Photochemical electrode and method for generating photochemical electrode
US-2017314147-A1 · Nov 2, 2017 · US
Method for manufacturing photoexcitable material
US11626524B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-11626524-B2 |
| Application number | US-201916437063-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jun 11, 2019 |
| Priority date | May 31, 2016 |
| Publication date | Apr 11, 2023 |
| Grant date | Apr 11, 2023 |
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Abstract
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A photoexcitable material includes: a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO, wherein the photoexcitable material includes 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less.
First claim
Opening claim text (preview).
What is claimed is: 1. A method for manufacturing a photoexcitable material, comprising: carrying particles, which form an aerosol, of a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO with a gas stream in a system evacuated with a vacuum pump; and forming a photoexcitable material layer including the particles on a substrate or a conductive layer by ejecting, from a nozzle, the aerosol of the particles which are collided with each other in the nozzle onto the substrate or the conductive layer in such a manner that the particles are recombined together by an action in which surfaces of the particles which have high-enemy-level by a collision are stabilized when the particles are deposited on the substrate or the conductive layer. 2. The method according to claim 1 , wherein the photoexcitable material contains 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less. 3. The method according to claim 1 , further comprising annealing the photoexcitable material layer. 4. The method according to claim 3 , wherein the annealing comprises annealing the photoexcitable material layer at 600° C. to 850° C. 5. The method according to claim 3 , wherein the annealing comprises annealing the photoexcitable material layer in an ammonia atmosphere.
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Classifications
comprising a chamber adapted to a particular process · CPC title
Active materials · CPC title
Annealing · CPC title
- H10F77/251Primary
comprising zinc oxide [ZnO] · CPC title
Hydrogen production from non-carbon containing sources, e.g. by water electrolysis · CPC title
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Frequently asked questions
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- What does patent US11626524B2 cover?
- A photoexcitable material includes: a solid solution of MN (where M is at least one of gallium, aluminum and indium) and ZnO, wherein the photoexcitable material includes 30 to 70 mol % ZnO and has a band gap energy of 2.20 eV or less.
- Who is the assignee on this patent?
- Fujitsu Ltd
- What technology area does this patent fall under?
- Primary CPC classification H10F77/251. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Apr 11 2023 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).