Systems for managing abrasive media in cavitated fluid

US11633835B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11633835-B2
Application numberUS-201816221019-A
CountryUS
Kind codeB2
Filing dateDec 14, 2018
Priority dateDec 14, 2018
Publication dateApr 25, 2023
Grant dateApr 25, 2023

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Systems for managing abrasive media in cavitated fluid include a set of sensors in communication with cavitated fluid in a processing tank and a processor coupled to the set of sensors. The processor is configured to determine a density of an abrasive media in the cavitated fluid in the processing tank and facilitate maintaining the density of abrasive media in the cavitated fluid in the processing tank at a level that is greater than or equal to a threshold level of abrasive media. The processor is further configured to command the abrasive media addition device to add the recycled abrasive media to the processing tank to increase the density of abrasive media in the cavitated fluid in response to determining that an average density of abrasive media is less than the threshold density of abrasive media.

First claim

Opening claim text (preview).

What is claimed is: 1. A system for managing abrasive media in a cavitated fluid within a processing tank for use in performing a cavitation peening technique on a workpiece in the processing tank, the system comprising: a set of sensors in communication with the cavitated fluid in the processing tank; a processor coupled to the set of sensors, the processor configured to: determine a density of an abrasive media in the cavitated fluid in the processing tank in response to input from the set of sensors, and facilitate maintaining the density of abrasive media in the cavitated fluid in the processing tank at a level that is greater than or equal to a threshold level of abrasive media; and an abrasive media addition device in communication with the processor and in fluid communication with the processing tank, the abrasive media addition device configured to add recycled abrasive media to the cavitated fluid in the processing tank, wherein: in determining the density of abrasive media, the processor is configured to calculate an average density of abrasive media in the cavitated fluid; and the processor is further configured to command the abrasive media addition device to add the recycled abrasive media to the processing tank to increase the density of abrasive media in the cavitated fluid in response to determining that the average density of abrasive media is less than the threshold density of abrasive media. 2. The system according to claim 1 , further comprising: a recirculation tank; a conduit fluidically coupling the processing tank and the recirculation tank so that excess cavitation fluid in the processing tank flows into the recirculation tank as overflow cavitation fluid, wherein the abrasive media addition device fluidically couples the processing tank and the recirculation tank so that abrasive media from a first layer of abrasive media on a bottom of the recirculation tank is added to the cavitation fluid in the processing tank; a cavitation nozzle in the processing tank and fluidically coupled to the overflow cavitation fluid in the recirculation tank so that filtered water from the overflow cavitation fluid in the recirculation tank is injected into the processing tank as a cavitating jet of water; and an abrasive media distribution device in the processing tank and configured to distribute abrasive media from a second layer of abrasive media on a bottom of the processing tank into the cavitation fluid in the processing tank. 3. The system of claim 2 , further comprising a first pump in the recirculation tank, wherein the first pump is configured to pump the abrasive media from the first layer of abrasive media on the bottom of the recirculation tank to the abrasive media addition device. 4. The system of claim 3 , further comprising a second pump in the processing tank, the second pump is configured to pump the abrasive media from the second layer of abrasive media on the bottom of the processing tank to the cavitation fluid in the processing tank. 5. The system of claim 3 , wherein the abrasive media addition device is non-movably fixed relative to the processing tank. 6. The system of claim 3 , wherein the abrasive media distribution device is movable relative to the processing tank so that the abrasive media from a second layer of abrasive media on a bottom of the processing tank can be distributed to multiple locations within the processing tank. 7. The system of claim 3 , wherein: the abrasive media distribution device is movable relative to the processing tank so that the abrasive media from a second layer of abrasive media on a bottom of the processing tank can be distributed to multiple locations within the processing tank; and the first pump is movable relative to the recirculation tank. 8. The system according to claim 1 , further comprising a recirculation system coupled to the processing tank, the recirculating system configured to: receive overflow cavitation fluid from the processing tank; and supply abrasive media in the overflow cavitation fluid back to the processing tank for re-use in the cavitated fluid. 9. The system according to claim 8 , further comprising an input device configured to remove material from a surface of the workpiece, wherein: the input device is coupled to the recirculation system, and the recirculation system is configured to supply water to the input device. 10. The system according to claim 8 , further comprising: an input device configured to remove material from a surface of the workpiece; and a water source coupled to the input device. 11. The system according to claim 1 , wherein the processor, to facilitate maintaining the density of abrasive media in the cavitated fluid in the processing tank, is configured to: facilitate adding abrasive media to the cavitated fluid in response to detecting that a current level of abrasive media in the cavitated fluid is less than the threshold level of abrasive media; and maintain the current level of abrasive media in the cavitated fluid in response to detecting that the current level of abrasive media in the cavitated fluid is greater than or equal to the threshold level of abrasive media. 12. The system according to claim 1 , further comprising an abrasive media distribution device within the processing tank, the abrasive media distribution device configured to spread settled abrasive media in the processing tank to the cavitated fluid to increase a uniformity of abrasive media throughout the processing tank. 13. The system according to claim 1 , wherein the set of sensors is further configured to facilitate maintaining a uniform density of abrasive media in the cavitated fluid throughout the processing tank. 14. A system for managing abrasive media in a cavitated fluid within a processing tank for use in performing a cavitation peening technique on a workpiece in the processing tank, the system comprising: a set of sensors in communication with the cavitated fluid in the processing tank; a processor coupled to the set of sensors, the processor configured to: determine a density of an abrasive media in the cavitated fluid in the processing tank in response to input from the set of sensors, and facilitate maintaining the density of abrasive media in the cavitated fluid in the processing tank at a level that is greater than or equal to a threshold level of abrasive media wherein: the set of sensors comprises a plurality of sensors; each sensor is in communication with the cavitated fluid at a different location in the processing tank; each sensor is configured to determine a density of abrasive media in the cavitated fluid at a respective location in the processing tank; the system further comprises an abrasive media distribution device within the processing tank; the abrasive media distribution device is in communication with the processor; the processor is configured to determine a location in the processing tank that includes a density of abrasive media that is less than another location in the processing tank; and the abrasive media distribution device is configured to spread the abrasive media at the location to increase a density of abrasive media in the cavitated fluid at the location. 15. The system according to claim 14 , further comprising a recirculation system coupled to the processing tank, the recirculating system configured to: receive overflow cavitation fluid from the processing tank; and supply abrasive media in the overflow cavitation fluid back to the processing tank for re-use in the cavitated fluid. 16. The system according to

Assignees

Inventors

Classifications

  • involving optical means · CPC title

  • Treatment of used abrasive material · CPC title

  • Investigating concentration of particle suspensions (by weighing G01N5/00; investigating sedimentation of particle suspensions G01N15/04; investigating individual particles G01N15/10) · CPC title

  • in liquids, e.g. trouble · CPC title

  • B24C1/10Primary

    for compacting surfaces, e.g. shot-peening (for deforming sheet metal, tubes or profiles B21D31/06; as a metallurgical treatment C21D7/00, C22F1/00) · CPC title

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What does patent US11633835B2 cover?
Systems for managing abrasive media in cavitated fluid include a set of sensors in communication with cavitated fluid in a processing tank and a processor coupled to the set of sensors. The processor is configured to determine a density of an abrasive media in the cavitated fluid in the processing tank and facilitate maintaining the density of abrasive media in the cavitated fluid in the proces…
Who is the assignee on this patent?
Boeing Co
What technology area does this patent fall under?
Primary CPC classification B24C1/10. Mapped technology areas include Operations & Transport.
When was this patent published?
Publication date Tue Apr 25 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).