PVD barrier coating for superalloy substrates

US11655544B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11655544-B2
Application numberUS-201917284635-A
CountryUS
Kind codeB2
Filing dateOct 16, 2019
Priority dateOct 17, 2018
Publication dateMay 23, 2023
Grant dateMay 23, 2023

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  1. Title

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  2. Abstract

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  4. Key dates

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  5. First independent claim

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Abstract

Official abstract text for this publication.

A layered stack that can be used as an oxidation and chemical barrier with superalloy substrates, including Ni, Ni—Co, Co, and Ni-aluminide based substrates, and methods of preparing the layered stack. The layer system can be applied to a substrate in a single physical vapor deposition process with no interruption of vacuum conditions.

First claim

Opening claim text (preview).

The invention claimed is: 1. A multilayered structure comprising: a. a metallic substrate; and b. a multilayer coating disposed on the metallic substrate comprising: i. a discrete first layer disposed on the metallic substrate, the discrete first layer comprising a Ni-, Co-, Ni—Co-, or Ni-aluminide based material; ii. a discrete second layer disposed on the discrete first layer, the discrete second layer comprising Al, Cr, O, and further comprising a Ni-, Co-, Ni—Co, or Ni-aluminide based material; and iii. a discrete third layer disposed on the discrete second layer, the discrete third layer comprising Al, Cr, and O. 2. The multilayered structure according to claim 1 , wherein at least the metallic substrate is a Ni-based superalloy comprising 38 to 76 wt. % Ni, up to 27 wt. % Cr, and up to 20 wt. % Co or wherein the metallic substrate is a Co-based superalloy comprising 35 to 65 wt. % Co, 19 to 30 wt. % Cr, and up to 35 wt. % Ni. 3. The multilayered structure according to claim 1 , wherein at least the discrete first layer comprises 38 to 76 wt. % Ni, up to 27 wt. % Cr, and up to 20 wt. % Co or wherein the discrete first layer comprises 35 to 65 wt. % Co, 19 to 30 wt. % Cr, and up to 35 wt. % Ni. 4. The multilayered structure according to claim 1 , wherein the metallic substrate is a Ni—Co-based superalloy comprising 40 to 80 wt. % Ni, 9 to 35 wt. % Co, and 10 to 20 wt. % Cr. 5. The multilayered structure according to claim 1 , wherein the discrete first layer comprises 40 to 80 wt. % Ni, 9 to 35 wt. % Co, and 10 to 20 wt. % Cr. 6. The multilayered structure according to claim 1 , wherein the metallic substrate is a Ni-aluminide comprising NiAl, NiAl 3 , or Ni 3 Al with a deviation from nominal composition of ±10 wt. %. 7. The multilayered structure according to claim 1 , wherein the metallic substrate is a single-crystalline Ni-based superalloy comprising 38 to 76 wt. % Ni, up to 27 wt. % Cr, and up to 20 wt. % Co. 8. The multilayered structure according to claim 1 , the discrete first layer comprising a chemical composition that is the same as a chemical composition of the metallic substrate.

Assignees

Inventors

Classifications

  • including layers graded in composition or physical properties · CPC title

  • Metal-aluminide intermetallic compounds · CPC title

  • Electric arc evaporation · CPC title

  • with at least one metal alloy layer · CPC title

  • Reactive sputtering or evaporation · CPC title

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What does patent US11655544B2 cover?
A layered stack that can be used as an oxidation and chemical barrier with superalloy substrates, including Ni, Ni—Co, Co, and Ni-aluminide based substrates, and methods of preparing the layered stack. The layer system can be applied to a substrate in a single physical vapor deposition process with no interruption of vacuum conditions.
Who is the assignee on this patent?
Oerlikon Surface Solutions Ag, Oerlikon Surface Solutions Ag Pfaeffikon
What technology area does this patent fall under?
Primary CPC classification C23C28/3455. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 23 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).