Method and apparatus for purifying gas

US11660569B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11660569-B2
Application numberUS-201816610157-A
CountryUS
Kind codeB2
Filing dateMay 9, 2018
Priority dateMay 9, 2017
Publication dateMay 30, 2023
Grant dateMay 30, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method and apparatus for purifying gas where gas is treated in a multistage treatment having at least two ejector stages, a motive medium including liquid, steam or gaseous agent at high pressure injected by an ejector of the ejector stage, and the gas is sucked into the same ejector and mixed with the motive medium for forming a mixture, at least a part of gas and/or liquid phase of the mixture is supplied to a second ejector stage having so that a second motive medium which includes liquid, steam or gaseous agent is injected to the ejector and the gas and/or the liquid phase is sucked into the same ejector in which the gas and/or liquid phase is mixed with the second motive medium for forming a second mixture, at least one of the mixtures includes an additive for removing impurities of the gas, and a purified gas is formed.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for purifying gas, wherein a gas is treated in a multistage treatment comprising at least two ejector stages for absorbing the gas to a liquid and pressurizing the gas simultaneously, and the method comprises, providing a pressurized motive medium which comprises liquid, steam or gaseous agent at high pressure, wherein the pressure of the motive medium is 1.3-100 bar if the motive medium is liquid and wherein the pressure of the motive medium is 3-300 bar if the motive medium is steam, injecting the pressurized motive medium into at least one ejector of the first ejector stage, and sucking the gas into the same ejector in which the gas is mixed with the motive medium for forming a mixture comprising a gas phase and a liquid phase arranging the mixture to flow through a pipe or tube which has enough residence time to allow dissolving a desired part of the gas into the liquid after the ejector stage, separating at least a part of the gas phase from the mixture in a separation stage after the first ejector stage to form a liquid phase, supplying at least a part of the gas phase to a second or later ejector stage which comprises at least one ejector so that a second or later motive medium which comprises liquid, steam or gaseous agent is injected to the ejector and the gas phase is sucked into the same ejector in which the gas phase is mixed with the second or later motive medium for forming a second or later mixture, and separating at least a part of the gas phase from the second or later mixture in a separation stage after the second or later ejector stage, and forming a purified gas, treating at least a part of the separated liquid phase by a regeneration for removing carbon dioxide and other impurities from the liquid phase and/or for recovering a desired chemical compound from the liquid phase at least after the first separation stage, and supplying at least a part of the regenerated liquid phase back to the motive medium of the same first ejector stage, and the regeneration is carried out under vacuum, and at least one of the mixtures comprises an additive which contains sodium carbonate, potassium carbonate or combination thereof for removing impurities of the gas, and the additive is added for increasing a bonding of desired impurities to the liquid and/or increasing a capture of desired impurities in the separation stages; wherein, the pressure of the gas is increased from a starting pressure to 1.1-3.0 bar in the first ejector stage and from the first pressure level to the final pressure level of 2-150 bar in the second or later ejector stage. 2. The method according to claim 1 , wherein high pressure liquid is used as motive medium in the first ejector stage and/or in the second or later ejector stage. 3. The method according to claim 1 , wherein high pressure steam is used as motive medium in the first ejector stage and/or in the second or later ejector stage. 4. The method according to claim 1 , wherein the pressure of the motive medium is 1.3-50 bar if the motive medium is liquid. 5. The method according to claim 1 , wherein the pressure of the motive medium is 20-100 bar if the motive medium is steam. 6. The method according to claim 1 , wherein the method comprises 2-8 ejector stages. 7. The method according to claim 1 , wherein the gas is com-pressed by the motive medium in the ejectors so that pressure of the gas is increased to a first pressure level in the first ejector stage and pressure of the gas is increased from the previous pressure level to a second or later pressure level in the second or later ejector stage. 8. The method according to claim 1 , wherein at least a part of the gas phase of the mixture is separated in the separation stage. 9. The method according to claim 1 , wherein at least a part of the liquid phase separated in the separation stage is fed as the motive medium to the at least two ejector stages. 10. The method according to claim 1 , wherein the liquid phase is treated in an additional treatment stage after the separation stage for removing and/or recovering a desired compound from the liquid phase. 11. The method according to claim 1 , wherein the purified gas is treated, post-treated or refined.

Assignees

Inventors

Classifications

  • Multiple stage absorption · CPC title

  • with gas-liquid contact · CPC title

  • Polyethylene glycol, ethers or esters thereof, e.g. Selexol · CPC title

  • Hydroxides · CPC title

  • Selection of liquid materials for use as absorbents · CPC title

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What does patent US11660569B2 cover?
A method and apparatus for purifying gas where gas is treated in a multistage treatment having at least two ejector stages, a motive medium including liquid, steam or gaseous agent at high pressure injected by an ejector of the ejector stage, and the gas is sucked into the same ejector and mixed with the motive medium for forming a mixture, at least a part of gas and/or liquid phase of the mixt…
Who is the assignee on this patent?
Teknologian Tutkimuskeskus Vtt Oy
What technology area does this patent fall under?
Primary CPC classification B01D53/1406. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue May 30 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).