Ethylene-vinyl alcohol copolymer composition with improved oxygen barrier properties
US-11124642-B1 · Sep 21, 2021 · US
Ethylene-vinyl alcohol copolymer resin composition, ethylene-vinyl alcohol copolymer film formed therefrom, and multilayer structure containing the same
US11655317B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11655317-B2 |
| Application number | US-202217701219-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 22, 2022 |
| Priority date | Jun 16, 2021 |
| Publication date | May 23, 2023 |
| Grant date | May 23, 2023 |
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Abstract
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The present invention relates to an ethylene-vinyl alcohol copolymer (EVOH) resin composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The surface roughness of the EVOH resin composition is the root mean square gradient (Sdq) between 0.0005 and 13. The EVOH of the invention can reduce the torque output during processing, and make the appearance of the EVOH film highly uniform.
First claim
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What is claimed is: 1. An ethylene-vinyl alcohol copolymer resin composition in the form of pellet comprising an ethylene-vinyl alcohol copolymer resin, wherein the ethylene-vinyl alcohol copolymer resin composition has a surface with a root mean square gradient (Sdq) ranging from 0.0005 to 13 and its largest outer diameter or long axis is 1.5 to 5.0 mm. 2. The ethylene-vinyl alcohol copolymer resin composition of claim 1 , wherein the surface of the ethylene-vinyl alcohol copolymer resin composition has a developed interfacial area ratio (Sdr) ranging from 0.05% to 110%. 3. The ethylene-vinyl alcohol copolymer resin composition of claim 1 , wherein the surface of the ethylene-vinyl alcohol copolymer resin composition has a surface arithmetic mean height (Sa) ranging from 0.003 to 1.5 μm. 4. The ethylene-vinyl alcohol copolymer resin composition of claim 1 , wherein the surface of the ethylene-vinyl alcohol copolymer resin composition has a surface maximum trough depth (Sv) ranging from 0.005 to 8 μm. 5. The ethylene-vinyl alcohol copolymer resin composition of claim 1 , wherein the ethylene-vinyl alcohol copolymer resin has an ethylene content of 20 to 48 mole %. 6. The ethylene-vinyl alcohol copolymer resin composition of claim 1 , wherein the ethylene-vinyl alcohol copolymer resin has a saponification degree greater than 99.5 mole %. 7. The ethylene-vinyl alcohol copolymer resin composition of claim 1 , wherein the surface has a maximum line height (Rz) between 0.02 and 15 μm. 8. The ethylene-vinyl alcohol copolymer resin composition of claim 1 , wherein the surface has a maximum line height (Rz) between 0.02 and 9.9 μm. 9. The ethylene-vinyl alcohol copolymer resin composition of claim 1 having a moisture content of less than or equal to 1 wt %. 10. The ethylene-vinyl alcohol copolymer resin composition of claim 1 having a boron content of 5 to 550 ppm. 11. The ethylene-vinyl alcohol copolymer resin composition of claim 1 having an alkali metal content of 5 to 550 ppm. 12. The ethylene-vinyl alcohol copolymer resin composition of claim 1 further comprising one or a combination of the group consisting of cinnamic acid, conjugated polyene, slip agent and alkaline earth metal.
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Classifications
Metal salts of carboxylic acids · CPC title
comprising polyamides · CPC title
using interposed adhesives or interposed materials with bonding properties · CPC title
Polyvinylalcohol · CPC title
comprising vinyl acetate or vinyl alcohol (co)polymers · CPC title
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- What does patent US11655317B2 cover?
- The present invention relates to an ethylene-vinyl alcohol copolymer (EVOH) resin composition, an EVOH film formed therefrom, and a multilayer structure containing the same. The surface roughness of the EVOH resin composition is the root mean square gradient (Sdq) between 0.0005 and 13. The EVOH of the invention can reduce the torque output during processing, and make the appearance of the EVOH…
- Who is the assignee on this patent?
- Chang Chun Petrochemical Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification C08F216/04. Mapped technology areas include Chemistry & Metallurgy.
- When was this patent published?
- Publication date Tue May 23 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 9 related publications on this page (citations in our corpus or others sharing the same primary CPC).