Method and device for rotary blind embossing of a substrate, a female die and/or a male die for use in a device, and a method for producing a female die and/or a male die

US11679575B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11679575-B2
Application numberUS-201916956338-A
CountryUS
Kind codeB2
Filing dateJan 28, 2019
Priority dateFeb 6, 2018
Publication dateJun 20, 2023
Grant dateJun 20, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for the rotary blind embossing of a substrate, a device for the rotary blind embossing of a substrate, a female die and/or a male die for use in a device, and to a method for producing a female die and/or a male die. The method for the rotary blind embossing of a substrate in a work station including an embossing roller and a counter-pressure roller includes the following steps: a) preparing the substrate; b) blind embossing the substrate by means of at least one female die provided on the embossing roller and at least one male die provided on the counter-pressure roller. The device for the rotary blind embossing of a substrate has a work station having an embossing roller and a counter-pressure roller, at least one female die being provided on the embossing roller and at least one male die being provided on the counter-pressure roller.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for rotary blind embossing of a substrate in a work station comprising an embossing roller and a counter-pressure roller, wherein the method comprises the following steps: providing the substrate; blind embossing the substrate by means of at least one female die arranged on the embossing roller and at least one male die arranged on the counter-pressure roller; providing a positioning aid comprising at least one window region, the at least one window region being larger than the at least one female die and/or male die; arranging the positioning aid on the embossing roller and/or the counter-pressure roller; arranging the at least one female die and/or male die in the at least one window region of the positioning aid such that a gap is formed between an edge of the at least one window region and an edge of the at least one female die and/or male die; and adjusting a position of the at least one female die and/or male die within the at least one window region of the positioning aid by inserting an adjusting aid in the gap formed in the at least one window region, wherein the adjusting aid is arranged such that the at least one female die and/or male die is movable at least in one direction. 2. The method according to claim 1 , wherein, the method further comprises the following steps: fixing the at least one female die on the embossing roller and/or the at least one male die on the counter-pressure roller by means of a fixing device. 3. The method according to claim 1 , wherein, when the at least one female die and/or male die is arranged in the at least one window region of the positioning aid, the at least one female die and/or male die is fastened by means of a fastening device in the at least window region. 4. The method according to claim 1 , wherein the at least one female die and/or male die is deformed, before being arranged in the at least one window region of the positioning aid, such that the at least one female die and/or male die has a curvature which substantially corresponds to the diameter of the embossing roller and/or the diameter of the counter-pressure roller. 5. The method according to claim 1 , wherein the positioning aid is clamped onto the embossing roller and/or the counter-pressure roller such that the positioning aid has a curvature which substantially corresponds to the diameter of the embossing roller and/or the diameter of the counter-pressure roller. 6. The method according to claim 1 , wherein the at least one female die is magnetically attached to the embossing roller and/or the at least one male die is magnetically attached to the counter-pressure roller. 7. The method according to claim 1 , wherein the at least one female die is arranged on the embossing roller and the at least one male die is arranged on the counter-pressure roller such that the retention force with which the at least one female die is arranged on the embossing roller is higher, than the retention force with which the at least one male die is arranged on the counter-pressure roller. 8. The method according to claim 1 , wherein the embossing roller and the counter-pressure roller are driven in opposite directions to each other with corresponding rotational speeds. 9. The method according to claim 8 , wherein the at least one female die and the at least one male die engage with each other on every revolution such that the substrate located between the at least one female die and the at least one male die is embossed. 10. The method according to claim 9 , wherein the substrate is embossed such that the deviations between the embossings of each revolution are less than 2% percent. 11. The method according to claim 1 , wherein the method further comprises at least one of the following steps, which are performed in one or more further work stations: printing the substrate; severing the substrate; grooving and/or folding the substrate. 12. The method according to claim 1 , wherein the substrate is provided in sheets. 13. The method according to claim 12 , wherein the deviations between the embossings on the sheets of the substrate provided in sheets are less than 2% percent. 14. The method according to claim 12 , wherein more than 8000 sheets per hour of the substrate provided in sheets are processed by means of the method. 15. The method according to claim 1 , wherein the adjusting aid comprises at least one plate and/or gauge block and/or feeler gauge, and the step of adjusting comprises inserting one or more of the plate and/or gauge block and/or feeler gauge into the gap formed in the at least one window region. 16. A device for rotary blind embossing of a substrate, wherein the device comprises a work station which comprises an embossing roller and a counter-pressure roller, and wherein at least one female die is arranged on the embossing roller and at least one male die is arranged on the counter-pressure roller, and wherein the device has a positioning aid with at least one window region, the at least one window region being larger than the at least one female die and/or male die, wherein the positioning aid is arranged on the embossing roller and/or the counter-pressure roller and the at least one female die and/or male die is arranged in the at least one window region of the positioning aid such that a gap is formed between an edge of the at least one window region and an edge of the at least one female die and/or male die, and wherein a position of the at least one female die and/or male die within the at least one window region of the positioning aid can be adjusted by means of an adjusting aid inserted in the gap in the at least one window region of the positioning aid, and wherein the adjusting aid is arranged such that the at least one female die and/or male die is movable at least in one direction. 17. The device according to claim 16 , wherein the at least one female die is introduced as at least one elevation and/or recess into the surface of an embossing cylinder which is arranged on the embossing roller and/or wherein the at least one male die is introduced as at least one elevation and/or recess into the surface of a counter-pressure cylinder which is arranged on the counter-pressure roller. 18. The device according to claim 16 , wherein the positioning aid comprises metals. 19. The device according to claim 16 , wherein the positioning aid is formed to be magnetic. 20. The device according to claim 16 , wherein the positioning aid has a thickness that is increased compared with the remaining thickness of the positioning aid in a region around the at least one window region. 21. The device according to claim 16 , wherein the positioning aid has a width of at least 250 mm, and a length of at least 500 mm, and/or wherein the at least one window region has a width of at least 5 mm, and a length of at least 10 mm. 22. The device according to claim 16 , wherein the at least one female die is arranged on the embossing roller and the at least one male die is arranged on the counter-pressure roller such that the retention force with which the at least one female die is arranged on the embossing roller is higher, than the retention force with which the at least one male die is arranged on the counter-pressure roller. 23. The device according to claim 16 , wherein the ratio of the diameter of the embossing roller to the diameter of the counter-pressure roller is 1 to 2. 24. The device according t

Assignees

Inventors

Classifications

  • with embossing · CPC title

  • Cross sectional profile of the embossments · CPC title

  • Dies (B44B5/028 takes precedence) · CPC title

  • by rolling (B44B5/0061 takes precedence) · CPC title

  • Rotating embossing tools · CPC title

Patent family

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What does patent US11679575B2 cover?
A method for the rotary blind embossing of a substrate, a device for the rotary blind embossing of a substrate, a female die and/or a male die for use in a device, and to a method for producing a female die and/or a male die. The method for the rotary blind embossing of a substrate in a work station including an embossing roller and a counter-pressure roller includes the following steps: a) pre…
Who is the assignee on this patent?
Hinderer Muehlich Gmbh & Co Kg, Koenig & Bauer Ag
What technology area does this patent fall under?
Primary CPC classification B31F1/07. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 20 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).