Polyacetal resin composition

US11634576B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11634576-B2
Application numberUS-201917051919-A
CountryUS
Kind codeB2
Filing dateApr 24, 2019
Priority dateJun 19, 2018
Publication dateApr 25, 2023
Grant dateApr 25, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A polyacetal resin composition capable of minimizing degradation when a molded body thereof comes into contact with an acidic cleaner. The polyacetal resin composition contains with respect to (A) 100 parts by mass of a polyacetal copolymer in which the amount of a hemiformal end group is 0.8 mmol/kg or less, (B) more than 1.0 parts by mass and at most 5.0 parts by mass of a hindered phenol-based antioxidant, and (C) more than 4.0 parts by mass and at most 30 parts by mass of magnesium oxide.

First claim

Opening claim text (preview).

The invention claimed is: 1. A polyacetal resin composition, comprising: (A) a polyacetal copolymer in an amount of 100 parts by mass, wherein the polyacetal copolymer (A) has a hemiformal end group content of 0.2-0.8 mmol/kg, (B) a hindered phenol-based antioxidant selected from the group consisting of compound (B-1) Tetrakis[methylene-3-(3,5-di-t-butyl-4-hydroxyphenyl)propionate methane and compound (B-2) Triethylene glycol bis(3-tert-butyl-4-hydroxy-5-methylphenyl)propionate in an amount of 1.1 parts by mass or more and 2.0 parts by mass or less, (C) magnesium oxide in an amount of 6.0 parts by mass or more and 15 parts by mass or less, and (D) polyethylene glycol in an amount of 2.0 part by mass or more and 5.0 parts by mass or less, wherein a BET specific surface area of magnesium oxide ranges from 100 to 155 m 2 /g, and an average particle diameter of magnesium oxide is 7.0 μm or less, wherein a number average molecular weight of the polyethylene glycol is 1000 or more and less than 9300. 2. An automotive part or motorcycle part comprising a molded product of the polyacetal resin composition according to claim 1 . 3. The automotive part or motorcycle part according to claim 2 , wherein the automotive part or motorcycle part is a part to be brought into contact with an acidic cleaner. 4. A method for improving acid resistance against an acid component derived from a strongly acidic component, wherein the method comprises using an automobile part or motorcycle part comprising the molded product of the polyacetal resin composition according to claim 1 . 5. The method according to claim 4 , wherein the acid component is derived from an acidic cleaner. 6. The polyacetal resin composition according to claim 1 , wherein the BET specific surface area of the magnesium oxide ranges from 135 to 155 m 2 /g.

Assignees

Inventors

Classifications

  • Stabilisers against oxidation, heat, light, ozone · CPC title

  • Magnesia, i.e. magnesium oxide · CPC title

  • Selection of particular materials · CPC title

  • C08K5/134Primary

    Phenols containing ester groups · CPC title

  • Polyalkylene oxides · CPC title

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What does patent US11634576B2 cover?
A polyacetal resin composition capable of minimizing degradation when a molded body thereof comes into contact with an acidic cleaner. The polyacetal resin composition contains with respect to (A) 100 parts by mass of a polyacetal copolymer in which the amount of a hemiformal end group is 0.8 mmol/kg or less, (B) more than 1.0 parts by mass and at most 5.0 parts by mass of a hindered phenol-bas…
Who is the assignee on this patent?
Polyplastics Co
What technology area does this patent fall under?
Primary CPC classification C08K5/134. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Apr 25 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).