Exhaust gas purification device

US11679379B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11679379-B2
Application numberUS-202217734702-A
CountryUS
Kind codeB2
Filing dateMay 2, 2022
Priority dateMay 20, 2021
Publication dateJun 20, 2023
Grant dateJun 20, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality of cells include an inlet cell opening at the upstream end and sealed at the downstream end, and an outlet cell adjacent to the inlet cell sealed at the upstream end and opening at the downstream end. The first catalyst layer is disposed on a surface of the partition wall in an upstream region. In a downstream region, the second catalyst layer is disposed inside the partition wall, and a second catalyst-containing wall including the partition wall and the second catalyst layer has a porosity of 35% or more.

First claim

Opening claim text (preview).

What is claimed is: 1. An exhaust gas purification device comprising: a substrate including: an upstream end through which an exhaust gas is introduced into the device; a downstream end through which the exhaust gas is discharged from the device; and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end; a first catalyst layer; and a second catalyst layer, wherein the plurality of cells include: an inlet cell opening at the upstream end and sealed at the downstream end; and an outlet cell adjacent to the inlet cell with the partition wall interposed between the inlet cell and the outlet cell, the outlet cell being sealed at the upstream end and opening at the downstream end, wherein the first catalyst layer is disposed on a surface of the partition wall in an upstream region including the upstream end of the substrate, wherein, in a downstream region including the downstream end of the substrate, the second catalyst layer is disposed inside the partition wall, and a second catalyst-containing wall including the partition wall and the second catalyst layer has a porosity of 35% or more. 2. The exhaust gas purification device according to claim 1 , wherein the upstream region overlaps with the downstream region. 3. The exhaust gas purification device according to claim 1 , wherein the length of the first catalyst layer Dx is from 10% to 90% of the distance D in an extending direction from the upstream end I to the downstream end J. 4. The exhaust gas purification device according to claim 3 , wherein the length of the first catalyst layer Dx is from 10% to 50% of the distance D. 5. The exhaust gas purification device according to claim 1 , wherein the length of the second catalyst layer Dy is from 30% to 100% of the distance D in an extending direction from the upstream end I to the downstream end J. 6. The exhaust gas purification device according to claim 1 , wherein the upstream region and the downstream region overlap in an extending direction. 7. The exhaust gas purification device according to claim 1 , wherein the components constituting the second catalyst layer are present inside the partition wall in a total weight amount of 80% or more. 8. The exhaust gas purification device according to claim 7 , wherein the total weight amount is 85% or more. 9. The exhaust gas purification device according to claim 7 , wherein the total weight amount is 90% or more. 10. The exhaust gas purification device according to claim 7 , wherein the total weight amount is 99% or more. 11. The exhaust gas purification device according to claim 7 , wherein the total weight amount is substantially 100%. 12. The exhaust gas purification device according to claim 1 , wherein, in the upstream region, a first catalyst-coated wall including the partition wall and the first catalyst layer is impermeable to gas.

Assignees

Inventors

Classifications

  • used in catalytic reactors · CPC title

  • Ceramic, e.g. monoliths · CPC title

  • Zr-Ce mixed oxides · CPC title

  • characterised by the number of flow passages, e.g. cell density · CPC title

  • by catalytic processes · CPC title

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Frequently asked questions

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What does patent US11679379B2 cover?
The exhaust gas purification device includes a substrate, a first catalyst layer, and a second catalyst layer. The substrate includes an upstream end, a downstream end, and a porous partition wall defining a plurality of cells extending between the upstream end and the downstream end. The plurality of cells include an inlet cell opening at the upstream end and sealed at the downstream end, and …
Who is the assignee on this patent?
Sugiura Koji, Hirabayashi Takeshi, Satou Akemi, and 7 more
What technology area does this patent fall under?
Primary CPC classification B01J35/0006. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Jun 20 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 12 related publications on this page (citations in our corpus or others sharing the same primary CPC).