Tungsten oxide nanostructure thin films for electrochromic devices
US-2017192332-A1 · Jul 6, 2017 · US
US11680309B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11680309-B2 |
| Application number | US-201816645728-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 11, 2018 |
| Priority date | Sep 18, 2017 |
| Publication date | Jun 20, 2023 |
| Grant date | Jun 20, 2023 |
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A method for preparing an electrochromic device. In the method the device is prepared by inserting monovalent cations into a reducing electrochromic layer in advance, for instance, through a dry process. In particular, the method involves inserting monovalent cations into an electrochromic layer which includes a reducing electrochromic material. Then, subsequently and sequentially, placing an electrolyte layer and an ion storage layer on the electrochromic layer. In this way, it is possible to improve driving durability of the electrochromic device.
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The invention claimed is: 1. A method for preparing an electrochromic device, comprising: inserting monovalent cations into an electrochromic layer comprising a reducing electrochromic material; and laminating the electrochromic layer and an ion storage layer via an electrolyte layer, wherein both the electrochromic layer and the ion storage layer are laminated in a colored state; the monovalent cations are inserted into the electrochromic layer by thermal evaporation deposition; the thermal evaporation deposition is performed under conditions of a pressure of 10 mTorr or less and a temperature in a range of 500° C. to 700° C.; wherein the thermal evaporation deposition is performed so that a separate metal layer composed of a source of monovalent cations is not formed; and a content of monovalent cations inserted into the electrochromic layer is in a range of 1.0×10 −8 mol to 1.0×10 −6 mol, wherein the mole number of the monovalent cations inserted into the electrochromic layer is equal to a mole number of electrons present per cm 2 of the electrochromic layer which is obtained by dividing a charge quantity (C/cm 2 ) of the electrochromic layer with the Faraday constant (C/mol). 2. The method for preparing an electrochromic device according to claim 1 , wherein the monovalent cations are selected from the group consisting of Li + , Na + , K + , Rb + and Cs + . 3. The method for preparing an electrochromic device according to claim 1 , wherein the electrochromic layer comprises one or more oxide of one or more metal selected from the group consisting of It, Nb, Mo, Ta and W. 4. The method for preparing an electrochromic device according to claim 3 , further comprising a step of forming the electrochromic layer on a conductive base material using roll-to-roll equipment. 5. The method for preparing an electrochromic device according to claim 4 , comprising steps: unwinding the conductive base material from the roll-to-roll equipment; and forming the electrochromic layer on the unwound conductive base material by a deposition method. 6. The method for preparing an electrochromic device according to claim 5 , wherein the deposition method is sputtering deposition, and the sputtering deposition is performed under conditions of a pressure of 1 mTorr to 100 mTorr and a power of 50 W to 500 W. 7. The method for preparing an electrochromic device according to claim 1 , wherein the electrolyte layer comprises a gel polymer electrolyte formed from a composition comprising a metal salt that provides monovalent cations that are the same as the monovalent cations inserted into the electrochromic layer, an organic solvent, and a crosslinkable monomer. 8. The method for preparing an electrochromic device according to claim 1 , wherein the ion storage layer is a porous layer formed from a coating composition comprising particles having electrochromism. 9. The method for preparing an electrochromic device according to claim 8 , wherein the ion storage layer is formed by applying a coating composition comprising (a) one or more oxide particle of one or more metal selected from the group consisting of Cr, Mn, Fe, Co, Ni, Rh, and Irk; or (b) Prussian blue particles, on a second conductive base material, followed by heat treatment.
of refractory metals or yttrium · CPC title
Vacuum evaporation · CPC title
Constructional details · CPC title
Sputtering · CPC title
caused by electrodeposition, e.g. electrolytic deposition of an inorganic material on or close to an electrode · CPC title
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