Flow sensor, method for manufacturing flow sensor and flow sensor module

US11629988B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-11629988-B2
Application numberUS-202017130247-A
CountryUS
Kind codeB2
Filing dateDec 22, 2020
Priority dateDec 11, 2009
Publication dateApr 18, 2023
Grant dateApr 18, 2023

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A flow sensor includes a semiconductor, an electric control circuit, a lead frame, and a spacer. The spacer is disposed in a clearance between the lead frame and the semiconductor device on an opposite side from a joint portion of the semiconductor device with the lead frame on a side of the electric control circuit across the diaphragm disposed therebetween. A surface of the electric control circuit and a part of a surface of the semiconductor device is covered with resin while the air flow sensing unit is exposed. At the joint portion, the semiconductor device is attached to the lead frame via an adhesive.

First claim

Opening claim text (preview).

What is claimed is: 1. A flow sensor comprising: a semiconductor device having an air flow sensing unit and a diaphragm formed thereto; an electric control circuit configured to control the semiconductor device; a lead frame; and a spacer, wherein the spacer is disposed in a clearance between the lead frame and the semiconductor device on an opposite side from a joint portion of the semiconductor device with the lead frame on a side of the electric control circuit across the diaphragm disposed therebetween, a surface of the electric control circuit and a part of a surface of the semiconductor device is covered with resin while the air flow sensing unit is exposed, at the joint portion, the semiconductor device is attached to the lead frame via an adhesive, and the spacer is formed of polytetrafluoroethylene, a fluorine resin, an epoxy resin, or a polycarbonate resin. 2. The flow sensor according to claim 1 , wherein a wire for transmitting electric signals from the semiconductor device and the lead frame is molded by the resin. 3. The flow sensor according to claim 1 , wherein the resin forms a continuous space with three sides of the semiconductor device, thereby surrounding the semiconductor device. 4. A method for manufacturing a flow sensor from a structure, comprising: disposing an elastic film on a surface of an upper mold of the molds, wherein the structure includes a semiconductor device having an air flow sensing unit and a diaphragm formed thereto, an electric control circuit for controlling the semiconductor device, a lead frame, and a spacer, wherein the spacer is disposed in a clearance between the lead frame and the semiconductor device on an opposite side from a joint portion of the semiconductor device with the lead frame on a side of the electric control circuit across the diaphragm disposed there between, and at the joint portion, the semiconductor device is attached to the lead frame via an adhesive; clamping a dam of the lead frame via the molds with varying a thickness of the elastic film for absorbing a dimension variation of the semiconductor device; molding the structure; and cutting away the dam excluding output terminals of the lead frame. 5. The method according to claim 4 , wherein the elastic film is formed by polytetrafluoroethylene, or a fluorine resin.

Assignees

Inventors

Classifications

  • between a chip and a stacked insulating package substrate, interposer or RDL · CPC title

  • comprising gold [Au] · CPC title

  • not being orthogonal to a side surface of the chip, e.g. fan-out arrangements · CPC title

  • Die-attach connectors and bond wires · CPC title

  • Leadframes · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US11629988B2 cover?
A flow sensor includes a semiconductor, an electric control circuit, a lead frame, and a spacer. The spacer is disposed in a clearance between the lead frame and the semiconductor device on an opposite side from a joint portion of the semiconductor device with the lead frame on a side of the electric control circuit across the diaphragm disposed therebetween. A surface of the electric control c…
Who is the assignee on this patent?
Hitachi Automotive Systems Ltd, Hitachi Astemo Ltd
What technology area does this patent fall under?
Primary CPC classification G01F1/684. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Apr 18 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).