Method for Coating a Substrate and Metal Alloy Vacuum Deposition Facility
US-2018112305-A1 · Apr 26, 2018 · US
US11668002B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11668002-B2 |
| Application number | US-201816642559-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jul 20, 2018 |
| Priority date | Aug 30, 2017 |
| Publication date | Jun 6, 2023 |
| Grant date | Jun 6, 2023 |
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A coated metallic substrate including at least a first coating of aluminum, such first coating having a thickness below 5 μm and being directly topped by a second coating including from 0.5 to 5.9% by weight of magnesium, the balance being zinc.
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What is claimed is: 1. A coated metallic substrate comprising: a metallic substrate; and a first coating on the metallic substrate, the first coating consisting of aluminum and having a thickness between 2 and 4 μm and being directly topped by a second coating including from 0.5 to 5.9% by weight of magnesium, a balance of the second coating being zinc. 2. The coated metallic substrate as recited in claim 1 wherein the second coating has a thickness between 1 and 10 μm. 3. The coated metallic substrate as recited in claim 1 wherein the second coating comprises from 0.5 to 4.5% by weight of magnesium. 4. The coated metallic substrate as recited in claim 3 wherein the second coating comprises from 0.5 to 2.0% by weight of magnesium, the balance being zinc. 5. The coated metallic substrate as recited in claim 1 wherein the second coating comprises from 2.0 to 5.0% by weight of magnesium, the balance being zinc. 6. The coated metallic substrate as recited in claim 1 wherein the second coating does not comprise at least one of the following elements chosen among: aluminum, silicon and copper. 7. The coated metallic substrate as recited in claim 1 wherein the second coating consists of zinc and magnesium. 8. The coated metallic substrate as recited in claim 1 wherein the microstructure of the second coating comprises less than 95% by weight of Mg2Zn11 phases in a Zn matrix. 9. The coated metallic substrate as recited in claim 1 further comprising an intermediate layer between the metallic substrate and the first coating, the intermediate layer including iron, nickel, and chromium. 10. The coated metallic substrate as recited in claim 9 wherein the intermediate layer further includes titanium. 11. The coated metallic substrate as recited in claim 10 , wherein the intermediate layer comprises Fe, Ni, Cr and Ti wherein an amount of Ti is above or equal to 5 wt. % and wherein the following equation is satisfied: 8 wt. %<Cr+Ti<40 wt. %, the balance being Fe and Ni. 12. The coated metallic substrate as recited in claim 9 , wherein the intermediate layer comprises at least 8% by weight nickel and at least 10% by weight chromium, a balance being iron. 13. The coated metallic substrate as recited in claim 9 , wherein the intermediate layer comprises 16-18% by weight chromium, 10-14% by weight nickel, a balance being iron. 14. The coated metallic substrate as recited in claim 1 wherein the metallic substrate selected from one of the group consisting of: aluminum substrate, steel substrate, stainless steel substrate, copper substrate, iron substrate, copper alloys substrate, titanium substrate, cobalt substrate and nickel substrate. 15. A method for the manufacture of the coated metallic substrate as recited in claim 1 , the method comprising the following steps: providing the metallic substrate; depositing the first coating consisting of aluminum at a thickness between 2 and 4 μm; and depositing the second coating including from 0.5 to 5.9% by weight of magnesium, the balance being zinc. 16. The method as recited in claim 15 further comprising preparing a surface of the metallic substrate after the providing step and before the depositing of the first coating. 17. The method as recited in claim 16 wherein the preparing of the surface includes at least one of the following group consisting of: shot blasting, pickling, etching, polishing, sand blasting, grinding and deposition of an intermediate layer comprising iron, nickel, chromium and optionally titanium. 18. The method as recited in claim 15 wherein the depositing of the first and second coatings occurs independently from each other and is performed by a hot-dip coating, by electro-deposition process or by vacuum deposition. 19. The method as recited in claim 18 wherein the depositing of the first and second coating occurs by vacuum deposition, and the first and second coatings independently from each other are deposited by magnetron cathode pulverization process, jet vapor deposition process, electromagnetic levitation evaporation process or electron beam physical vapor deposition. 20. A method for manufacturing an automotive vehicle part comprising: manufacturing the automotive vehicle part using the coated metallic substrate as recited in claim 1 . 21. An installation for continuous vacuum deposition of coatings on a running metallic substrate to obtain the coated metallic substrate as recited in claim 1 comprising in the following order: a first section including an electron beam evaporation device; and a second section including a jet vapor evaporation device. 22. The installation as recited in claim 21 further comprising an intermediate section including a magnetron cathode pulverization device upstream from the first section. 23. The installation as recited in claim 22 wherein the magnetron cathode pulverization device includes a vacuum deposition chamber including one target made of iron, chromium, nickel and optionally titanium, and a plasma source to deposit an intermediate layer comprising iron, nickel, chromium and optionally titanium on the metallic substrate. 24. The installation as recited in claim 21 wherein in the first section, the electron beam evaporation device includes a vacuum deposition chamber including an evaporation crucible including metal consisting of aluminum, a heating device and an electron gun. 25. The installation as recited in claim 21 wherein in the second section, the jet vapor evaporation device includes a vacuum deposition chamber including a vapor jet coater and at least one evaporation crucible suited to feed the vapor jet coater with a vapor comprising from 0.5 to 5.9% by weight of magnesium, the balance being zinc. 26. The coated metallic substrate as recited in claim 1 , wherein the thickness of the first coating is between 2 and 3 μm.
Gas flow assisted PVD deposition · CPC title
by cathodic sputtering · CPC title
Metallic sublayers · CPC title
including at least one metal alloy layer · CPC title
Transferring the substrates through a series of coating stations (C23C14/562 takes precedence) · CPC title
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