Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus

Patent metadata

Field	Value
Publication number	US-11626704-B2
Application number	US-201815902454-A
Country	US
Kind code	B2
Filing date	Feb 22, 2018
Priority date	Mar 2, 2017
Publication date	Apr 11, 2023
Grant date	Apr 11, 2023

Abstract

A radiation source arrangement causes interaction between pump radiation (340) and a gaseous medium (406) to generate EUV or soft x-ray radiation by higher harmonic generation (HHG). The operating condition of the radiation source arrangement is monitored by detecting (420/430) third radiation (422) resulting from an interaction between condition sensing radiation and the medium. The condition sensing radiation (740) may be the same as the first radiation or it may be separately applied. The third radiation may be for example a portion of the condition sensing radiation that is reflected or scattered by a vacuum-gas boundary, or it may be lower harmonics of the HHG process, or fluorescence, or scattered. The sensor may include one or more image detectors so that spatial distribution of intensity and/or the angular distribution of the third radiation may be analyzed. Feedback control based on the determined operating condition stabilizes operation of the HHG source.

First claim

The invention claimed is:

1. A radiation source arrangement configured to cause an interaction between a first radiation and a gaseous medium and thereby generate a second radiation by higher harmonic generation, the radiation source arrangement further comprising:
at least one sensor configured to detect a third radiation resulting from an interaction between a condition sensing radiation and the gaseous medium, the second radiation comprising radiation having a different wavelength than the third radiation, wherein the third radiation includes a portion of the condition sensing radiation that is scattered by the gaseous medium, the at least one sensor comprising a first photodetector, a second photodetector, and one or more optical elements; and
a processor configured to:
monitor an operating condition of the radiation source arrangement based at least partly on the third radiation and results from the first and the second photodetectors.

2. The radiation source arrangement of claim 1 , wherein the first radiation is the condition sensing radiation.

3. The radiation source arrangement of claim 1 , wherein the condition sensing radiation is different from the first radiation.

4. The radiation source arrangement of claim 1 , wherein the sensor is arranged to receive the third radiation traveling from the gaseous medium in a direction different than a direction of the second radiation.

5. The radiation source arrangement of claim 1 , wherein the at least one sensor comprises a first sensor configured to detect a first type of the third radiation and a second sensor configured to detect a second type of the third radiation, wherein the first type of the third radiation is the portion of the condition sensing radiation that is scattered by the gaseous medium.

6. The radiation source arrangement of claim 5 , wherein the second type of the third radiation includes a portion of the condition sensing radiation that is reflected by the gaseous medium.

7. The radiation source arrangement of claim 5 , wherein the gaseous medium is provided in a form of a gas jet in a near-vacuum environment, the second type of the third radiation comprising a portion of the condition sensing radiation that is reflected by the gas jet.

8. The radiation source arrangement of claim 5 , wherein the second type of the third radiation includes a portion of the condition sensing radiation that is transmitted by the gaseous medium outside an angular distribution of the second radiation.

9. The radiation source arrangement of claim 1 , wherein the third radiation includes radiation that is emitted by the gaseous medium due to an excitation of the gaseous medium by the condition sensing radiation.

10. The radiation source arrangement of claim 1 , wherein the third radiation includes radiation that is generated by the higher harmonic generation at one or more harmonics lower than the second radiation.

11. The radiation source arrangement of claim 1 , wherein the first radiation and the gaseous medium are confined in an elongate waveguide to promote their interaction, wherein the third radiation includes radiation escaping through a wall of the elongate waveguide.

12. The radiation source arrangement of claim 1 , wherein:
the first photodetector is configured to detect a distribution of intensity of the third radiation in the vicinity of the gaseous medium, and
the processor is configured to determine the operating condition of the radiation source arrangement further based at least partly on the distribution of intensity.

13. The radiation source arrangement of claim 1 , wherein:
the first and second photodetectors are configured to detect a distribution of phase and intensity, respectively, in the vicinity of the gaseous medium;
the processor is configured to determine the operating condition of the radiation source arrangement based further at least partly on the distribution of phase and intensity; and
the one or more optical elements are configured to cause interference between the third radiation and a reference beam, the reference beam comprising a portion of the condition sensing radiation that has not interacted with the gaseous medium.

14. The radiation source arrangement of claim 1 , wherein:
the one or more optical elements are configured to discriminate two or more spectral components within the third radiation: and
the processor is configured to determine the operating condition of the radiation source arrangement based at least partly on a spectral distribution of phase and intensity.

15. The radiation source arrangement of claim 1 , further comprising:
a controller configured to adjust at least one operating parameter of the radiation source arrangement automatically in response at least partly to the operating condition determined by the processor based on the third radiation, resulting in an adjusted operating parameter, and
wherein the adjusted operating parameter is an operating parameter of a beam delivery system of the first radiation and comprises at least one of a beam width, an axial focus position, a transverse focus position or a wavefront.

16. The radiation source arrangement of claim 15 , wherein:
the adjusted operating parameter is a parameter of the gaseous medium,
the gaseous medium is a gas jet, and
the adjusted operating parameter is an operating parameter of a gas delivery system.

17. The radiation source arrangement of claim 1 , wherein the third radiation includes a portion of the first radiation that is reflected by the gaseous medium.

18. The radiation source arrangement of claim 1 , wherein the processor is further configured to monitor the operating condition of the radiation source arrangement in real-time.

19. The radiation source arrangement of claim 1 , wherein the processor is further configured to detect a wear condition of a part of the radiation source arrangement based on the operating condition.

20. A method of monitoring an operating condition of a radiation source arrangement, the radiation source arrangement causing an interaction between a first radiation and a gaseous medium and thereby generating a second radiation by higher harmonic generation, the method comprising:
detecting a third radiation resulting from an interaction between a condition sensing radiation and the gaseous medium by at least one sensor comprising a first photodetector, a second photodetector, and one or more optical elements, the second radiation comprising radiation having a different wavelength than the third radiation, wherein the third radiation includes a portion of the condition sensing radiation that is scattered by the gaseous medium;
monitoring an operating condition of the radiation source arrangement based at least partly on the third radiation and results from the first and the second photodetectors.

21. A non-transitory computer program product comprising machine-readable instructions for causing a processor to implement the method of claim 20 .

Assignees

• Asml Netherlands Bv

Inventors

• Van Der Post Sietse Thijmen
• Roobol Sander Bas
• Evtushenko Pavel

Classifications

• H10P95/90

  Thermal treatments, e.g. annealing or sintering · CPC title

• H05G2/002 Primary

  Supply of the plasma generating material · CPC title

• H01S3/0959 Primary

  by an electron beam · CPC title

• H05G2/008 Primary

  involving an energy-carrying beam in the process of plasma generation · CPC title

• H01S3/0092

  Nonlinear frequency conversion, e.g. second harmonic generation [SHG] or sum- or difference-frequency generation outside the laser cavity (nonlinear frequency conversion per se G02F1/35) · CPC title