Photocathode, electron tube, and method for manufacturing photocathode

US11688592B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11688592-B2
Application numberUS-202017609519-A
CountryUS
Kind codeB2
Filing dateMay 12, 2020
Priority dateJun 26, 2019
Publication dateJun 27, 2023
Grant dateJun 27, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A photocathode including a substrate, a photoelectric conversion layer provided on the substrate and generating photoelectrons in response to incidence of light, and an underlayer provided between the substrate and the photoelectric conversion layer and containing beryllium, in which the underlayer has a first underlayer containing a nitride of beryllium.

First claim

Opening claim text (preview).

The invention claimed is: 1. A photocathode comprising: a substrate; a photoelectric conversion layer provided on the substrate and configured to generate photoelectrons in response to incidence of light; and an underlayer provided between the substrate and the photoelectric conversion layer and containing beryllium, wherein the underlayer has a first underlayer containing a nitride of beryllium. 2. The photocathode according to claim 1 , wherein the underlayer has a second underlayer provided between the first underlayer and the photoelectric conversion layer and containing an oxide of beryllium. 3. The photocathode according to claim 2 , wherein an amount of the oxide of beryllium is larger than an amount of the nitride of beryllium in the second underlayer. 4. The photocathode according to claim 1 , wherein the underlayer is in contact with the substrate. 5. The photocathode according to claim 1 , wherein the photoelectric conversion layer is in contact with the underlayer. 6. The photocathode according to claim 1 , wherein the substrate is composed of a material that transmits the light. 7. The photocathode according to claim 1 , wherein the amount of the oxide of beryllium is larger than the amount of the nitride of beryllium in the underlayer. 8. The photocathode according to claim 1 , wherein in the underlayer, the amount of at least one of the nitride of beryllium and the oxide of beryllium is unevenly distributed in a thickness direction of the underlayer. 9. The photocathode according to claim 8 , wherein in the underlayer, the amount of the nitride of beryllium is larger on the substrate side than on the photoelectric conversion layer side, and the amount of the oxide of beryllium is larger on the photoelectric conversion layer side than on the substrate side. 10. The photocathode according to claim 1 , wherein in the underlayer, the amount of the nitride of beryllium is substantially uniformly distributed in the thickness direction of the underlayer, and the amount of the oxide of beryllium is substantially uniformly distributed in the thickness direction of the underlayer. 11. An electron tube comprising: the photocathode according to claim 1 ; and an anode configured to collect electrons. 12. A method for manufacturing a photocathode, the method comprising: a first step of preparing a substrate; a second step of forming an underlayer containing beryllium on the substrate; and a third step of forming a photoelectric conversion layer configured to generate photoelectrons in response to incidence of light on the underlayer, wherein the second step has a forming step of forming an intermediate layer containing a nitride of beryllium on the substrate, and a treatment step of performing an oxidation treatment with respect to the intermediate layer so as to form a first underlayer provided on the substrate and containing a nitride of beryllium and a second underlayer provided on the first underlayer and containing an oxide of beryllium as the underlayer. 13. The method for manufacturing a photocathode according to claim 12 , wherein in the forming step, the intermediate layer is formed by evaporation or sputtering of beryllium in a nitrogen atmosphere. 14. The method for manufacturing a photocathode according to claim 13 , wherein in the forming step, the intermediate layer is formed by evaporation or sputtering of beryllium in a state of mixing an inert gas different from nitrogen in a nitrogen atmosphere. 15. The method for manufacturing a photocathode according to claim 12 , wherein the oxidation treatment includes a heating treatment and/or a discharge treatment. 16. The method for manufacturing a photocathode according to claim 12 , wherein in the treatment step, the oxidation treatment is performed so that an amount of the oxide of beryllium is larger than an amount of the nitride of beryllium in the second underlayer. 17. The method for manufacturing a photocathode according to claim 12 , wherein in the second step, the underlayer is formed directly on the substrate. 18. The method for manufacturing a photocathode according to claim 12 , wherein in the third step, the photoelectric conversion layer is formed directly on the underlayer. 19. The method for manufacturing a photocathode according to claim 12 , wherein the substrate is composed of a material that transmits the light.

Assignees

Inventors

Classifications

  • Vessels, containers or parts thereof, e.g. substrates · CPC title

  • of photo-emissive cathodes; of secondary-emission electrodes · CPC title

  • H01J43/24Primary

    Dynodes having potential gradient along their surfaces · CPC title

  • H01J40/06Primary

    Photo-emissive cathodes · CPC title

  • Electrode arrangements using essentially more than one dynode · CPC title

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What does patent US11688592B2 cover?
A photocathode including a substrate, a photoelectric conversion layer provided on the substrate and generating photoelectrons in response to incidence of light, and an underlayer provided between the substrate and the photoelectric conversion layer and containing beryllium, in which the underlayer has a first underlayer containing a nitride of beryllium.
Who is the assignee on this patent?
Hamamatsu Photonics Kk
What technology area does this patent fall under?
Primary CPC classification H01J43/24. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 27 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).