Semiconductor device and method of manufacturing the same

US11652094B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11652094-B2
Application numberUS-202217692954-A
CountryUS
Kind codeB2
Filing dateMar 11, 2022
Priority dateMar 19, 2018
Publication dateMay 16, 2023
Grant dateMay 16, 2023

How to read this patent

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  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

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Abstract

Official abstract text for this publication.

In one embodiment, a semiconductor device includes a first interconnection including a first extending portion extending in a first direction, and a first curved portion curved with respect to the first extending portion. The device further includes a second interconnection including a second extending portion extending in the first direction and adjacent to the first extending portion in a second direction, and a second curved portion curved with respect to the second extending portion. The device further includes a first plug provided on the first curved portion, or on a first non-opposite portion included in the first extending portion and not opposite to the second extending portion in the second direction. The device further includes a second plug provided on the second curved portion, or on a second non-opposite portion included in the second extending portion and not opposite to the first extending portion in the second direction.

First claim

Opening claim text (preview).

The invention claimed is: 1. A semiconductor device comprising: a first chip including: a substrate, and a transistor provided on the substrate; a second chip bonded to the first chip and including: a first interconnection included in a plurality of interconnections in an interconnection layer, a first via plug provided above and in contact with the first interconnection, a first bit line provided above and in contact with the first via plug, and extending in a first direction parallel to a surface of the substrate, a second via plug provided above and in contact with the first bit line, and a columnar portion provided above and electrically connected to the second via plug, including a semiconductor layer and a charge accumulating layer, and extending in a second direction perpendicular to the surface of the substrate; a metal pad body provided on a bonding surface of the first chip and the second chip, and electrically connecting the transistor of the first chip to the first interconnection of the second chip, wherein the first via plug has a first width in the first direction, the first interconnection has a second width in the first direction, and the second width of the first interconnection is greater than the first width of the first via plug. 2. The device of claim 1 , further comprising a memory cell array provided in the second chip, and including a plurality of electrode layers and a plurality of insulating layers that are alternately stacked, wherein the columnar portion is provided in the plurality of electrode layers and the plurality of insulating layers. 3. The device of claim 1 , wherein the plurality of electrode layers function as word lines. 4. The device of claim 1 , wherein a position where the second plug contacts the first bit line is shifted from a position where the first plug contacts the first bit line in the first direction. 5. The device of claim 1 , wherein the first bit line includes a linear portion that extends in a straight-line shape or in a curved-line shape, and the first plug is provided under the linear portion. 6. The device of claim 5 , wherein the linear portion includes at least a straight-line portion that extends in a straight-line shape, and a bent portion that is bent with respect to the straight-line portion, and the first plug is provided under the straight-line portion. 7. The device of claim 5 , wherein the linear portion includes at least a straight-line portion that extends in a straight-line shape, and a bent portion that is bent with respect to the straight-line portion, and the first plug is provided under the bent portion.

Assignees

Inventors

Classifications

  • characterised by the through-semiconductor vias [TSVs] in the stacked chips · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • Configurations of stacked chips · CPC title

  • batch processes · CPC title

Patent family

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External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11652094B2 cover?
In one embodiment, a semiconductor device includes a first interconnection including a first extending portion extending in a first direction, and a first curved portion curved with respect to the first extending portion. The device further includes a second interconnection including a second extending portion extending in the first direction and adjacent to the first extending portion in a sec…
Who is the assignee on this patent?
Kioxia Corp
What technology area does this patent fall under?
Primary CPC classification H10W90/00. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue May 16 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 3 related publications on this page (citations in our corpus or others sharing the same primary CPC).