Method for decreasing bubble lifetime on a glass melt surface

US11655176B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11655176-B2
Application numberUS-201917294833-A
CountryUS
Kind codeB2
Filing dateNov 14, 2019
Priority dateNov 21, 2018
Publication dateMay 23, 2023
Grant dateMay 23, 2023

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method of reducing bubble lifetime on the free surface of a volume of molten glass contained within or flowing through a vessel including a free volume above the free surface, thereby minimizing re-entrainment of the bubbles back into the volume of molten glass and reducing the occurrence of blisters in finished glass products. The method includes vaporizing a volatile material, entraining the vapor in a carrier gas to form an enrichment gas, and flowing the enrichment gas into the free volume to increase a concentration of the volatile material at the surface of the molten glass in the vessel.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of reducing bubble lifetime in a glass making process, comprising: forming a first molten glass in a melting vessel; directing the first molten glass through a conditioning vessel downstream of the melting vessel, the conditioning vessel comprising a free volume above a free surface of the first molten glass in the conditioning vessel; and flowing an enrichment gas comprising a volatile material into the free volume, the volatile material reducing a surface tension of the first molten glass in the conditioning vessel, wherein a source of the volatile material is a second molten glass. 2. The method according to claim 1 , wherein the flowing an enrichment gas comprises flowing a carrier gas over the source of the volatile material and heating the source of volatile material. 3. The method according to claim 2 , further comprising controlling a concentration of the volatile material in the enrichment gas by controlling a temperature of the source of volatile material. 4. The method according to claim 1 , wherein an atmosphere in the free volume is saturated with the volatilized material. 5. The method according to claim 1 , wherein the conditioning vessel comprises a fining vessel or a stirring vessel. 6. The method according to claim 1 , wherein the volatile material comprises B 2 O 3 . 7. A method of reducing bubble lifetime in a glass making process, comprising: forming a first molten glass in a melting vessel; flowing the first molten glass through a conditioning vessel downstream of the melting vessel, the conditioning vessel comprising a free volume above a free surface of the first molten glass; flowing a carrier gas through a surfactant distribution vessel comprising a source of B 2 O 3 , wherein the source of B 2 O 3 is a glass; heating the surfactant distribution vessel to melt the source of B 2 O 3 and form a second molten glass and a boron-comprising vapor; entraining the boron-comprising vapor in the carrier gas to form an enrichment gas; and flowing the enrichment gas into the free volume of the conditioning vessel. 8. The method according to claim 7 , wherein the free volume comprises an atmosphere, and a concentration of B 2 O 3 in the atmosphere is maintained in saturation. 9. The method according to claim 7 , wherein a partial pressure of B 2 O 3 in the free volume is equal to or greater than a partial pressure of B 2 O 3 within a bubble in the first molten glass. 10. The method according to claim 7 , wherein a partial pressure of B 2 O 3 in the free volume is controlled by controlling a temperature of the source of B 2 O 3 in the surfactant distribution vessel. 11. The method according to claim 7 , wherein the source of B 2 O 3 is pure B 2 O 3 . 12. The method according to claim 7 , wherein the conditioning vessel comprises a fining vessel. 13. The method according to claim 7 , wherein the conditioning vessel comprises a stirring vessel. 14. The method according to claim 7 , further comprising directing the first molten glass from the conditioning vessel to a forming body and drawing the first molten glass from the forming body.

Assignees

Inventors

Classifications

  • Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces · CPC title

  • Refining (C03B5/18 takes precedence {; Refining agents C03C1/004}) · CPC title

  • C03B7/07Primary

    Electric means · CPC title

  • C03B5/20Primary

    Bridges, shoes, throats, or other devices for withholding dirt, foam, or batch · CPC title

  • C03B5/235Primary

    Heating the glass (C03B5/02, C03B5/18, C03B5/225 take precedence) · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11655176B2 cover?
A method of reducing bubble lifetime on the free surface of a volume of molten glass contained within or flowing through a vessel including a free volume above the free surface, thereby minimizing re-entrainment of the bubbles back into the volume of molten glass and reducing the occurrence of blisters in finished glass products. The method includes vaporizing a volatile material, entraining th…
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03B7/07. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue May 23 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).