Edge exclusion apparatus and methods of using the same

Patent metadata

Field	Value
Publication number	US-11664220-B2
Application number	US-201916595618-A
Country	US
Kind code	B2
Filing date	Oct 8, 2019
Priority date	Oct 8, 2019
Publication date	May 30, 2023
Grant date	May 30, 2023

Abstract

A method of deposition is disclosed. The method can include dispensing a formable material over a substrate, where the substrate includes a non-uniform surface topography, and where the substrate includes an active zone and an exclusion zone. The method can also include curing the formable material in the exclusion zone to form a circular edge between the exclusion zone and the active zone, contacting the formable material with a superstrate, and curing the formable material in the active zone to form a layer over the substrate, wherein curing is performed while the superstrate is contacting the formable material.

First claim

What is claimed is:

1. A method of deposition, comprising:
dispensing a formable material over a substrate, wherein the surface area of the substrate is divided into an active zone and an exclusion zone, and wherein the exclusion zone of the substrate circumferentially surrounds the active zone of the substrate;
contacting the formable material over the substrate with a superstrate;
curing the formable material to form a circular boundary area of the exclusion zone, wherein the circular boundary area of the exclusion zone faces the active zone, wherein curing the formable material to form the circular boundary area of the exclusion zone is provided by rotating one or more light sources relative the substrate around a central axis of the substrate, wherein the entire exclusion zone is cured by irradiating light from the one or more light sources while rotating along the exclusion zone relative the central axis of the substrate; and
curing the formable material in the active zone to form a layer over the substrate, wherein curing is performed while the superstrate is contacting the formable material.

2. The method of claim 1 , further comprising positioning the one or more light sources over the exclusion zone.

3. The method of claim 2 , wherein curing the formable material to form the circular boundary area of the exclusion zone is provided by rotating the substrate around a central axis of the substrate.

4. The method of claim 2 , wherein positioning the one or more light sources above the exclusion zone is for between 0.1 second and 20 seconds.

5. The method of claim 1 , wherein the one or more light sources are rotated at a rate of between 3 revolutions/second and 100 revolutions/second.

6. The method of claim 1 , further comprising determining an edge of the exclusion zone prior to dispensing formable material over the substrate.

7. The method of claim 1 , wherein the exclusion zone is between 0.5% and 20% the surface area of the substrate.

8. The method of claim 1 , wherein the exclusion zone surrounds and is exterior to the active zone.

9. The method of claim 1 , wherein the one or more light sources are UV radiation.

10. The method of claim 1 , wherein curing the formable material in the active zone is done by using a light source different from the one or more light sources shining above the exclusion zone.

11. The method of claim 1 , wherein the cured material at the edge of the exclusion zone has a viscosity at least two orders of magnitude greater than a viscosity of the formable material in the active zone after rotating the one or more light sources over the exclusion zone.

12. The method of claim 1 , wherein the one or more light sources comprises a laser diode.

13. The method of claim 12 , wherein the laser diode uses a digital micromirror device (DMD) to expose the formable material.

14. The method of claim 1 , wherein the one or more light sources comprises a UV light emitting diode (LED) and wherein the UV LED uses a digital micromirror device (DMD) to expose the formable material.

15. A method of manufacturing an article, comprising:
dispensing a formable material over a substrate, wherein the surface area of the substrate is divided into an active zone and an exclusion zone, and wherein the exclusion zone of the substrate circumferentially surrounds the active zone of the substrate;
contacting the formable material over the substrate with a superstrate;
curing the formable material to form a circular boundary area of the exclusion zone, wherein the circular boundary area of the exclusion zone faces the active zone, wherein curing the formable material to form the circular boundary area of the exclusion zone is provided by rotating one or more light sources relative the substrate around a central axis of the substrate, wherein the entire exclusion zone is cured by irradiating light from the one or more light sources while rotating along the exclusion zone relative the central axis of the substrate;
curing the formable material in the active zone to form a planar layer over the substrate, wherein curing is performed while the superstrate is contacting the formable material;
separating the superstrate and the planar layer on the substrate;
processing the substrate on which the planar layer has been formed; and

manufacturing the article from the processed substrate.

Assignees

• Canon Kk

Inventors

• Choi Byung-Jin

Classifications

• H10P14/6542

  by using coherent radiation, e.g. using a laser · CPC title

• H10P14/6538

  by exposure to UV light · CPC title

• H10P14/6342 Primary

  Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating · CPC title

• H10P95/08 Primary

  Planarisation of organic insulating materials · CPC title

• B29C33/40

  Plastics, e.g. foam or rubber · CPC title