in an ordered pattern along a length of the substrate;
the substrate including a form factor with a length and width each being greater than a thickness thereof; and
the tessellated unit cells including Octet-truss shaped unit cells.

12. The lattice substrate of claim 11 , wherein the form factor includes:
a length of no more than about 25 mm; and
a thickness of no more than about 500 microns.

13. The lattice substrate of claim 12 , wherein the form factor includes a width of no more than about 20 mm.

14. The substrate of claim 11 , wherein the first plurality of voids within each said tessellated unit cell creates an engineered, varying porosity over a length of the substrate.

15. A method of constructing a lattice substrate adapted for use in direct ionization mass spectrometry, the method including:
forming a substrate having a plurality of tessellated unit cells, each one of the tessellated unit cells having a plurality of intersecting filaments and the plurality of tessellated unit cells forming an integral structure;
forming the tessellated unit cells such that each has a dimension of no more than about 1.5 mm, and such that each one of said tessellated unit cells includes a first plurality of voids arranged in an ordered pattern;
further forming each said intersecting filament with a secondary lattice structure, the secondary lattice structure having a plurality of struts that extend and intersect in three non-parallel dimensions to form a second plurality of voids therein; and
further forming the substrate with a form factor suitable for use with a direct ionization mass spectrometry system.

16. The method of claim 15 , wherein forming the substrate comprises creating the substrate with a three-dimensional printing process using a least one of a polymer, a ceramic or a metal.

17. A lattice substrate adapted for use in direct ionization mass spectrometry, the substrate comprising:
a plurality of tessellated unit cells having a plurality of intersecting filaments forming an integral structure;
each said tessellated unit cell including a first plurality of voids, formed by the intersecting filaments, where the first plurality of voids extend in three dimensions in a first ordered pattern;
each said filament comprises of a secondary lattice structure, with the secondary lattice structing including a plurality of intersecting struts extending non-parallel to one another in three dimensions, and forming a second plurality of voids extending in a three dimensional, second ordered pattern therewithin; and
a form factor suitable for use with a direct ionization mass spectrometry system.

Assignees

• L Livermore Nat Security Llc

Inventors

• Prieto Conaway Maria C
• Deotte Joshua R
• Dudukovic Nikola
• Duoss Eric B
• Moran Bryan D

Classifications

• B33Y80/00

  Products made by additive manufacturing · CPC title

• H01J49/0409 Primary

  Sample holders or containers (containers for retaining a material to be analyzed, B01L3/50, for DNA, C12Q1/6834, for biological materials, G01N33/543) · CPC title

• H01J49/165

  Electrospray ionisation · CPC title