Leak check method, leak check apparatus, plating method, and plating apparatus

Patent metadata

Field	Value
Publication number	US-11686647-B2
Application number	US-202217839400-A
Country	US
Kind code	B2
Filing date	Jun 13, 2022
Priority date	Dec 28, 2018
Publication date	Jun 27, 2023
Grant date	Jun 27, 2023

Abstract

A leak check method includes: performing a first inspection of measuring a pressure in an internal space formed by a seal of the substrate holder, while evacuating the internal space, and detecting that the pressure reaches a first pressure threshold value within a predetermined first inspection time; performing a second inspection of closing the internal space that has been evacuated, measuring the pressure in the closed internal space, and detecting that the pressure in the closed internal space does not exceed a second pressure threshold value within a predetermined second inspection time; and performing a third inspection of measuring a pressure difference between the pressure in the closed internal space and a vacuum pressure in a master container, and detecting that an amount of increase in the pressure difference within a predetermined third inspection time is kept equal to or below a pressure difference threshold value.

First claim

What is claimed:

1. A leak check apparatus for a substrate holder to be used in plating of a substrate, comprising:
a vacuum line communicating with an internal space formed by a seal of the substrate holder;
a first on-off valve coupled to the vacuum line;
a second on-off valve coupled to the vacuum line;
a pressure measuring device configured to measure a pressure in the internal space;
a master container communicating with the vacuum line;

a differential-pressure measuring device configured to measure a pressure difference between a pressure in the internal space and a pressure in the master container; and
an operation controller configured to control operations of the first on-off valve and the second on-off valve,
the pressure measuring device is coupled to a part of the vacuum line extending between a substrate-holder-side end of the vacuum line and the second on-off valve,
the master container is coupled to a part of the vacuum line extending between the first on-off valve and the second on-off valve, and

the pressure measuring device, the second on-off valve, and the first on-off valve are arranged in series along the vacuum line in an order of the pressure measuring device, the second on-off valve, and the first on-off valve,
the operation controller is configured to detect that a pressure in the internal space reaches a first pressure threshold value within a predetermined first inspection time, while producing a vacuum pressure in the internal space by opening the first on-off valve and the second on-off valve, and
the operation controller is configured to close the first on-off valve to close both the master container and the internal space in which the vacuum pressure has been produced while maintaining fluid communication between the internal space and the master container, and detect that the pressure in the closed internal space and a pressure in the closed master container do not exceed a second pressure threshold value within a predetermined second inspection time.

2. The leak check apparatus according to claim 1 , wherein the operation controller is configured to generate an alarm signal when the pressure in the internal space does not reach the first pressure threshold value within the predetermined first inspection time.

3. The leak check apparatus according to claim 1 , wherein the operation controller is configured to generate an alarm signal when the pressure in the closed internal space exceeds the second pressure threshold value within the predetermined second inspection time.

4. The method according to claim 1 , wherein the second pressure threshold value is a relative value determined by adding a predetermined amount of increase to a lowest point of the pressure in the internal space.

5. The leak check apparatus according to claim 1 , wherein the operation controller is configured to close the second on-off valve to shut off a communication between the internal space and the master container, and detect that an amount of increase in a pressure difference between the pressure in the closed internal space and the vacuum pressure in the master container within a predetermined third inspection time is kept equal to or below a pressure difference threshold value.

6. The leak check apparatus according to claim 5 , wherein the operation controller is configured to generate an alarm signal when the amount of increase in the pressure difference within the predetermined third inspection time exceeds the pressure difference threshold value.

7. A plating apparatus comprising:
a plating tank configured to hold a plating solution therein;
an anode arranged in the plating tank;
a substrate holder configured to detachably hold a substrate and immerse the substrate in the plating solution in the plating tank;
a plating power source configured to apply a voltage between the anode and the substrate held by the substrate holder; and
a leak check apparatus including:
(i) a vacuum line communicating with an internal space formed by a seal of the substrate holder;
(ii) a first on-off valve coupled to the vacuum line;
(iii) a second on-off valve coupled to the vacuum line;
(iv) a pressure measuring device configured to measure a pressure in the internal space;
(v) a master container communicating with the vacuum line; and
(vi) a differential-pressure measuring device configured to measure a pressure difference between a pressure in the internal space and a pressure in the master container; and
(vii) an operation controller configured to control operations of the first on-off valve and the second on-off valve,
wherein the pressure measuring device is coupled to a part of the vacuum line extending between a substrate-holder-side end of the vacuum line and the second on-off valve,
the master container is coupled to a part of the vacuum line extending between the first on-off valve and the second on-off valve,
the pressure measuring device, the second on-off valve, and the first on-off valve are arranged in series along the vacuum line in an order of the pressure measuring device, the second on-off valve, and the first on-off valve,
the operation controller is configured to detect that a pressure in the internal space reaches a first pressure threshold value within a predetermined first inspection time, while producing a vacuum pressure in the internal space by opening the first on-off valve and the second on-off valve, and
the operation controller is configured to close the first on-off valve to close both the master container and the internal space in which the vacuum pressure has been produced while maintaining fluid communication between the internal space and the master container, and detect that the pressure in the closed internal space and a pressure in the closed master container do not exceed a second pressure threshold value within a predetermined second inspection time.

8. The method according to claim 7 , wherein the second pressure threshold value is a relative value determined by adding a predetermined amount of increase to a lowest point of the pressure in the internal space.

Assignees

• Ebara Corp

Inventors

• Suzuki Kiyoshi
• Fujikata Jumpei

Classifications

• C25D7/123

  Semiconductors first coated with a seed layer or a conductive layer · CPC title

• C25D17/001

  Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

• C25D17/004 Primary

  Sealing devices · CPC title

• G01M3/3263 Primary

  using a differential pressure detector (G01M3/3245, G01M3/3272 take precedence) · CPC title

• C25D17/06

  Suspending or supporting devices for articles to be coated · CPC title